博碩士論文 107226601 完整後設資料紀錄

DC 欄位 語言
DC.contributor光電科學與工程學系zh_TW
DC.creator陳妙美zh_TW
DC.creatorTran Dieu Myen_US
dc.date.accessioned2020-1-17T07:39:07Z
dc.date.available2020-1-17T07:39:07Z
dc.date.issued2020
dc.identifier.urihttp://ir.lib.ncu.edu.tw:88/thesis/view_etd.asp?URN=107226601
dc.contributor.department光電科學與工程學系zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract由於高效率III-V族太陽能電池的性能優越,近來受到廣泛注意。而晶格匹配的基板在太陽能電池製造中被認為是非常重要的。本研究在Si基板上成長Ge磊晶薄膜,作為製造高效率III-V族太陽能電池的虛擬鍺基板。我們使用的兩種主要方法是射頻磁控濺射和迴圈熱退火。在Si基板上利用射頻磁控濺射沉積鍺磊晶薄膜與其它技術相比具有成本低的優點,也是一種安全的製造方法。為了降低螺紋狀差排密度(TDD)和減少缺陷,在Si表面沉積Ge磊晶薄膜後進行迴圈熱退火。由於Si和Ge在熱膨脹係數上的不匹配,退火後Ge薄膜的平面應力由壓縮變為拉伸。然後,我們將利用X光繞射(XRD)、拉曼光譜、原子力顯微鏡(AFM)和掃描電子顯微鏡(SEM)分析迴圈退火的影響以及TDD的還原機制。zh_TW
dc.description.abstractIII-V solar cells are becoming more widely known for their high efficiency and performance. Hence, a lattice - matched substrate is considered very important in their manufacturing. In this thesis, Ge epitaxial films on Si substrates are used as a virtual Ge substrate to manufacture highly efficient III-V solar cells. The two main methods employed are RF magnetron sputtering and cyclic thermal annealing. Ge epitaxial film will be deposited on the Si substrate via the RF magnetron sputtering method due to its lower cost and safety. Cycle thermal annealing is carried out after the deposition of Ge film on Si with the aim of reducing the threading dislocation density (TDD) and defects. Due to the mismatch between Si and Ge in terms of the thermal expansion coefficient, after the annealing process, the plane strain of the Ge film will be changed from compression to tension. We analyzed the effects of the cycle annealing as well as the TDD reduction mechanism via X-ray diffraction (XRD), Raman spectroscopy, atomic force microscopy (AFM), and scanning electron microscopy (SEM).en_US
DC.subject虛擬鍺基板zh_TW
DC.subjectIII-V族太陽能電池zh_TW
DC.subject射頻磁控濺射zh_TW
DC.subject迴圈熱退火zh_TW
DC.subjectVirtual Germanium Substrateen_US
DC.subjectIII-V solar cellen_US
DC.subjectRF Magnetron Sputteringen_US
DC.subjectCycle Thermal annealingen_US
DC.title退火Ge薄膜的性能研究zh_TW
dc.language.isozh-TWzh-TW
DC.titleResearch on the properties of the annealed Ge thin filmsen_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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