博碩士論文 104232013 詳細資訊




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姓名 胡智瑋(Chih-Wei Hu)  查詢紙本館藏   畢業系所 照明與顯示科技研究所
論文名稱 高功率脈衝磁控濺鍍技術鍍製高硬度光學多 層膜的研究
(The Research of Transparent Hard Coating Deposited by HIPIMS Deposition Technique)
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摘要(中) 在本研究中,以高功率脈衝電漿源結合封閉非平衡磁控濺鍍系統來製備氮化矽(Silicon Nitride)和氮氧化矽(Silicon Oxynitride)薄膜,研究結果指出,使用矽靶材(純度99.99%),反應濺鍍氮化矽薄膜在玻璃上,其可見光波長範圍的平均穿透率達83.9%,硬度接近30GPa,遠大於藍寶石的硬度,在通入部分的氧氣後,氮氧化矽的硬度下降到19GPa,但其在可見光範圍的平均穿透率卻上升到88.6%。接著,運用光學薄膜理論,設計並鍍製多層光學硬膜,其結構為光學硬膜/B-270 玻璃/4-layers 抗反射膜,此多層光學硬膜在可見光範圍的平均穿透率可達到96%,硬度為21GPa,等同於藍寶石的硬度,在外層當作保護層的光學硬膜其為非晶態,具有極小的表面粗糙度(0.225 nm)。
至此,成功研究出製鍍高硬度且表面平滑的鍍膜方法,可望當作各類光
學元件的保護層。
摘要(英) In this research, silicon nitride and silicon oxynitride films have been fabricated by using the high-power impulse magnetron sputtering and closed field unbalanced magnetron sputtering system with Si targets.According to the research results, the average transmittance of the SixNy film on the glass in the visible wavelength range was up to 83.9% and the hardness of the thin films was about 30 GPa, much larger than the hardness of sapphire. After introducing working gas O2, the hardness of silicon oxynitride films decreased to 19 GPa but the average transmittance on the glass increased to 88.6% in the visible wavelength range. Finally, the film structure of transparent hard coating/glass/4-layers AR
coating was designed and deposited. Its average transmittance was 96.0% in the visible wavelength range while the hardness was 21GPa. The transparent
hard coating was amorphous with surface roughness of 0.225 nm. All of the results indicated that we have found a new deposition technique which was suitable for the applications of both optical and protective coatings.
關鍵字(中) ★ 光學薄膜
★ 高功率脈衝系統
★ 封閉非平衡磁控濺鍍
關鍵字(英) ★ Optical thin films
★ High power impulse magnetron sputtering
★ Closed field unbalanced magnetron sputtering system
論文目次 目錄
中文摘要……………………………………………………………… ⅰ
英文摘要……………………………………………………………… ⅱ
致謝…………………………………………………………………… ⅲ
目錄…………………………………………………………………… ⅳ
圖目錄………………………………………………………………… ⅷ
表目錄………………………………………………………………… ⅸ
第一章 緒論………………………………………………………… 1
1-1 研究背景及動機…………………………………………… 1
1-2 文獻回顧…………………………………………………… 4
1-3 研究目標…………………………………………………… 7
1-4 本文架構…………………………………………………… 8
第二章 相關理論介紹……………………………………………… 10
2-1 沉積物理現象……………………………………………… 10
2-1-1 薄膜沉積理論…………………………………… 10
2-1-2 物理氣相沉積分類……………………………… 13
2-2 光學薄膜理論簡介………………………………………….. 13
2-2-1 抗反射鍍膜理論………………………………... 15
2-3 封閉非平衡磁控濺鍍(CFUBMS)原理介紹………………… 18
vi
2-3-1 濺鍍現象介紹……………………………………. 18
2-3-2 封閉非平衡磁控濺鍍……………………………. 19
2-4 高功率脈衝磁控濺鍍(HIPIMS)原理介紹…………………. 22
2-4-1 HIPIMS 判定基準……………………………….. 23
2-4-2 HIPIMS/UBMS 系統介紹……………………….. 24
第三章 薄膜分析方法………………………………………………. 26
3-1 薄膜機械性質量測…………………………………………. 26
3-1-1 奈米壓痕測試原理分析…………………………. 26
3-1-2 薄膜耐磨性測試………………………………. 28
3-2 薄膜結構與光學分析………………………………………. 28
3-2-1 原子力顯微鏡(AFM)介紹及原理分析………….. 30
3-2-2 掃瞄電子顯微鏡(SEM)介紹及原理分析……….. 31
3-2-3 UV-Visible 光譜儀介紹及原理分析…………….. 33
3-3 研究方法及實驗流程……………………………………….. 33
3-3-1 鍍膜材料選擇……………………………………... 33
3-3-2 基板介紹及清潔流程……………………………… 34
3-3-3 氮化矽及氮氧化矽薄膜製備……………………… 36
3-3-4 薄膜特性量測……………………………………… 37
第四章 結果與討論………………………………………………….. 38
4-1 氮化矽薄膜製程結果與討論……………………………… 38
4-1-1 脈衝放/儲能時間對氮化矽薄膜製程的影響……… 38
4-1-2 製程溫度對氮化矽薄膜製程的影響………………. 41
4-1-3 脈衝放/儲能時間固定下不同通氮量的影響……… 43
4-1-4 氮化矽薄膜性質討論……………………………… 46
4-2 氮氧化矽薄膜製程結果與討論…………………………… 49
4-2-1 不同通氧量對氮氧化矽薄膜的影響……………… 49
4-2-2 製程溫度對氮氧化矽薄膜製程的影響…………… 51
4-3 光學硬膜製程及結果……………………………………… 53
4-3-1 光學抗反射多層硬膜討論…………………………… 53
4-3-2 光學抗反射多層硬膜結果…………………………… 55
4-4 實際應用…………………………………………………… 58
4-4-1 PET 保護硬膜……………………………………….. 58
4-5 實驗總結……………………………………………………. 60
參考文獻………………………………………………………………... 61
參考文獻 [1] 台灣區電機電子工業同業公會:產業資訊報告。2016 年9 月,取自
http://www.teema.org.tw/industry-informationdetail.aspx?infoid=658
[2] ITPRV : ITRPV 8th edition 2017-report release and key findings。
2017 年6 月,取自 http://www.itrpv.net/Home/。
[3] Jörn Weber, Hagen Bartzsch, and Peter Frach, “Sputter deposition of
silicon oxynitride gradient and multilayer coatings,” Appl. Opt. 47,
C288- C292 (2008).
[4] Shih-Liang Ku, Cheng-Chung Lee, “Optical and structural properties of
silicon nitride thin films prepared by ion-assisted deposition,” Opt.
Mater. 32, 956-960 (2010).
[5] Bo-Huei Liao and Chien-Nan Hsiao, “Improving optical properties of
silicon nitride films to be applied in the middle infrared optics by a
combined high-power impulse/unbalanced magnetron sputtering
deposition technique,” Appl. Opt. 53, A377-A382 (2014).
[6] M. F. Lambrinos, R. Valizadeh, and J. S. Colligon, “Effects of
bombardment on optical properties during the deposition of silicon
nitride by reactive ion-beam sputtering,” Appl. Opt. 35, 3620- 3626
(1996)
[7] A. Groin, A. Jaouad, E. Grondin, V. Aimez, and P. Charette, “Fabrication
of silicon nitride waveguides for visible-light using PECVD: a study of
the effect of plasma frequency on optical properties,” Opt. Express 16,
13509-13516 (2008).
[8] K. Sarakinos, J. Alami, S. Konstantinidis, “High power pulsed
magnetron sputtering: A review on scientific and engineering state of the
art,” Surf. Coat. Technol. 204, 1661-1684 (2010).
[9] S. Konstantinidis, J.P. Dauchot, M. Hecq, “Titanium oxide thin films
deposited by high-power impulse magnetron sputtering,” Thin Solid
Films 515, 1182-1186 (2006).
[10] C. Nouvellon, M. Michiels, J.P. Dauchot, C. Archambeau, F. Laffineur,
E. Silberberg, S. Delvaux, R. Cloots, S. Konstantinidis, R. Snyders,
“Deposition of titanium oxide films by reactive High Power Impulse
Magnetron Sputtering (HiPIMS): Influence of the peak current value on
the transition from metallic to poisoned regimes,” Surf. Coat. Technol.
62
206, 3542-3549 (2012).
[11] R.D. Arnell, P.J. Kelly, “Recent advances in magnetron sputtering,” Surf.
Coat. Technol. 112, 170-176 (1999).
[12] I.V. Svadkovski, D.A. Golosov, S.M. Zavatskiy, “Characterization
parameters for unbalanced magnetron sputtering systems,” Vacuum 68,
283-290 (2003)
[13] J.J. Olaya, S.E. Rodil, S. Muhl, “Comparative study of niobium nitride
coatings deposited by unbalanced and balanced magnetron sputtering,”
Thin Solid Films 516, 8319-8326 (2008).
[14] P.J. Kelly, R.D. Arnell, “Magnetron sputtering: a review of recent
developments and applications,” Vacuum 56, 159-172 (2000).
[15]S.-L. Ku and C.-C. Lee, “Surface characterization and properties of
s i l i c o n n i t r i d e f i lms p r e p a r e d b y i o n - a s s i s t e d d e p o s i t i o n , ”
Surf. Coat. Technol. 204, 3234–3237 (2010).
[16] J. Weber, H. Bartzsch, and P. Frach, “Sputter deposition of silicon
oxynitride gradient and multilayer coatings,” Appl. Opt. 47, C288–
C292 (2008).
[ 1 7 ] A . G o r i n , A . E , G r o n d i n , V . A i m e z , a n d P .
“Fabrication of silicon nitride waveguides for visible-light using
PECVD: a study of the effect of plasma frequency on optical
properties,” Opt. Express 16, 13509–13516 (2008).
[18] C.C. Lee, K.H. Lee, C.J. Tang, C.C. Jaing, and H. C. Chen,
“Reduction of residual stress in optical silicon nitride thin
films prepared by radio-frequency ion beam sputtering deposition,”
Opt. Eng. 49, 063802 (2010).
[19] S.G. Yoon, S.M. Kang, W.S. Jung, S.-W. Kim, D.H. Yoon, “Effect of
assist ion beam voltage on intrinsic stress and optical properties of
Ta2O5 thin films deposited by dual ion beam sputtering,” Thin Solid
Films 516, 3582-3585 (2008).
[20] C. Aguzzoli, C. Marin, C. A. Figueroa, G. V. Soares, and I. J. R.
Baumvol, “Physicochemical, structural, and mechanical properties of
Si3N4 films annealed in O2,”Appl. Opt., 107, 73521 (2010).
[21]莊達人,VLSI 製造技術,高立圖書有限公司,1996 年6 月。
[22]李正中,薄膜光學與鍍膜技術,藝軒圖書出版社,2012 年4 月。
[23]EO edmund optics:光學鍍膜理論。2017 年。
63
取自https://www.edmundoptics.com.tw/resources/applicationnotes/
optics/an-introduction-to-optical-coatings/。
[24]蕭宏,半導體製程技術導論,全華圖書出版社,2014 年8 月。
[25] Brian R. Chapman, Eric G. Bolen,Glow Dscharge Process:Sputtering
and Plasma Etching,Wiley.com,1980 年9 月。
[26]Berstein, Fishbane and Gasiorowicz 等編著,Modern Physics,Prentice
Hall,2000 年3 月。
[27]I.V. Svadkovski, D. A. Golosov, and S. M. Zavatskiy, “Characterization
parameters for unbalanced magnetron sputtering systems,” Vacuum 68,
283–290 (2002).
[ 2 8 ] J . J .O l a y a , S . E . R o d i l , a n d S . Mu h l , “ C omp a r a t i v e s t u d y o f
niobium nitride coatings deposited by unbalanced and balanced
magnetron sputtering,” Thin Solid Films 516, 8319–8326 (2008).
[29] P. J. Kelly and R. D. Arnell, “Magnetron sputtering: a review of recent
developments and applications,” Vacuum 56, 159–172 (2000).
[30]俊尚科技:物理氣相沉積-HiPIMS。2014 年6 月,取自
http://www.junsun.com.tw/index.php。
[31] Daniel Lundin,”The HiPIMS process”,p49-50, Linköping Studies in
Science and Technology Dissertation No. 1305(2010).
[32] Y. P. Purandare, A. P. Ehiasarian, and P. E. Hovsepian, “Deposition of
nanoscale multilayer CrN/NbN physical vapor deposition coatings by
high power impulse magnetron sputtering,” J. Vac. Sci. Technol. A 26,
288–296, (2008).
[33] J. Paulitsch, P. H. Mayrhofer, W.-D. Münz, and M. Schenkel,“Structure
and mechanical properties of CrN/TiN multilayer coatings prepared by
a combined HIPIMS/UBMS deposition technique,” Thin Solid Films
517, 1239–1244 (2008).
[34] P. E. Hovsepian, A. P. Ehiasarian, A. Deeming, and C. Schimpf,
“Novel TiAlCN/VCN nanoscale multilayer PVD coatings deposited by
64
the combined high-power impulse magnetron sputtering/unbalanced
magnetron sputtering (HIPIMS/UBM) technology,” Vacuum 82, 1312–
1317 (2008).
[35] P. E. Hovsepian, C. Reinhard, and A. P. Ehiasarian, “CrAlYN/CrN
superlattice coatings deposited by the combined high power impulse
magnetron sputtering/unbalanced magnetron sputtering technique,”
Surf. Coat. Technol. 201, 4105–4110 (2006).
[36] P. E. Hovsepian, A. P. Ehiasarian, and U. Ratayski, “CrAlYCN/CrCN
nanoscale multilayer PVD coatings deposited by the combined high
power impulse magnetron sputtering/ unbalanced magnetron sputtering
(HIPIMS/UBM) technology,”Surf. Coat. Technol. 203, 1237–1243
(2009).
[37]張瑞慶,奈米壓痕技術與應用,2010 年。
[38]李其紘,「原子力顯微鏡的基本介紹」,科學研習月刊,第52 卷
第5 期,18-21 頁,2013 年5 月。
[39]羅聖全,「掃描式電子顯微鏡」,科學研習月刊,第52 卷 第5 期
,1-3 頁,2013 年5 月。
[40]普萊士光學科技,普萊士光學積分球。
[41]王輝清,「多層薄膜應力分析及探討」,中國機械工程學會第二十
四屆全國學術研討會論文集,2007 年11 月
指導教授 陳昇暉(Sheng-Hui Chen) 審核日期 2018-1-29
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