博碩士論文 101232015 詳細資訊




以作者查詢圖書館館藏 以作者查詢臺灣博碩士 以作者查詢全國書目 勘誤回報 、線上人數:5 、訪客IP:35.175.179.52
姓名 廖偉博(Wei-Bo Liao)  查詢紙本館藏   畢業系所 照明與顯示科技研究所
論文名稱 電漿聚合膜之製備與應用
(Fabrication and application of plasma polymerization films)
相關論文
★ 電激發有機雷射微共振腔研究★ 用奈米壓印方式複製Papilo blumei蝴蝶 表面的疏水性質
★ 半導體雷射控制頻率★ 比較全反射受挫法與反射式干涉光譜法在生物感測上之應用
★ 193nm深紫外光學薄膜之研究★ 超晶格結構之硬膜研究
★ 交錯傾斜微結構薄膜在深紫外光區之研究★ 膜堆光學導納量測儀
★ 紅外光學薄膜之研究★ 成對表面電漿波生物感知器應用在去氧核糖核酸及微型核糖核酸 雜交反應檢測
★ 成對表面電漿波生物感測器之研究及其在生醫上的應用★ 探討硫化鎘緩衝層之離子擴散處理對CIGS薄膜元件效率影響
★ 以反應性射頻磁控濺鍍搭配HMDSO電漿聚合鍍製氧化矽摻碳薄膜阻障層之研究★ 掃描式白光干涉儀應用在量測薄膜之光學常數
★ 量子點窄帶濾光片★ 以量測反射係術探測光學薄膜之特性
檔案 [Endnote RIS 格式]    [Bibtex 格式]    [相關文章]   [文章引用]   [完整記錄]   [館藏目錄]   [檢視]  [下載]
  1. 本電子論文使用權限為同意立即開放。
  2. 已達開放權限電子全文僅授權使用者為學術研究之目的,進行個人非營利性質之檢索、閱讀、列印。
  3. 請遵守中華民國著作權法之相關規定,切勿任意重製、散佈、改作、轉貼、播送,以免觸法。

摘要(中) 利用電漿使有機氣體或有機蒸氣裂解並沉積在基板形成薄膜,此類薄膜階可稱之為電將聚合膜,電將聚合膜為三維交聯網狀結構的高分子薄膜,具高耐熱性、絕緣性、化學穩定、表面無孔洞缺陷且與大部分基板有良好的附著性。
本研究使用六甲基二矽氧烷(Hexamethyldisiloxane, HMDSO)作為有機單體,將此單體通入真空腔體,並利用電漿將其解離,藉由調整電漿參數、有機單體流量及氧氣流量鍍製不同特性的電漿聚合薄膜,並分析其化學結構、元素比例、光學特性等等。
以HMDSO鍍製的薄膜可以藉由分析薄膜線狀/籠狀比例預測薄膜應力,並將多層膜鍍在壓應力(-0.067 GPa)的電漿聚合膜,可抵銷多層膜70%的張應力,使得應力從0.06 GPa下降至0.018 GPa。
塑膠基板不耐熱且水氣阻擋能力差,而水氣使得有機元件壽命下降,以HMDSO製備阻障層,在射頻電漿功率100W、0.625 sccm HMDSO及10 sccm氧氣沉積50 nm的阻障層,最佳WVTR為0.139 g/m2/day。
類鑽膜(Diamond-like carbon, DLC)具備鑽石sp3結構及石墨sp2結構,具有極佳的機械性質,可以做為保護膜,然而其穿透率不佳,使其無法應用在光學元件上,本研究在類鑽膜製程中藉由HMDSO摻雜SiOx,製備厚度100 nm的DLC:SiOx薄膜,硬度達12.9 GPa且可見光平均穿透率高達88%。
摘要(英) Plasma polymerization use plasma to fragment monomer. Plasma polymer thin films are well known for their excellent properties such as heat resistant, insulation, chemical inertness and pinhole-free.
In the study, SiOxCy thin films were deposited by plasma polymerization using hexamethyldisiloxane(HMDSO) and oxygen. The stress of SiOxCy thin films could be predicted by analyzing linear/cage structure ratio. The linear/cage structure ratio can be adjusted by changing the composite parameter, W[FM]c/[FM]m to control the stress of the deposited plasma polymer films. Multilayers, TiO2/SiO2/TiO2 were coated on a SiOxCy plasma polymer film (-0.067 GPa) herein, reducing their stress by 70 % from 0.06 GPa to 0.018 GPa.
Water vapor barrier film deposited on PET substrate by plasma polymerization using mixture gas of HMDSO and O2. WVTR of the film which was deposited by 100 W RF power, 0.625 sccm of HMDSO and 10 sccm of O2 reach the value of 0.139 g/m2/day.
Diamond-like carbon films were used to be protect layer. However, such films were opaque and could not be applied on optical element. In the research, we introduce HMDSO to dope SiOx in DLC. The thickness of DLC:SiOx thin film is about 100 nm. The hardness is 12.9 GPa and average transmittance in visible region is 88%.
關鍵字(中) ★ 電漿聚合
★ 應力
★ 阻障層
★ 類鑽膜
關鍵字(英)
論文目次 目錄
摘要 i
Astract iii
目錄 v
第一章 緒論 1
1-1 電漿聚合膜 1
1-2 電漿聚合膜發展與應用 2
1-3 研究內容 9
第二章 基本理論與文獻回顧 11
2-1 電漿氣相沉積法 11
2-1-1 電漿基本原理 11
2-1-2 磁控濺鍍 13
2-1-3 反應濺鍍 16
2-1-4 電漿聚合 21
2-2 鍍膜技術比較 24
2-3 HMDSO裂解反應(fragmentation) 25
第三章 實驗步驟與儀器架設 27
3-1 實驗流程與實驗步驟 27
3-2 鍍膜系統 28
3-2-1 射頻磁控濺鍍 28
3-2-2 離子源系統&電子槍蒸鍍系統 29
3-3 量測儀器 30
3-3-1 光譜儀 30
3-3-2 傅立葉轉換紅外線光譜儀 30
3-3-3 X光電子能譜儀 32
3-3-4 拉曼光譜儀 (Raman spectroscopy) 33
3-3-5 奈米壓痕儀 34
3-3-6 應力量測系統 37
3-3-7 Mocon水氣透過率量測儀 37
第四章 實驗結果與討論 40
4-1 應力分析 40
4-2 阻水阻氣膜 46
4-3 類鑽膜 51
第五章 結論與展望 57
參考文獻 58
參考文獻 1. H. König and G. Helwig, "Über dünne aus Kohlenwasserstoffen durch Elektronen-oder Ionenbeschuß gebildete Schichten," Zeitschrift für Physik. 129(5), 491-503 (1951).
2. A. Brockes and H. König, "Der Aufbau von Glimmentladungs-Polymerisaten verschiedener Entstehungsbedingungen und seine Veränderung durch Elektronenbestrahlung," Zeitschrift für Physik. 152(1), 75-86 (1958).
3. A. Bradley and J.P. Hammes, "Electrical properties of thin organic films," Journal of The Electrochemical Society. 110(1), 15-22 (1963).
4. A. Kubono and N. Okui, "Polymer thin films prepared by vapor deposition," Progress in polymer science. 19(3), 389-438 (1994).
5. S.T. Kowel, et al., "Future applications of ordered polymeric thin films," Thin Solid Films. 152(1-2), 377-403 (1987).
6. H. Yasuda, "Glow discharge polymerization," Thin Film Processes. 361-396 (1978).
7. H. Yasuda and T. Hsu, "Some aspects of plasma polymerization investigated by pulsed RF discharge," Journal of Polymer Science: Polymer Chemistry Edition. 15(1), 81-97 (1977).
8. H. Yasuda and T. Hirotsu, "Critical evaluation of conditions of plasma polymerization," Journal of Polymer Science: Polymer Chemistry Edition. 16(4), 743-759 (1978).
9. H. Yasuda and T. Hsu, "Plasma polymerization investigated by the comparison of hydrocarbons and perfluorocarbons," Surface science. 76(1), 232-241 (1978).
10. H. Yasuda and M. Gazicki, "Biomedical applications of plasma polymerization and plasma treatment of polymer surfaces," Biomaterials. 3(2), 68-77 (1982).
11. Y.S. Yeh, et al., "Blood compatibility of surfaces modified by plasma polymerization," Journal of biomedical materials research. 22(9), 795-818 (1988).
12. G. Roberts, "An applied science perspective of Langmuir-Blodgett films," Advances in Physics. 34(4), 475-512 (1985).
13. H. Biederman, "Polymer films prepared by plasma polymerization and their potential application," Vacuum. 37(3-4), 367-373 (1987).
14. I. McCulloch, et al., "Mechanical failure in thin‐film nonlinear optical polymers: Structure and processing issues," Journal of applied polymer science. 53(5), 665-676 (1994).
15. S. Morita, S. Hattori, and R. d′Agostino, Plasma Deposition, Treatment, and Etching of Polymers. 1990, Academic Press, San Diego.
16. H. Schonhorn and R. Hansen, "Surface treatment of polymers for adhesive bonding," Journal of Applied Polymer Science. 11(8), 1461-1474 (1967).
17. M. Hudis and L. Prescott, "Surface crosslinking of polyethylene produced by the ultraviolet radiation from a hydrogen glow discharge," Journal of Polymer Science Part B: Polymer Letters. 10(3), 179-183 (1972).
18. M. Hudis, "Surface crosslinking of polyethylene using a hydrogen glow discharge," Journal of Applied Polymer Science. 16(9), 2397-2415 (1972).
19. M. Hudis, "Plasma treatment of solid materials," Techniques and applications of plasma chemistry. New York: John Wiley and Sons. 113(147 (1974).
20. A. Moshonov and Y. Avny, "The use of acetylene glow discharge for improving adhesive bonding of polymeric films," Journal of Applied Polymer Science. 25(5), 771-781 (1980).
21. C. Huang and Q. Yu, "Deposition of silicon oxide hard coatings by low‐temperature radio‐frequency plasmas," Journal of applied polymer science. 116(1), 245-251 (2010).
22. C.J. Hall, P.J. Murphy, and H.J. Griesser, "Etching and Deposition Mechanism of an Alcohol Plasma on Polycarbonate and Poly (Methyl Methacrylate): An Adhesion Promotion Mechanism for Plasma Deposited a: SiOxCyHz Coating," Plasma Processes and Polymers. 9(9), 855-865 (2012).
23. D.L. Flamm, O. Auciello, and R. d′Agostino, Plasma deposition, treatment, and etching of polymers: the treatment and etching of polymers. 2012: Elsevier.
24. C. Petit‐Etienne, et al., "Deposition of SiOχ‐Like Thin Films from a Mixture of HMDSO and Oxygen by Low Pressure and DBD Discharges to Improve the Corrosion Behaviour of Steel," Plasma Processes and Polymers. 4(S1), S562-S567 (2007).
25. U. Lommatzsch and J. Ihde, "Plasma Polymerization of HMDSO with an Atmospheric Pressure Plasma Jet for Corrosion Protection of Aluminum and Low‐Adhesion Surfaces," Plasma Processes and Polymers. 6(10), 642-648 (2009).
26. U. Kreissig, et al., "Heavy-ion ERDA and spectroscopic ellipsometry characterization of a SiOC: H layered structure as functional coating on polymeric lenses," Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 219(908-913 (2004).
27. D. Spee, et al., "All hot wire chemical vapor deposition low substrate temperature transparent thin film moisture barrier," Thin solid films. 532(84-88 (2013).
28. K. Bahroun, et al., "Influence of layer type and order on barrier properties of multilayer PECVD barrier coatings," Journal of Physics D: Applied Physics. 47(1), 015201 (2013).
29. N. Kim, S. Graham, and K.-J. Hwang, "Enhancement of the barrier performance in organic/inorganic multilayer thin-film structures by annealing of the parylene layer," Materials Research Bulletin. 58(24-27 (2014).
30. M. Deilmann, et al., "Permeation mechanisms of pulsed microwave plasma deposited silicon oxide films for food packaging applications," Journal of Physics D: Applied Physics. 41(13), 135207 (2008).
31. C.H. Tsai, et al., "O2/HMDSO‐Plasma‐Deposited Organic–Inorganic Hybrid Film for Gate Dielectric of MgZnO Thin‐Film Transistor," Plasma Processes and Polymers. 11(1), 89-95 (2014).
32. R. Krumpolec, et al., "Fabrication of Hydrophobic Films from OFCB Monomer by Plasma Polymerization at Atmospheric Pressure,"
33. L.F. Mobarakeh, R. Jafari, and M. Farzaneh, "The ice repellency of plasma polymerized hexamethyldisiloxane coating," Applied Surface Science. 284(459-463 (2013).
34. V. Kumar, et al., "Development of silver nanoparticle loaded antibacterial polymer mesh using plasma polymerization process," Journal of Biomedical Materials Research Part A. 101(4), 1121-1132 (2013).
35. O. Takai, V. Anita, and N. Saito, "Properties of DLC thin films produced by RF PE− CVD from pyrrole monomer," Surface and Coatings Technology. 200(1), 1106-1109 (2005).
36. L. Wenwen, et al., "Application of Plasma Enhanced Chemical Vapor Deposi-tion for Fingerprint Resistance," Rare Metal Materials and Engineering. 41(1 (2012).
37. A. Okamoto and T. Serikawa, "Reactive sputtering characteristics of silicon in an Ar N 2 mixture," Thin Solid Films. 137(1), 143-151 (1986).
38. S. Schiller, G. Beister, and W. Sieber, "Reactive high rate DC sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode," Thin Solid Films. 111(3), 259-268 (1984).
39. J. Schulte and G. Sobe, "Magnetron sputtering of aluminium using oxygen or nitrogen as reactive gas," Thin Solid Films. 324(1), 19-24 (1998).
40. K. Koski, J. Hölsä, and P. Juliet, "Voltage controlled reactive sputtering process for aluminium oxide thin films," Thin Solid Films. 326(1), 189-193 (1998).
41. F. Garbassi, et al., Polymer surfaces: from physics to technology. 1998: Wiley Chichester.
42. E. Liston, L. Martinu, and M. Wertheimer, "Plasma surface modification of polymers for improved adhesion: a critical review," Journal of adhesion science and technology. 7(10), 1091-1127 (1993).
43. N. Inagaki, Plasma surface modification and plasma polymerization. 1996: CRC Press.
44. Q. Xie, et al., "Facile Creation of a Super‐Amphiphobic Coating Surface with Bionic Microstructure," Advanced materials. 16(4), 302-305 (2004).
45. 熊淑珍,矽甲烷槽車供應安全評估,國立交通大學工學院產業安全與防災學程,碩士論文,民國101年。
46. C.J. Hall, P.J. Murphy, and H.J. Griesser, "Influence of Tetramethyldisiloxane‐Oxygen Mixtures on the Physical Properties of Microwave PECVD Coatings and Subsequent Post‐Plasma Reactions," Plasma Processes and Polymers. 12(6), 555-563 (2015).
47. C.J. Hall, et al., "Variations in graded organosilicone microwave PECVD coatings modify stress and improve the durability on plastic substrates," Surface and Coatings Technology. 259(616-624 (2014).
48. M.R. Alexander, F. Jones, and R. Short, "Mass spectral investigation of the radio-frequency plasma deposition of Hexamethyldisiloxane," The Journal of Physical Chemistry B. 101(18), 3614-3619 (1997).
49. M. Goujon, T. Belmonte, and G. Henrion, "OES and FTIR diagnostics of HMDSO/O 2 gas mixtures for SiO x deposition assisted by RF plasma," Surface and Coatings Technology. 188(756-761 (2004).
50. P. Raynaud, et al., "FTIR plasma phase analysis of hexamethyldisiloxane discharge in microwave multipolar plasma at different electrical powers," Plasma Processes and Polymers. 2(1), 45-52 (2005).
51. C.Y. Kim, et al., "Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC (-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O2 Precursors," Journal of the Korean Physical Society. 50(4), 1119-1124 (2007).
52. N. Benissad, et al., "Silicon dioxide deposition in a microwave plasma reactor," Surface and Coatings Technology. 116(868-873 (1999).
53. H.K. Yasuda, "Some important aspects of plasma polymerization," Plasma Processes and Polymers. 2(4), 293-304 (2005).
54. Y.-S. Li, et al., "Single-layer organic–inorganic-hybrid thin-film encapsulation for organic solar cells," Journal of Physics D: Applied Physics. 46(43), 435502 (2013).
55. A. da Silva Sobrinho, et al., "Plasma-deposited silicon oxide and silicon nitride films on poly (ethylene terephthalate): a multitechnique study of the interphase regions," Journal of Vacuum Science and Technology-Section A-Vacuum Surfaces and Films. 16(4), 2021-2030 (1998).
56. D. Lee, et al., "Diamondlike carbon deposition on silicon using radio-frequency inductive plasma of Ar and C2H2 gas mixture in plasma immersion ion deposition," Applied physics letters. 73(17), 2423-2425 (1998).
57. K.H. Schoenbach, et al., "High-pressure hollow cathode discharges," Plasma Sources Science and Technology. 6(4), 468 (1997).
58. A.C. Ferrari, "Determination of bonding in diamond-like carbon by Raman spectroscopy," Diamond and Related Materials. 11(3), 1053-1061 (2002).
59. C. Casiraghi, A.C. Ferrari, and J. Robertson, "Raman spectroscopy of hydrogenated amorphous carbons," Physical Review B. 72(8), (2005).
60. A.C. Ferrari and J. Robertson, "Interpretation of Raman spectra of disordered and amorphous carbon," Physical review B. 61(20), 14095 (2000).
61. N. Paik, "Raman and XPS studies of DLC films prepared by a magnetron sputter-type negative ion source," Surface and Coatings Technology. 200(7), 2170-2174 (2005).
指導教授 李正中 審核日期 2016-8-30
推文 facebook   plurk   twitter   funp   google   live   udn   HD   myshare   reddit   netvibes   friend   youpush   delicious   baidu   
網路書籤 Google bookmarks   del.icio.us   hemidemi   myshare   

若有論文相關問題,請聯絡國立中央大學圖書館推廣服務組 TEL:(03)422-7151轉57407,或E-mail聯絡  - 隱私權政策聲明