| dc.description.abstract | This study uses DC magnetron sputtering to deposit indium tin oxide(ITO) thin film on a soda-lime glass surface to study thin-film properties of an ultra-thin ITO that have a thin-film thickness of 2nm-100nm,Resistivity, transmittance, thin-film structure morphology and surface roughness were determined. This study also examines the relationship between ITO coating processes and reliability testing.
Indium tin oxide is a transparent conducting thin film that has a highly visible transmission and low resistivity. In Flat Panel Display applications, ITO resistivity is typically 2E-4Ωcm. However, in the touch panel applications, the transparent conductivity oxide (TCO) film requires high resistivity (sheet resistance is approximately 300-1000Ω). To increase sheet resistance, the TCO film should be thin; however, this has many disadvantages, including unstable electrical properties, non-uniform sheet resistance, and poor reliability and durability. This study attempts overcome these problems. This study investigated the effects of various ITO thicknesses on thin-film structure and photoelectric properties, and then fine tuned optimal oxygen gas flow and deposition power density to improve ITO thin-film properties, such that they meet touch panel requirements.
Experiments results demonstrate that an ITO thickness of 8nm was deposited using a coating process with a power density of 0.38 w/cm2 and oxygen gas flow of 2.6%, that has 91% transmittance and a sheet resistance of 500Ω/□, the ITO thin film also passed all reliability tests, including heat testing (160℃, 30 mins), humidity testing (60℃, 90%RH, 240hrs) and alkaline testing (NaOH 5%, 10mins). | en_US |