| dc.description.abstract | Optical components are used in many electronic products in daily life. The demand for lightweight and portable electronic products is increasing, therefore, the use of plastic substrates becomes important. However, the insufficient adhesion on plastic substrates has been a serious problem of the production of optical components. In this experiment, a material with high surface free energy is introduced to deposit a polymer film by using plasma polymerization technique. The optical thin film material silicon dioxide (SiO2) was coated to investigate the improvement of the adhesion between the substrate and the optical film in each process step.
In the research, four plastic material, PMMA, 330R, 480R and PC, are used as substrates. The etching process has been adopted to increase the contact area. The surface roughness can be increased up to 61.9 nm. After plasma pretreatment on the substrate surface, the hydroxyl group are activated. The water contact angle can be measured less than 10 degrees, indicating that the surface free energy has been improved. Due to the poor persistent of the hydroxyl group, the polymer film with nitrogen-containing function groups is coated, which can improve the surface free energy more effectively. The increasing of the percentage of nitrogen can be observed by XPS. After the above steps, the optical films are coated. Although etching process cannot improve the adhesion of all the substrates, the four substrates achieve completely adhesion after depositing the polymer film. Besides, the optical property of the substrates is well maintained. | en_US |