DC 欄位 |
值 |
語言 |
DC.contributor | 電機工程學系 | zh_TW |
DC.creator | 王上明 | zh_TW |
DC.creator | Shang-ming Wang | en_US |
dc.date.accessioned | 2015-1-20T07:39:07Z | |
dc.date.available | 2015-1-20T07:39:07Z | |
dc.date.issued | 2015 | |
dc.identifier.uri | http://ir.lib.ncu.edu.tw:88/thesis/view_etd.asp?URN=101521004 | |
dc.contributor.department | 電機工程學系 | zh_TW |
DC.description | 國立中央大學 | zh_TW |
DC.description | National Central University | en_US |
dc.description.abstract | 隨著高速通訊快速的發展,光傳輸是許多團隊研究的重點,本論文所呈獻之成果為高品質鍺製作成的光偵測器和特性量測,及其在光通訊上的應用潛力。我們利用SOI wafer蝕刻出許多矽長條型結構後,由國家奈米元件中心(NDL)進行離子佈值分別以BF2、As摻雜成為P型以及N型相間的陣列,在P型和N型矽上方鍍上一層鍺膜,再將試片在爐管中進行超過鍺熔點溫度的快速熱退火後,利用拉曼光譜儀以及穿透式電子顯微鏡等分析鍺膜,發現鍺的品質提升。藉由鍺材料在可見光及近紅外光波長下具有較矽為佳的光吸收特性,並搭配P型和N型矽形成P-I-N結構的光偵測器,將可得到和現今矽製程相容的光電元件,並具有良好的光電轉換效率與光響應。 | zh_TW |
dc.description.abstract | With the rapid development of high-speed communication, light transmission has been the mainstream in academic researches due to its better light absorption characteristics at near-infrared wavelength and potential applications in optical communications. This thesis presents the high-quality germanium on SOI for photodetectors as well as its characteristics and measurement. The Ge was made by rapid-melting-growth technique and investigated by Raman spectroscopy and standard electron microscopy analysis. The high-quality Ge was integrated with P-type and N-type silicon pillars for the PIN photodetector. This work demonstrated that high-quality Ge can be obtained by COMS-compatible process with good photoelectric conversion efficiency and photoresponsity. | en_US |
DC.subject | 矽鍺 | zh_TW |
DC.subject | 快速熱熔法 | zh_TW |
DC.subject | 近紅外光 | zh_TW |
DC.title | 在SOI基板上以快速熱熔法製造高品質鍺及近紅外線光偵測元件之研製 | zh_TW |
dc.language.iso | zh-TW | zh-TW |
DC.title | High-Quality Ge on SOI for Near Infrared Photodetector by Rapid-Melting-Growth Technique | en_US |
DC.type | 博碩士論文 | zh_TW |
DC.type | thesis | en_US |
DC.publisher | National Central University | en_US |