| DC 欄位 |
值 |
語言 |
| DC.contributor | 光電科學與工程學系 | zh_TW |
| DC.creator | 吳鴻森 | zh_TW |
| DC.creator | Hung-Sen Wu | en_US |
| dc.date.accessioned | 2003-7-7T07:39:07Z | |
| dc.date.available | 2003-7-7T07:39:07Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | http://ir.lib.ncu.edu.tw:88/thesis/view_etd.asp?URN=90226028 | |
| dc.contributor.department | 光電科學與工程學系 | zh_TW |
| DC.description | 國立中央大學 | zh_TW |
| DC.description | National Central University | en_US |
| dc.description.abstract | 磁控濺鍍以廣泛的應用在製鍍大面積的薄膜上，以其濺鍍速率快、濺鍍速率穩定且均勻性良好的特性，勢必為未來鍍膜的主流。因此確實掌握濺鍍過程中薄膜的厚度，將可輕易完成各式的膜層設計，尤其是膜層厚度要求嚴格的DWDM薄膜濾光片。因此本論文是在磁控濺鍍上建立光學監控系統。利用Overshoot Turning Point Monitoring為監控方法，可變換監控波長，選擇停鍍點為厚度誤差最小的監控波長來做監控，避免在極值點處厚度變化對穿透率變化不靈敏而使厚度誤差變大的缺點，得到與設計最接近的厚度。利用此監控系統，配合磁控濺鍍Ta2O5與SiO2薄膜，實際製鍍一系列的膜層設計。從單層膜到Band-pass Filter，以及Edge Filter。實驗結果證明此光學監控系統可應用在磁控濺鍍上，並且在製程參數穩定下得到準確的厚度。同時依設計的光譜圖做誤差分析，找出影響監控準確性的因素(膜層折射率、旋轉、訊號穩定性等)。 | zh_TW |
| dc.description.abstract | Magnetron Sputtering has been widely used in the process of preparing large area coating. Because of the high and steady sputtering rate and good uniformity of thin films, magnetron sputtering must be the main stream of the coating methods in the future. It is very important to control the thickness of the film. When the film thickness is under control, we can easily achieve the goal of any film design, especially DWDM thin film filters, which have severe thickness accuracy.
The main subject in this study is to construct an optical monitoring system in magnetron sputtering system. Using Overshoot Turning Point Monitoring as the monitoring method, we decrease the thickness errors at modified ceased point. We can easily change monitoring wavelength in order to reduce the thickness errors. We prepare a series of film designs, including single layer film and multi-layer films. We got success in the thickness control of coating narrow band-pass filter. After experiments, we make analysis of spectrum from original design and experiment. We find out the factors, which affect the accuracy of monitoring (refractive index of thin films, substrate rotating, and steady signal). | en_US |
| DC.subject | 磁控濺鍍 | zh_TW |
| DC.subject | 光學監控 | zh_TW |
| DC.subject | Magnetron sputtering | en_US |
| DC.subject | Optical monitoring | en_US |
| DC.title | 磁控濺鍍之光學監控 | zh_TW |
| dc.language.iso | zh-TW | zh-TW |
| DC.title | Optical Monitoring in magnetron sputtering | en_US |
| DC.type | 博碩士論文 | zh_TW |
| DC.type | thesis | en_US |
| DC.publisher | National Central University | en_US |