| DC 欄位 |
值 |
語言 |
| DC.contributor | 照明與顯示科技研究所 | zh_TW |
| DC.creator | 廖彗汝 | zh_TW |
| DC.creator | Hui-RU Liao | en_US |
| dc.date.accessioned | 2018-1-17T07:39:07Z | |
| dc.date.available | 2018-1-17T07:39:07Z | |
| dc.date.issued | 2018 | |
| dc.identifier.uri | http://ir.lib.ncu.edu.tw:88/thesis/view_etd.asp?URN=104232010 | |
| dc.contributor.department | 照明與顯示科技研究所 | zh_TW |
| DC.description | 國立中央大學 | zh_TW |
| DC.description | National Central University | en_US |
| dc.description.abstract | 本研究使用自我複製技術(autocloning technique)，並利用電子束蒸鍍系統(E-beam gun evaporation)輔以離子源助鍍(ion-assisted deposition)系統，製作自我複製結構膜層，能快速的鍍製自我複製結構，並能實現大面積鍍製。自我複製式的偏振分光鏡將較於傳統式偏振分光鏡，因其為平面結構，故能用於垂直入射。本研究在設計部分，以有限時域差分法(FDTD method)，FDTD模擬軟體模擬自我複製結構之頻帶結構與穿透光譜。本研究在模擬方面分兩部分，第一部分為TE波頻帶結構，透過調整結構角度、膜層厚度比例、膜層厚度與基板結構週期，模擬出落在可見光波段內，最佳的頻帶寬度﹔第二部分模擬不同自我複製結構的TM波與TE波穿透光譜，透過調整膜層厚度、基板結構週期與不同膜層設計，並進行膜層厚度的優化，找出落在可見光波段內，有較大消光比與工作波長之光譜範圍。本研究在製程方面，成功利用干涉微影方法製作基板週期性結構，並利用雙電子束蒸鍍系統輔以離子源助鍍系統，成功鍍製二維自我複製式偏振分光鏡，工作波長在585 nm至645 nm之間，垂直入射時，最大消光比落在638.4 nm為115.1，平均消光比為27.9。 | zh_TW |
| dc.description.abstract | In this study, Ta2O5 /SiO2 two-dimensional autocloned polarization filter has been designed and fabricated by using electron beam gun evaporation with ion-beam- assisted deposition. Different from the traditional polarization beam splitters(PBSs), this autocloned photonic-crystal polarization filter is a flat type polarizer working at the normal incident angle.
In the filter design, we calculated the band structure and the transmittance spectrum of the filter by using finite-difference time-domain (FDTD) method. First, we simulated the bandwidth of the band structure in the visible wavelength by varying the structural angle, the proportion of the thin film thickness, the thickness of the thin film and the period of the substrate structure. Second, we simulated the transmittance spectra of the transverse electric (TE) wave and transverse magnetic (TM) wave with different autocloned structure. We found the better extinction ratio and working wavelength in the visible wavelength by adjusting the thickness of the thin film, the period of substrate structure and the design of the film layers. We also optimized the thin film thickness to find the better extinction ratio and working wavelength.
In the process of the filter fabrication, we fabricated the periodic structure of the substrate by interference lithography method successfully and the two-dimensional polarized filter by using electron beam gun evaporation with ion-beam-assisted deposition. The range of working wavelength is about 60 nm that is from 585 nm to 645 nm. The largest extinction ratio is 115.1 at 638.4 nm and the average extinction ratio is 27.9.
| en_US |
| DC.subject | 自我複製式 | zh_TW |
| DC.subject | 偏振分光鏡 | zh_TW |
| DC.subject | Autocloned | en_US |
| DC.subject | Polarization Beam Splitters | en_US |
| DC.title | 自我複製式可見光波段偏振分光鏡設計與製作 | zh_TW |
| dc.language.iso | zh-TW | zh-TW |
| DC.title | Design and Fabrication of the Visible Light Autocloned Polarization Beam Splitters | en_US |
| DC.type | 博碩士論文 | zh_TW |
| DC.type | thesis | en_US |
| DC.publisher | National Central University | en_US |