DC 欄位 |
值 |
語言 |
DC.contributor | 機械工程學系 | zh_TW |
DC.creator | 潘俊豪 | zh_TW |
DC.creator | Chun-Hai Pan | en_US |
dc.date.accessioned | 2003-7-3T07:39:07Z | |
dc.date.available | 2003-7-3T07:39:07Z | |
dc.date.issued | 2003 | |
dc.identifier.uri | http://ir.lib.ncu.edu.tw:88/thesis/view_etd.asp?URN=90323004 | |
dc.contributor.department | 機械工程學系 | zh_TW |
DC.description | 國立中央大學 | zh_TW |
DC.description | National Central University | en_US |
dc.description.abstract | 形成異向性媒體的機制中,刻紋製程及後續形成Cr(200)/Co(11.0)磊晶系統是不可或缺的兩項條件。本論文針對刻紋後續之酸鹼洗潔淨過程中雙氧水的添加與否,研究刻紋形態及結晶結構所受的影響。實驗結果顯示雙氧水的添加會造成鎳磷層表面氧化差異及刻紋形態的改變,因而降低橫向磁記錄媒體的異向性。
隨著異向性的降低,伴隨而來的影響是磁記錄性質的表現不佳。由於雙氧水的添加,使得訊號強度(LF)、訊號半高寬(PW50)、頻譜訊號雜訊比(SpectralSNR)等性質表現不佳。其中又以訊號雜訊比差異最為明顯。藉由各種訊號雜訊之分析比較,進一步釐清造成訊號雜訊比表現不佳的因素中,又以抹除訊號後之雜訊表現(Ndc)差異最為明顯。 | zh_TW |
DC.subject | 鎳磷 | zh_TW |
DC.subject | 異向性 | zh_TW |
DC.subject | 訊號雜訊比 | zh_TW |
DC.subject | 磁性薄膜 | zh_TW |
DC.subject | 硬碟片刻紋製程 | zh_TW |
DC.subject | 磁性材料 | zh_TW |
DC.subject | 磁記錄 | zh_TW |
DC.subject | cleaning | en_US |
DC.subject | texture | en_US |
DC.subject | SNR | en_US |
DC.subject | magnetic recording | en_US |
DC.subject | orientation ratio | en_US |
DC.subject | media noise | en_US |
DC.subject | dc noise | en_US |
DC.subject | signal | en_US |
DC.subject | NiP | en_US |
DC.title | 刻紋後之酸鹼洗潔淨製程對磁記錄媒體之異向性及磁記錄性質之影響研究 | zh_TW |
dc.language.iso | zh-TW | zh-TW |
DC.title | The effects of cleaning process to the magnetic recording media on OR and magnetic recording properties. | en_US |
DC.type | 博碩士論文 | zh_TW |
DC.type | thesis | en_US |
DC.publisher | National Central University | en_US |