| dc.description.abstract | In this study, plasma-assisted atomic layer deposition technology was employed to coat an anti-reflective film on a PMMA substrate. The precursors, TDMAT and 3DMAS, were used respectively for the deposition of TiO2 and SiO2 films at a low temperature of 70°C. The plasma mode introduces a mix of oxygen and argon for oxidation. The refractive index (n) and extinction coefficient (k) trends in the single-layer film were examined to determine optimal process parameters and conditions. Given that the plastic substrate is soft, using power settings of 150 watts and 100
watts for multi-layer coatings can lead to substrate surface damage and crack formation due to ion bombardment. As a result, a 50-watt setting was chosen for anti-reflection film deposition in these experiments. The structures of single and multi-layer films were analyzed using measurement instruments, with the composition of the TiO2 film structure confirmed via X-ray diffraction. As the number of ALD cycles (indicative of film thickness) increased, its crystallization strength rose from 82 to 117. Atomic force microscopy revealed a film surface roughness of approximately 0.28 nm, indicating a notably flat surface. Hence, the single layer TiO2 film exhibits a microcrystalline state. The multi-layer film structure, in contrast, was verified to match the layer count predicted by Macleod simulation software when examined using a transmission electron microscope. By incorporating an inhibition layer within the nano-composite layer of a single film, the crystallization phenomenon can be effectively reduced, subsequently lowering the stress on the film. The film′s changes and durability under harsh conditions were observed using a constant temperature and humidity machine, with test conditions set at 85°C and a
humidity of 85%. Anti-reflective films without the inhibition layer lasted up to 998 hours. In contrast, anti-reflective films with four inserted layers of 1.5nm SiO2 only persisted for 209 hours. The results show that the stress on the TiO2 does not show significant improvement with increasing insertion layers. Instead, the thickness of TiO2 decreases, causing the film to become less dense. In high humidity, the film is easily eroded by moisture. The relatively thicker TiO2 film in non-inserted layers is denser, resulting in a lower WVTR, thus providing better durability for the anti reflective film. | en_US |