博碩士論文 104222023 完整後設資料紀錄

DC 欄位 語言
DC.contributor物理學系zh_TW
DC.creator饒高聖zh_TW
DC.creatorKao-Sheng Jaoen_US
dc.date.accessioned2017-8-24T07:39:07Z
dc.date.available2017-8-24T07:39:07Z
dc.date.issued2017
dc.identifier.urihttp://ir.lib.ncu.edu.tw:88/thesis/view_etd.asp?URN=104222023
dc.contributor.department物理學系zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract近年來,極紫外光是半導體製程中非常重要的光源,其可以提升半導體光微影技術的解析度。使用雷射加熱靶材的方式產生極紫外光,會有較高的轉換效率,因此成為了熱門的研究對象。由於雷射激發靶材產生極紫外光的過程太過複雜且實驗測試的費用太高,我們使用程式模擬來了解物理特性與該使用哪些參數去提升轉換效率。基於過去的研究指出,與單一脈衝相比,使用雙脈衝雷射加熱靶材可以更有效的提升極紫外光的轉換效率。希望由本次研究可以更進一步去釐清雙脈衝雷射產生極紫外光系統中,各種雷射參數與延遲時間對轉換效率的影響。最後,在主要脈衝參數給定的情況下,我們可以由模擬給出最佳化轉換效率的預脈衝能量,再由我們計算出的通用經驗公式,決定出適合的預脈衝寬度與其對應的強度與延遲時間。zh_TW
dc.description.abstractIn recent years, extreme ultraviolet light is a very important light source in the semiconductor process, which can enhance the resolution of semiconductor light lithography technology. Research for the extreme ultraviolet light sources based on laser-produced plasma become popular, due to its high conversion efficiency. The laser-produced plasma system is too expensive to test experimental parameters, so we use numerical simulations to understand the physical properties and which parameters to use to improve conversion efficiency. Previous studies have shown that the use of dual-pulse laser system can enhance the conversion efficiency more effectively compared to the single pulse system. The influences of pre-pulse parameters, main pulse parameters and delay time on EUV conversion efficiency characteristics were discussed in the paper. Our results show that we can use the universal empirical formula to determine the optimized parameters of pre-pulse under knowing main-pulse information.en_US
DC.subject雙脈衝雷射zh_TW
DC.subject雷射激發電漿zh_TW
DC.subject轉換效率zh_TW
DC.subject極紫外光zh_TW
DC.subjectzh_TW
DC.subjectdual-pulse laseren_US
DC.subjectlaser-produced plasmaen_US
DC.subjectconversion efficiencyen_US
DC.subjectextreme ultraviolet lighten_US
DC.subjecttinen_US
DC.title雙脈衝雷射產生錫電漿極紫外光光源之數值研究zh_TW
dc.language.isozh-TWzh-TW
DC.titleNumerical study of extreme ultraviolet light source from a Sn laser-produced plasma in dual-pulse schemeen_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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