博碩士論文 108226060 完整後設資料紀錄

DC 欄位 語言
DC.contributor光電科學與工程學系zh_TW
DC.creator陳家琦zh_TW
DC.creatorChia-CHI Chenen_US
dc.date.accessioned2022-1-26T07:39:07Z
dc.date.available2022-1-26T07:39:07Z
dc.date.issued2022
dc.identifier.urihttp://ir.lib.ncu.edu.tw:88/thesis/view_etd.asp?URN=108226060
dc.contributor.department光電科學與工程學系zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract本論文設計了一個結合非球面透與炫耀光柵的離軸聚焦超穎透鏡,將奈米壓印技術與超穎表面做結合,利用奈米壓印技術的便利性以及大面積製作等優點,成功的利用PDMS轉印矽基板上超穎表面至玻璃基板上的PI結構層,並探討其轉印過程中的損耗,本論文探討了壓印後超穎表面之奈米壓印片其光學性質,得到超穎表面之奈米壓印片的焦距:4.17 cm 、放大率:0.38 、Strehl ratio為0.34以及線偏振光合圓偏振光所對應到的最大繞射效率分別為0.0145% 和 0.0115%,低效率主要歸因於圖案轉移過程中矩形納米結構的圓化和相對較薄的厚度。我們發現我們所製作出來的樣品有著完整的成像能力以及部份的偏振轉換率。zh_TW
dc.description.abstractIn this paper, an off-axis focusing metalens that combines aspheric transparent and dazzling gratings is designed, and the nanoimprint technology is combined with the metasurface. Taking advantage of the convenience of nanoimprint technology and the advantages of large-area fabrication, the successful The use of PDMS to transfer the metasurface on the silicon substrate to the PI structure layer on the glass substrate, and discuss the loss during the transfer process. This paper discusses the optical properties of the nanoimprinted metasurface after imprinting, The focal length: 4.17 cm, magnification: 0.38, Strehl ratio of 0.34, and the maximum diffraction efficiency corresponding to linearly polarized light and circularly polarized light are 0.0145% and 0.0115%, respectively. The low efficiency is mainly attributed to the rounding and relatively thin thickness of the rectangular nanostructures during pattern transfer. We found that the samples we produced had full imaging capability and partial polarization conversion.en_US
DC.subject幾何相位zh_TW
DC.subject超穎透鏡zh_TW
DC.subject超穎表面zh_TW
DC.subject奈米壓印zh_TW
DC.subjectPB-phaseen_US
DC.subjectmetalensen_US
DC.subjectmetasurfaceen_US
DC.subjectnanoimprinten_US
DC.title奈米壓印技術製作全介電幾何相位超穎表面zh_TW
dc.language.isozh-TWzh-TW
DC.titleNanoimprint technology for manufacture all-dielectric geometric phase metasurfaceen_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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