偏振式駐波干涉儀應用於位移量測

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姓名

王佑薪(You-Xin Wang) 查詢紙本館藏

畢業系所

機械工程學系

論文名稱

偏振式駐波干涉儀應用於位移量測
(Polarization standing wave interferometer for displacement measurement)

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摘要(中)

本論文提出一種新式的光學干涉儀:偏振式駐波干涉儀。此新式干涉儀整合了光學干涉系統、相位正交解相技術以及上下計數技術，可應用於長行程的位移量測，精度可達數奈米。
21世紀的工業技術皆與精密位移量測息息相關。半導體製程技術已達數個奈米等級，曝光機等機器皆需以干涉儀來輔助，才能確保作業時的正確位置。在業界中，常見的商用干涉儀有HP干涉儀、光柵干涉儀。這些干涉儀雖然具有極高的量測精度及較大的量測範圍，但架構通常體積較大且價格較昂貴，在校準及安裝上較為複雜。為了改善這些問題，我們設計了以單光束構建而成的偏振式駐波干涉儀，其優點可減少架設時所需的空間，且所使用的元件少，方便調整與校正，並搭配自行開發的相位正交解相技術、上下計數技術，可以取代目前昂貴的精密量測設備。
本系統的原理為重疊向左及向右傳遞的光線而形成駐波，再使用奈米球散射板將駐波光場散射。利用偏振干涉技術將散射出來的駐波轉換成相位正交的兩個訊號，透過反正切及解纏繞運算，取得駐波的相位變化，進而計算物件位移。實驗結果顯示，量測範圍能達到公分等級，量測解析度可達1 nm，量測靈敏度為1.35 ，量測速度極限可達1.6 mm/s。

摘要(英)

In this study, a new type of optical interferometer is proposed: Polarization standing wave interferometer. This new interferometer integrates optical interference system, phase quadrature analysis technique, and up-and-down counting technique. It can be used for long-stroke displacement measurement with an accuracy of several nanometers.
In the 21st century, industrial technique is strongly rely on precision displacement measurement. The semiconductor process technique has reached several nanometer levels. It is necessary to be supported by an interferometer to ensure the correct position during operation. In the industry, there are some ordinary commercial interferometers such as HP interferometers and grating interferometers. The advantages of them are extremely high measurement accuracy and a large measurement range. However, the configuration of them are usually bulky and expensive, and are complicated to calibrate and set up.
In order to improve these problems, we have designed a polarized standing wave interferometer constructed with a single beam. The advantages are smaller built equipment space, the configuration uses fewer components, it is easy to adjust and calibrate, arranging with polarization interference technique and up and down counting technique. Above all it’s better than commercial interferometers.
The principle of the system is to form a standing wave by overlapping the light transmitted to the left and right, and then scattering the standing wave light field by using a nanosphere scattering plate. By means of detecting the phase variations of the scattered light from the scattering plate with the polarization phase quadrature technique, the displacement can be determined precisely.
The experimental results shows that the measurement range can reach the millimeter level. The measurement resolution reach 1 nm, the measurement sensitivity is 1.35 , and the maximum measurement speed reach 1.6 mm/s.

關鍵字(中)

★ 位移量測
★ 駐波干涉
★ 奈米球散射板
★ 偏振干涉技術
★ 相位正交解相技術
★ 上下計數技術

關鍵字(英)

★ Displacement measurement
★ Standing wave interference
★ Nanosphere scattering plate
★ Polarization interference technique
★ Phase quadrature analysis technique
★ Up and down counting technique

論文目次

摘要 I
Abstract II
致謝 III
目錄 IV
圖目錄 VI
表目錄 VIII
符號說明 IX
第一章緒論 1
1.1研究背景 1
1.2文獻回顧 2
1.2.1位移干涉儀文獻回顧 2
1.2.2 駐波干涉儀文獻回顧 4
1.3 研究目的 7
1.4 論文架構 8
第二章基礎理論 9
2.1 干涉術 9
2.2 駐波干涉原理 10
2.3 奈米球散射板駐波光場觀察 11
2.3.1 散射板鋪球厚度與駐波對比度的關係 12
2.3.2 散射板偏振特性 14
2.4八分之一波片 16
2.5 小結 18
第三章系統架構 19
3.1 偏振式駐波干涉儀架構 19
3.2 奈米球散射板設計製作 21
3.3 偏振式駐波干涉儀系統運作 22
3.4 相位正交解相技術 25
3.4.1 相位正交解相技術結果與討論 29
3.5 上下計數技術 33
3.5.1 閾值檢測器 34
3.5.2 上下計數量測原理 35
3.6 波數計數模擬測試 40
3.7 小結 42
第四章實驗結果與討論 43
4.1 重複性實驗 43
4.1.1 長行程量測實驗:1 mm~45 mm的線性運動 43
4.1.2 中行程量測實驗: 80 μm、12 μm 弦波及三角波運動 45
4.1.3 短行程量測實驗: 50 nm、10 nm 步階運動 51
4.2 實驗討論 55
4.2.1 量測解析度 55
4.2.2 量測靈敏度 57
4.2.3 量測速度測試 57
4.2.4 穩定度測試 63
4.3 小結 64
第五章誤差分析 65
5.1 系統誤差 65
5.1.1 八分之一波片方位角引入之非線性誤差 66
5.1.2 偏振片方位角引入之非線性誤差 69
5.1.3 偏振片消光比引入之非線性誤差 72
5.1.4 玻璃基板介面反射引入之非線性誤差 74
5.1.5 波長飄移所引入之位移量測誤差 76
5.2 餘弦誤差 76
5.3 隨機誤差 77
5.3.1 環境振動 77
5.3.2 材料熱膨脹 77
5.3.3 電子雜訊 78
5.4 小結 79
第六章結論與未來展望 80
6.1 結論 80
6.2 未來展望 80
參考文獻 81
附錄 85

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指導教授

李朱育(Ju-Yi Lee)

審核日期

2018-11-19

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