博碩士論文 105226012 詳細資訊

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姓名 林子庭(Tzu-Ting Lin)  查詢紙本館藏   畢業系所 光電科學與工程學系
論文名稱 高能脈衝磁控濺鍍系統鍍製高硬度抗反射多層膜之研究
(Formation of the High-hardness Anti-reflective Coatings by High-power Impulse Magnetron Sputtering)
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摘要(中) 高能脈衝磁控濺鍍(HiPIMS)技術為目前新一代的鍍膜技術,此技術的特色是藉由調變脈衝控制器的中斷時間(off time)來使靶材在極短脈衝時間內產生高達kW/cm^2的能量,使電漿密度提升進而使靶材的游離率提高,讓鍍製出的膜變的更緻密,有效提高膜的品質。本實驗使用高功率脈衝磁控濺鍍系統(HiPIMS)來鍍製高硬度抗反射多層膜,實驗第一階段藉由改變脈衝參數使其光學及機械性質有明顯變化來做分析,實驗第二階段則是根據前面實驗參數藉由光學軟體模擬設計出高硬度的多層抗反射膜並鍍製出來,最後將實驗成品做分析,得平均穿透率為93.7%的多層抗反射硬膜且硬度達到18GPa。
摘要(英) High power impulse magnetron sputtering, a new generation coating technology, is characterized for the high peak power up to kW/cm^2 by modulating on/off time of the pulse power controller. The plasma density near the sputtering target can be greatly increased to ionize the forming gases and Ar to improve the properties of the films effectively. In this study, anti-reflective hard coatings were deposited by high power impulse magnetron sputtering. First part of the study, nitride, oxynitride and silicon dioxide were prepared with different on/off time and analysed their optical and mechanical properties. Finally, the best parameters in the first part were applied to design and deposit multi-layer hard AR coating. The average transmittance of the AR coating was 93.7% and it’s hardness was 18 GPa.
關鍵字(中) ★ 高能脈衝磁控濺鍍
★ 抗反射多層膜
論文目次 摘要 i
Abstract ii
目錄 iii
圖目錄 v
表目錄 ix
第一章 緒論 1
1-1 前言 1
1-2 研究動機 4
第二章 超高硬度光學薄膜設計 6
2-1 光學薄膜理論 6
2-2 高硬度光學多層膜設計 9
第三章 實驗方法 19
3-1 磁控濺鍍系統 19
3-1-1 高能脈衝磁控濺鍍系統 21
3-1-2 高功率脈衝電源控制系統 24
3-1-3 脈衝製程參數 24
3-2 基板規格及清潔流程 27
3-3 實驗流程 28
3-4 實驗步驟 29
3-5 薄膜性質分析 30
3-5-1 硬度分析 30
第四章 結果與討論 34
4-1 氮化矽薄膜製程結果與討論 34
4-2 氮氧化矽薄膜製程結果與討論 43
4-3 氧化矽薄膜製程結果與討論 55
4-4 光學抗反射多層膜 64
4-4-1 氧化矽與氮化矽之多層抗反射膜 64
4-4-2 氮氧化矽與氮化矽之多層抗反射硬膜 67
4-4-3 氮氧化矽與氮化矽之藍寶石抗反射多層膜 71
第五章 結論 73
參考文獻 [1] D. Rats, D. Poitras, J. Soro, L. Martinu, and J. Von Stebut, "Mechanical properties of plasma-deposited silicon-based inhomogeneous optical coatings," Surface and Coatings Technology, vol. 111, pp. 220-228, 1999.
[2] ITRPV. (2018). ITRPV Ninth Edition 2018 including maturity report. Available: http://www.itrpv.net
[3] counterpointresearch. (2018). Counterpoint Research Market Monitor 2018. Available: https://report.counterpointresearch.com/posts/report/Monitor
[4] W. Que, Q. Zhang, Y. Chan, and C. Kam, "Sol-gel derived hard optical coatings via organic/inorganic composites," Composites science and technology, vol. 63, pp. 347-351, 2003.
[5] C.-R. Lin, D.-H. Wei, C.-K. Chang, W.-H. Liao, and K. R. Peng, "Diamond-like carbon films deposited at room temperature on flexible plastics substrates for antireflection coating," Japanese journal of applied physics, vol. 50, p. 035802, 2011.
[6] J. Weber, H. Bartzsch, and P. Frach, "Sputter deposition of silicon oxynitride gradient and multilayer coatings," Applied optics, vol. 47, pp. C288-C292, 2008.
[7] W. S. Choi, K. Kim, J. Yi, and B. Hong, "Diamond-like carbon protective anti-reflection coating for Si solar cell," Materials Letters, vol. 62, pp. 577-580, 2008.
[8] V. Aroutiounian, K. Martirosyan, and P. Soukiassian, "Almost zero reflectance of a silicon oxynitride/porous silicon double layer antireflection coating for silicon photovoltaic cells," Journal of Physics D: Applied Physics, vol. 39, p. 1623, 2006.
[9] 李正中, "薄膜光學與鍍膜技術," 2017.
[10] S. M. Rossnagel, J. J. Cuomo, and W. Westwood, Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions (Materials Science and Process Technology)(Berkshire, UK: Noyes): Noyes Publications, 1990.
[11] V. Kouznetsov, K. Macak, J. M. Schneider, U. Helmersson, I. J. S. Petrov, and c. technology, "A novel pulsed magnetron sputter technique utilizing very high target power densities," Surface and Coatings Technology vol. 122, no. 2-3, pp. 290-293, 1999.
[12] A. Ehiasarian, W.-D. Münz, L. Hultman, U. Helmersson, and I. Petrov, "High power pulsed magnetron sputtered CrNx films," Surface and coatings technology, vol. 163, pp. 267-272, 2003.
[13] J. A. Thornton, "Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings," Journal of Vacuum Science and Technology, vol. 11, pp. 666-670, 1974.
[14] A. Anders, "A structure zone diagram including plasma-based deposition and ion etching," Thin Solid Films, vol. 518, pp. 4087-4090, 2010.
[15] K. Sarakinos, J. Alami, and S. Konstantinidis, "High power pulsed magnetron sputtering: A review on scientific and engineering state of the art," Surface and Coatings Technology, vol. 204, pp. 1661-1684, 2010.
[16] U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehiasarian, and J. T. Gudmundsson, "Ionized physical vapor deposition (IPVD): A review of technology and applications," Thin solid films, vol. 513, pp. 1-24, 2006.
[17] L. Shenchang Electric Co. (2018). SPIK2000A Tutorial PPST. Available: https://www.shenchang.com.tw/sara/SPIK2000A%20Tutorial%20PPST.pdf
[18] 張瑞慶. 奈米壓痕技術與應用. Available: www.stam.org.tw/newsletter2a.php?SN=32&opp=download1
[19] H. Dun, P. Pan, F. R. White, and R. W. Douse, "Mechanisms of Plasma‐Enhanced Silicon Nitride Deposition Using SiH4/N 2 Mixture," Journal of the Electrochemical Society, vol. 128, pp. 1555-1563, 1981.
[20] J. Z. Zheng, D. Tan, P. Chew, and L. H. Chan, "Characterization and in-line control of UV-transparent silicon nitride films for passivation of FLASH devices," in Process, Equipment, and Materials Control in Integrated Circuit Manufacturing II, 1996, pp. 63-71.
[21] Y. Liu, I.-K. Lin, and X. Zhang, "Mechanical properties of sputtered silicon oxynitride films by nanoindentation," Materials Science and Engineering: A, vol. 489, pp. 294-301, 2008.
指導教授 陳昇暉 審核日期 2019-8-5
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