博碩士論文 955201033 完整後設資料紀錄

DC 欄位 語言
DC.contributor電機工程學系zh_TW
DC.creator黃健智zh_TW
DC.creatorChien-Chih Huangen_US
dc.date.accessioned2008-7-14T07:39:07Z
dc.date.available2008-7-14T07:39:07Z
dc.date.issued2008
dc.identifier.urihttp://ir.lib.ncu.edu.tw:88/thesis/view_etd.asp?URN=955201033
dc.contributor.department電機工程學系zh_TW
DC.description國立中央大學zh_TW
DC.descriptionNational Central Universityen_US
dc.description.abstract進入深次微米的時代後,製程解析度快速縮小到比光學微影技術的光波波長還小時,製程的誤差將會越來越顯著且含有許多統計分佈的特性。伴隨著製程變動已被觀察到存在著空間相關性,因此,我們提出一套設計流程並應用於交換電容式的ΔΣ調變電路中的電容排列,此流程包含 1) 萃取各電容彼此的相關性 2) 依其相關性來決定各電容在實體佈局上的相對位置 3) 結合良率分析於實體佈局的決定。最後,發展為自動化設計平台可提供使用者良善的使用介面與降低設計上的複雜性。zh_TW
dc.description.abstractThe process variations increase with the advance of semiconductor manufacturing, and consequently influence the circuit parameters. Due to the device dimensions shrinking and the wafer sizes increasing, the intra-die variations are becoming dominant and strongly layout dependent. In this work, the correlations with each design parameters are extracted firstly and they are used as the guideline for layout placement. A flow procedure is proposed for determining the corresponding positions for each target parameters, which are implemented by the conjunctions of proper number of units. Experimentally, the procedure is applied to the placement of capacitances for switching-capacitor sigma-delta modulators. The result shows that the circuit yield can be enhanced further more by considering the correlation into placement. For analog and mixed-signal circuits, an automatic layout platform can greatly reduce the design complexity, in turn, speed-up the time spent for iteration, and further improve the yield.en_US
DC.subject自動化zh_TW
DC.subject良率分析zh_TW
DC.subjectAutomatic Layout Placementen_US
DC.subjectYielden_US
DC.title應用於交換電容ΔΣ調變電路之電容排列良率自動化擺置平台zh_TW
dc.language.isozh-TWzh-TW
DC.titleYield-aware Automatic Layout Placement via Capacitance Correlation for Switching-Capacitor Sigma-Delta Modulatorsen_US
DC.type博碩士論文zh_TW
DC.typethesisen_US
DC.publisherNational Central Universityen_US

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