以動態模型分析PQ-DMNA/PMMA製作體積布拉格光柵之光化學反應與開發同調雷射光束合併元件之研究

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謝裕華(Yu-Hua Hsieh) 查詢紙本館藏

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光電科學與工程學系

論文名稱

以動態模型分析PQ-DMNA/PMMA製作體積布拉格光柵之光化學反應與開發同調雷射光束合併元件之研究
(Using detailed rate equations analysis photochemical reaction of PQ-DMNA/PMMA based volume Bragg grating and manufacturing an optical element of the coherence laser beam combining)

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摘要(中)

本研究計畫使用新穎高分子感光材料PQ-DMNA/PMMA製作反射式體積布拉格光柵並利用動態模型模擬PQ與DMNA分子受到雙光束干涉曝光時濃度分布情形。接著使用耦合波方程式計算光柵之繞射效率。藉由改變入射光強度、曝光時間、初始PQ濃度與初始DMNA濃度獲取動態模型中之未知參數且實驗與模擬結果相當吻合。接著使用自製的反射式體積布拉格光柵回饋半導體雷射使得雷射縱向模態達到單縱模輸出且高功率輸出。最後利用全像紀錄方式設計與製作雙顆半導體雷射同調光束合併之元件。使用同調光束合併之元件回饋，不論單顆或雙顆雷射縱向模態輸出皆已達到單縱模輸出且雷射橫向模態也可經由光柵得已修正。但是雙顆雷射耦合輸出只有0.02之效率，推測原因為紀錄與讀取時波前不一致造成。但對於使用全像方式製作雙顆半導體雷射同調光束合併之元件之概念以驗證其可行性。

摘要(英)

In this research, N, N-dimethyl-4-nitroniline (DMNA) doped into a familiar hologram material, PQ/PMMA, to form a novel photopolymer, PQ-DMNA/PMMA was used to record reflective-type volume Bragg grating (VBG). Based on several assumes, a detail rate equation was written down and used to analysis the concentration distribution of all molecules in PQ-DMNA/PMMA under exposed two counter-propagating beams. The concentration distributions of PQ and product can used to predict and calculate the diffraction efficiency of PQ-DMNA/PMMA VBG through L-L relation, Fourier series analysis and coupled-mode equation. By changing incident intensity, exposure time, initial concentration of PQ and DMAN, the unknown coefficient of rate equation can be abstained. The results of simulation and experiment are agreed well under continuous exposure. Under interrupt exposure, the empirical function of collision coefficient and lifetime of 3DMNA* were found and proposed a preliminary guessing for whose physical behavior. Then, using a homemade reflective-type VBG feedback a laser diode which is operated on single longitudinal mode and the output power can achieve 150 mW. Finally, an optical element of laser coherence beam combining was used to feedback two laser diodes simultaneously. Two laser diodes both achieved single longitudinal mode operation and the transverse mode were improved down. However, the efficiency of combining output is only 0.01 due to the bad transverse mode of the laser diode.

關鍵字(中)

★ 體積布拉格全像光柵
★ 同調雷射光束合併
★ 高分子光敏材料

關鍵字(英)

★ Volume Bragg grating
★ Coherence laser beam combining
★ PQ-DMNA/PMMA

論文目次

中文摘要 I
Abstract V
致謝 VI
目錄 VIII
圖目錄 XI
表目錄 XVI
第一章緒論 1
1-1 前言 1
1-2 研究動機 6
第二章理論背景 9
2-1雷射光束合併 (Laser beam combining) 9
2-2 體積布拉格光柵 (Volume Bragg grating) 18
2-2-1體積布拉格光柵原理與構造 18
2-2-2以耦合波方程式模擬體積布拉格全像光柵之光學特性 20
2-3 全像理論(Holography) 28
2-4 感光高分子材料PQ-DMNA/PMMA 36
2-4-1 材料組成與化學反應 36
2-4-2 樣品製備與光學特性量測 43
2.5 PQ-DMNA/PMMA光化學反應速率方程式 48
第三章數值模擬與分析方法 52
3-1 連續式曝光時濃度空間分佈隨時間變化之模擬分析 52
3-2 非連續曝光時濃度空間分佈隨時間變化之模擬分析 55
3-3 分子濃度與折射率之關係 57
3-4 傅立葉級數振幅分析 61
3-5樣品濃度與曝光參數對於折射率變化之影響 66
3-5-1 樣品初始濃度 66
3-5-2 改變不同入射光強度 69
第四章實驗與模擬結果之分析與討論 71
4-1雙光束干涉實驗架構 71
4-2 實驗結果分析與討論 73
4-2-1 樣品基本參數 73
4-2-2 改變不同入射光強度實驗 76
4-2-3 改變不同DMNA與PQ濃度實驗 80
4-2-4 改變不同曝光時間實驗 82
4-3實驗結果與模擬參數分析 88
4-3-1不同照光強度下連續式曝光實驗結果分析與模擬比較 88
4-3-2 不同PQ與DMNA初始濃度模擬與實驗分析 94
4-3-3 非連續式曝光實驗結果分析與模擬比較 98
第五章同調雷射光束合併元件設計與應用 109
5-1 線型外腔式共振腔 109
5-2 同調雷射光束元件製作與雷射特性量測 114
第六章結論 130
第七章參考文獻 132
第八章附錄 137
附錄一 VBG繞射效率與折射變化之模擬程式碼 137
附錄二化學反應方程式模擬程式碼 140

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指導教授

鍾德元(Te-Yuan Chung)

審核日期

2018-8-22

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