| dc.description.abstract | Abstract
In this study, we reported the fabrication about one-dimensional nanostructure, a novel process successfully fabricates a large-area, well-ordered of tapered nickel nanotube structure on (001) silicon substrate, which combining hydrofluoric acid modification and alkaline etching process, and the internal diameter and length of nickel nanotubes can be controlled by hydrofluoric acid modification and the wet etching time. In addition, if the nanotubes are crowded, the field emission properties are seriously affected by the screening effect. Therefore, this study attempts to fabricate the tapered nickel nanotube arrays of different sizes with the same method. Field emission measurement’s result show that at the same height, the small diameter tapered nickel nanotube compared with larger one shows that the field enhancement factor has been increased from 7784 to 8517, and turn-on field was reduced from 0.83 Vμm. -1 dropped to 0.77 Vμm-1, significantly enhancing the effect of field emission.
Under the condition that the aperture is the same, when the height decreased the field enhancement factor shifts from 8517 to 4821, and the initial incidence drops from 0.77 Vμm-1 to 0.99 Vμm-1. Combining the above process with thermal annealing treatment, also successfully fabricated a tapered nickel silicide nanotube arrays. | en_US |