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姓名 許智堯(Chih-Yao Hsu)  查詢紙本館藏   畢業系所 企業管理學系
論文名稱 美國半導體相關製造業化學廢棄物管理方法之分析
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摘要(中) 半導體產業是世界上最大的產業之一,由於目前半導體製造涉及許多複雜、精細的製程,且許多製程必須多次重複處理,於製造過程中,使用數百種有機化合物與無機化合物,且半導體產業使用大量溶劑並不以最經濟的方式進行處理,其廢溶劑在高溫下焚燒,昂貴的能源成本及焚燒的二次汙染物為一大問題且危害人類及環境生態。然而,隨著環境保護及永續發展的問題日趨重要,永續性逐漸成為半導體產業最關心的議題之一,但有關半導體產業於廢棄物管理方法之研究並不多見。因此本研究根據美國國家環境保護局的有毒物質排放清單資料,找出產業中較常出現之化學物質如氫氟酸、硝酸、硝酸鹽、阿摩尼亞、N-甲基吡咯酮、鹽酸、硫酸共七種化學物質,分析產生此類化學廢棄物的公司之廢棄物管理方法於2004年至2013年的變化趨勢,且將廢棄物管理方法資料運用群集分析加以收斂、分類,依美國國家環境保護局之準則,區分各半導體公司於此七種化學物質處理的年度表現。本研究結果將有助於了解半導體產業化學物質排放處理的趨勢,並找出相關的標竿公司,提供產業改進的參考。
摘要(英) Hundreds of high purity organic and inorganic compounds are involved in the complicated and delicate manufacturing of semiconductor. Because these waste solvents are incinerated at very high temperature, secondary pollutants from incineration are harmful to human life and environment. With the growing concerns on environmental protection and sustainable development, the issue of sustainability has become an important issue of the semiconductor industry. However, there are not many researches addressing how wastes in the semiconductor manufacturing are managed. Hence, this study aims to investigate how the semiconductor companies in the United States handle their waste management in their manufacturing processes. According to the EPA Toxics Release Inventory data, the frequently-used chemicals during the semiconductor production include Hydrogen Fluoride, Nitric Acid, Nitrate Compounds, Ammonia, N-Methyl-2-Pyrrolidone, Hydrochloric Acid and Sulfuric Acid. Cluster analysis was applied on the data of these chemicals to classify the approaches of waste management among the U.S. semiconductor companies. This study also ranked the waste management of the semiconductor companies based on the findings of the cluster analysis. The result of this study can assist us to understand the trends of chemical waste management in the semiconductor industry and identify the best-performing companies for the related companies to benchmark.
關鍵字(中) ★ 半導體產業
★ 廢棄物管理
★ 群集分析
★ 有毒物質排放
關鍵字(英)
論文目次 目錄
中文摘要 i
ABSTRACT ii
表目錄 vi
圖目錄 vii
第一章緒論 1
1.1研究背景與動機 1
1.2研究目的 2
第二章文獻探討 3
2.1半導體產業與半導體製造簡介 3
2.2半導體製造廢棄物 6
第三章研究方法 10
3.1資料蒐集與變數介紹 10
3.1.1資料蒐集 10
3.1.2變數說明 12
3.2群集分析法 14
第四章研究結果與討論 16
4.1廢棄物管理方法趨勢 16
4.1.1阿摩尼亞(Ammonia) 16
4.1.2鹽酸(Hydrochloric Acid) 19
4.1.3氫氟酸(Hydrogen Fluoride) 21
4.1.4硝酸鹽(Nitrate Compounds) 23
4.1.5硝酸(Nitric Acid) 25
4.1.6 N-甲基吡咯酮(N-Methyl-2-Pyrrolidone) 27
4.1.7硫酸(Sulfuric Acid) 29
4.2群集分析結果 31
4.2.1阿摩尼亞(Ammonia) 31
4.2.2鹽酸(Hydrochloric Acid) 36
4.2.3氫氟酸(Hydrogen Fluoride) 40
4.2.4硝酸鹽(Nitrate Compounds) 44
4.2.5硝酸(Nitric Acid) 48
4.2.6 N-甲基吡咯酮(N-Methyl-2-Pyrrolidone) 52
4.2.7硫酸(Nitric Acid) 56
第五章結論 60
5.1研究結論 60
5.2研究限制及未來研究方向 62
參考資料 63
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指導教授 沈建文 審核日期 2015-7-21
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