參考文獻 |
參考文獻
[1] C. Chen, H. Liu, D. Steigerwald, W. Imler, C. Kuo and M. Craford, “A study of parasitic reactions between NH3 and TMGa or TMAI”, Journal of Electronic Materials, Vol. 25, pp. 1004-1008, October 1996.
[2] C. Theodoropoulos, T. J. Mountziaris, H. K. Moffat and J. Han, “Design of gas inlets for the growth of gallium nitride by metalorganic vapor phase epitaxy”, Journal of Crystal Growth, Vol. 217, p. 65, July 2000.
[3] D. Sengupta, S. Mazumder, W. Kuykendall, S. A. Lowry, D. Sengupta, and S. Mazumder, “Combined ab initio quantum chemistry and computational fluid dynamics calculations for prediction of gallium nitride growth,” Journal of Crystal Growth, Vol. 279, pp. 369-372, June 2005.
[4] T. Mihopoulos, Reaction and Transport Processes in OMCVD: Selective and Group III-Nitride Growth., Massachusetts Institute of Technology, Deptartment of Chemical Engineering, Commonwealth of Massachusetts, 1999.
[5] T. K. Seki Y, Lida K and Ichiki E, “Properties of epitaxial GaAs layers from a Triethylgallium and Arsine system”, Journal of Electrochemical Society, Vol. 122, pp. 1108-1112, April 1975.
[6] A. T. D. Mazzarese, W.C. Conner, K.A. Jones, L. Calderon and D.W. Eckart, “In situ FTIR and surface analysis of the reaction of trimethylgallium and ammonia”, Journal of Electronic Materials, Vol. 18, pp. 369-372, December 1989.
[7] A. Hirako, K. Kusakabe and K. Ohkawa, “Modeling of Reaction Pathways of GaN Growth by Metalorganic Vapor-Phase Epitaxy Using TMGa/NH3/H2: System: A Computational Fluid Dynamics Simulation Study”, Japanese Journal of Applied Physics, Vol. 44, pp. 874-880, February 2005.
[8] R. P. Parikh, R. A. Adomaitis, R. P. Parikh and R. A. Adomaitis, “An overview of gallium nitride growth chemistry and its effect on reactor design: Application to a planetary radial-flow CVD system”, Journal of Crystal Growth, Vol. 286, pp. 259-262, January 2006.
[9] G. Evans and R. Greif, “Effect of Boundary Conditions on the Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor”, Numerical Heat Transfer, Vol. 12, pp. 243-252, February 1987.
[10] G. Evans and R. Greif, “A Numerical Model of the Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor”, Journal of Heat Transfer, Vol. 109, pp. 928-935, October 1987.
[11] I. FOTIADIS, Anthony MKREMER, Donald R. McKENNA and Klavs F. JENSEN, “Complex flow phenomena in vertical MOCVD reactors: effect on deposition uniformity and interface abruptness”, Journal of Crystal Growth, Vol.85, pp. 154-164, November 1987.
[12] A. H. Dilawari and J. SZEKELY, “Computed results for the deposition rates and transport phenomena for an MOCVD system with a conical rotating substrate”, Journal of Crystal Growth, Vol.97, pp. 777-791, October 1987.
[13] S. Patnaik and R. A. Brown, “Hydrodynamic dispersion in rotating-disk OMVPE reactors: Numerical simulation and experimental measurements”, Journal of Crystal Growth, Vol. 108, pp. 491-498, May 1988.
[14] F. Durst and L. Kadinskii, “Numerical study of transport phenomena in MOCVD reactors using a finite volume multigrid solver”, Journal of Crystal Growth, Vol. 125, pp. 612-626, July 1991.
[15] G. W. Young, S. I. Hariharan and R. Carnahan, “Flow effects in a vertical CVD Reactor”, Journal on Applied Mathematics, Vol.52, pp. 1509-1532, December 1992.
[16] W. Y. Chung, D. H. Kim and Y. S. Cho, “Modeling of Cu Thin Film Growth by MOCVD Process in a Vertical Reactor”, Journal of Crystal Growth, Vol. 180, pp 691-697, October, 1997.
[17] S. Joh and G. H. Evans, “Heat Transfer and Flow Stability in a Rotating Disk/Stagnation Flow Chemical Vapor Deposition Reactor”, Numerical Heat Transfer, Part A: Applications, Vol. 31, pp. 867-879, August 1997.
[18] D. W. Weyburne and B. S. Ahem, “Design and operating considerations for a water-cooled close-spaced reactant injector in a production scale MOCVD reactor”, Journal of Crystal Growth, Vol. 170, pp. 77-82, January 1997.
[19] T. G. Mihopoulos, “Simulation of flow and growth phenomena in a close-spaced reactor”, Journal of Crystal Growth, Vol. 195, pp. 725-732, January 2000.
[20] A. G. Mathews and J. E. Peterson, “Flow Visualizations and Transient Temperature Measurements in an Axisymmetric Impinging Jet Rapid Thermal Chemical Vapor Deposition Reactor”, Journal of Heat Transfer, Vol. 124, pp. 564-570, May 2002.
[21] C. Park, J. Y. Hwang, M. Huang and T. J. Anderson, “Investigation of an Up Flow Cold-Wall CVD Reactor by Gas Phase Raman Spectroscopy”, Thin Solid Films, Vol. 409, pp. 88-97, March 2002.
[22] H. V. Santen, C. R. Kleijn, E. A. Harry and V. D. Akker, “On Turbulent Flow in Cold-Wall CVD Reactor”, Journal of Crystal Growth, Vol. 212, pp. 299-310, January 2000.
[23] G. Luo, S. P. Vanka and N. Glumac, “Fluid Flow and Transport Processes in A Large Area Atmospheric Pressure Stagnation Flow CVD Reactor for Deposition of Thin Films”, International Journal of Heat and Mass Transfer, Vol. 47, pp. 4979-4994, August 2004.
[24] B. Mitrovic, A. Gurary and L. Kadinski, “On the flow stability in vertical rotating disc MOCVD reactors under awide range of process parameters”, Journal of Crystal Growth, Vol. 287, pp. 656–663, December 2005.
[25] B. Mitrovic, A. Parekh and J. Ramer, “Reactor design optimization based on 3D modeling of nitrides deposition in MOCVD vertical rotating disc reactors”, Journal of Crystal Growth, Vol. 289, pp. 708-714, February 2006.
[26] B. Mitrovic, Alex Gurary and William Quinn, “Process conditions optimization for maximum deposition rate and uniformity in vertical rotating disc MOCVD reactors based on CFD modeling”, Journal of Crystal, Vol. 303, pp. 323-329, January 2007.
[27] ZHONG ShuQuan, “Numerical studies on flow and thermal fields in MOCVD reactor”, Chinese Science Bulletin, Vol. 55, pp. 560-566, February 2009.
[28] C. H. Lin and W. T. Cheng, “Effect of embedding a porous medium on the deposition rate in a vertical rotating MOCVD reactor based on CFD modeling”, International Communications in Heat and Mass Transfer, Vol. 36, pp. 680-685, April 2009.
[29] R. R. Saxena, V. Aebi, C. B. Cooper, M. J. Ludowise, H. A. Vander Plas, B. R. Cairns, T. J. Maloney, P. G. Borden, and P. E. Gregory “High-efficiency GaAlAs concentrator solar cells by MOCVD”, Journal Applied Physics, Vol. 51, pp. 4501-4503, July 1980.
[30] S. Nakamura, M, Senoh and T. Mukai, “Highly P-Typed Mg-Doped GaN Films Grown with GaN Buffer Layers”, The Japan Society of Applied Physics, Vol. 30, pp. L1708-L1711, August 1991.
[31] K. M. Amano H, Hiramatsu K, Akasaki I, "P-type conduction in Mg-doped GaN treted with low-energy electron beam irradiation”, Japanese Journal of Applied Physics, Vol. 28, pp. L2112-L2114, November 1989.
[32] 盧勁甫,「高頻RF感應加熱器應用於MOCVD承載盤之均溫性探討分析」,中央大學,碩士論文,2015。
[33] 陸大成,段樹坤,金屬有機化合物氣相外延基礎與應用,科學出版社,一版, 北京,2009。
[34] A. G. Thompson, “MOCVD technology for semiconductors”, Journal of Materials letters, Vol. 30, pp. 255-263, May 1996.
[35] A. G. B. Mitrovic and L. Kadinski, “On the flow stability in vertical rotating disc MOCVD reactos under a wide range of process parameters”, Journal of Crystal Growth, Vol. 287, pp. 656-663, December 2005.
[36] E. J. T. M. Dauelsberg, B. Schineller and J. Kaeppeler, Technology of MOVPE Production Tools., Elsevier Ltd, London, 2004.
[37] 林義鈞,「最佳化設計金屬有機化學氣相沉積高溫加熱系統數值分析研究」,國立中央大學,碩士論文,2013。
[38] 張政彬,「以數值分析法優化MOCVD高溫反應腔體之二段加熱系統暨實作驗證」,國立中央大學,碩士論文,2016。
[39]何國鴻,「金屬有機化學氣相沉積反應腔體承載盤熱流場之數值分析與實作驗證」,國立中央大學,碩士論文,2015。
[40]邱顯智,「以數值分析法優化MOCVD高溫反應腔體之加熱系統暨實作驗證」,國立中央大學,碩士論文,2015。
[41] 陳桂芳,「MOCVD高溫加熱系統之熱擋板數值分析與實作驗證」, 國立中央大學,碩士論文,,2017。
[42] X. Hong,半導體製程技術導論,羅正忠,張鼎張,三版,台灣培生教育出版股份有限公司,臺北,2007。
[43] 郭哲瑋, 「最佳化OLED面型蒸鍍加熱器設計與腔體流場數值分析」, 國立中央大學,碩士論文,2014。
[44]莊達人,VLSI 製造技術,高立圖書有限公司,1996。
[45] C. Theodoropoulos, N. Ingle, T. Mountziaris, Z. Y. Chen, P. Liu and G. Kioseoglou, “Kinetic and transport modeling of the metallorganic chemical vapor deposition of InP from trimethylindium and phosphine and comparison with experiments”, Journal of The Electrochemical Society, Vol. 142, pp. 2086-2094, March 1995.
[46] N. Ingle, C. Theodoropoulos, T. Mountziaris, R. Wexler and F. Smith, “Reaction kinetics and transport phenomena underlying the low-pressure metalorganic chemical vapor deposition of GaAs”, Journal of Crystal Growth, Vol. 167, pp. 543-556, March 1996.
[47] M. Masi, C. Cavallotti, G. Radaelli and S. Carra, “Kinetics of indium phosphide epitaxial growth using metal organic precursors”, Crystal Research and Technology, Vol. 32, pp. 1125-1136, April 1997.
[48] I. T. Im, H. J. Oh, M. Sugiyama, Y. Nakano and Y. Shimogaki, “Fundamental kinetics determining growth rate profiles of InP and GaAs in MOCVD with horizontal reactor”, Journal of Crystal Growth, Vol. 261, pp. 214-224, December 2004.
[49] A. Hirako, “Analysis of TMGa/NH3/H2 reaction system in GaN-MOVPE growth by computational simulation”, Physical States Solid, Vol. 203, pp. 1716-1719, May 2006.
[50] T. Uchida, K. Kusakabe and K. Ohkawa, “Influence of polymer formation on metalorganic vapor-phase epitaxial growth of AlN”, Journal of Crystal Growth, Vol. 304, pp. 133-140, February 2007.
[51] B. C. Sakiadis, “Boundary-layer behavior on continuous solid surfaces: II. The boundary layer on a continuous flat surface”, AIChE Journal, Vol. 7, pp. 221-225, June 1961.
[52] ANSYS, Inc., ANSYS FLUENT 12.0, Theory Guide, Canonsburg, 2009.
[53] C. K. Hu, C. J. Chen, T. C. Wei, Tomi T. Li, C. C. Wang and C. Y. Huang, “Investigation of a Simplified Mechanism Model for Prediction of Gallium Nitride Thin Film Growth through Numerical Analysis” Coatings, Vol. 7, pp.1-23, March 2017.
[54] 朱紅鈞,林元華,謝龍漢,Fluent流體分析及仿真實用教程,一版,人民郵電出版社,北京,2010。
[55] 王福軍,計算流體動力學分析: CFD軟體原理與應用,一版,清華大學出版社,北京,2004。
[56] S. V. Patankar, Numerical heat transfer and fluid flow, USA, Minnesota, 1980.
[57] C. Hirsch, Numerical Computation of Internal & External Flows. Volume 1, USA, 2007.
[58] 陶文銓,數值熱傳學,二版,西安交通大學出版社,西安,2001
[59] S. V. Patankar and D. B. Spalding, “A calculation procedure for heat, mass and momentum transfer in three dimensional parabolic flows”, International Journal of Heat and Mass Transfer, Vol. 15, pp. 1787-1806, October 1972.
[60] S. Y. Karpov, "Advances in the Modeling of MOVPE Processes," Journal of Crystal Growth, Vol. 248, pp. 1-7, November 2003.
[61] S. A. Safvi and J. M. Redwing,“GaN Growth by Metallorganic Vapor Phase Epitaxy”, Journal of The Electrochemical Society, Vol. 144, pp. 1789-1796. May 1997. |