以表面活化官能基增進塑膠基板附著性之研究

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姓名

石晉羽(Jin-Yu Shih) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

以表面活化官能基增進塑膠基板附著性之研究
(Improving the adhesion of plastic substrate by surface-activated functional groups)

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至系統瀏覽論文 (2024-7-15以後開放)

摘要(中)

近年來隨著車用電子智慧化的趨勢蓬勃發展，以塑膠作為車用顯示面板的基材有著成本低廉、良好光學特性、抗腐蝕等得天獨厚的產品價值；然而，與玻璃相比之下，塑膠基板與薄膜之間的附著性不佳，且易吸收水氣，影響鍍膜的環境，進而造成脫膜的情況。
本研究為解決上述塑膠鍍膜的問題，對於塑膠基板進行水氣烘烤處理，建立出於短時間內將基板水氣烘乾的實驗方法。並利用離子源對塑膠進行表面活化，使其增加表面官能基鍵結數，大幅提升基板表面與薄膜之附著性，並量測活化後基板所含極性官能基的訊號強度，找出最佳化參數。最後，透過沉積缺氧態薄膜作為基板與薄膜之間的附著層，搭配四層抗反射膜製成樣品，進行溫度85oC、相對濕度85%的高溫高濕環境測試。
最終，由烘烤、表面活化、附著層沉積後之塑膠基板，能於高溫高濕環境測試中承受1000小時不脫膜。

摘要(英)

In recent years, with the development of smart automotive electronics, the use of plastic as a substrate for automotive display has a unique product value of low cost, good optical properties, and corrosion resistance. However, compared with glass, the adhesion for plastic between the substrate and the film is worst due to it low surface energy. Moreover, it is easily absorb some water contents on its surface, causing the out-gassing during the deposition process.
In order to solve the above problem of plastic coating, the study performs a baking treatment for plastic substrate before thin film deposition, and establishes an experimental method for removing the water contents in a short time. The surface of the plastic is modified by an ion source to increase the number of surface functional groups, greatly improve the adhesion of the substrate surface to the film. The functional groups are measured by FTIR. We also deposited an oxygen-deficient thin film as an interlayer between substrate and anti-reflective(AR) coating.
Finally, the plastic substrate treated by baking, surface activation, and adhesion layer deposition can pass the high temperature/humidity environmental test for 1000 hours without thin films peeling.

關鍵字(中)

★ 表面活化
★ 塑膠鍍膜
★ 附著性

關鍵字(英)

論文目次

目錄
摘要 i
Abstract ii
致謝 iii
目錄 iv
圖目錄 viii
表目錄 xi
第一章緒論 1
1.1 前言 1
1.2 研究背景 3
1.3 研究內容 6
1.4 本文架構 7
第二章基礎理論與文獻回顧 8
2.1 電漿表面活化 8
2.1.1 電漿基本原理 8
2.1.2 表面活化介紹 10
2.1.3 表面活化機制 13
2.2 物理氣相沉積法(Physical Vapor Deposition, PVD) 15
2.2.1 磁控濺鍍法(Magnetron Sputtering Deposition) 15
2.2.2 電子鎗蒸鍍法(E-Beam Evaporation) 17
2.3 光學薄膜理論 19
2.3.1 光學導納 (Optical admittance) 19
2.3.2 導納軌跡法 19
2.3.3 多層抗反射膜設計 21
第三章實驗方法與儀器介紹 23
3.1 實驗方法 23
3.1.1 實驗流程 23
3.1.2 實驗步驟 24
3.2 量測儀器原理與介紹 29
3.2.1 紫外/可見/近紅外光光譜儀(UV/VIS/NIR Spectrophotometer) 29
3.2.2 傅里葉轉換紅外光譜儀(Fourier Transform Spectrometer, FTIR) 31
3.2.3 微量天平 32
3.2.4 恆溫恆濕機 32
3.2.5 奈米級歐傑電子能譜儀(Nano-Auger Electron Nanoscope) 34
3.2.6 X射線光電子能譜儀(X-ray Photoelectron Spectroscope, XPS) 35
3.2.7 附著性測試膠帶 36
3.3 離子源濺射系統 37
第四章實驗結果與討論 40
4.1 烘烤效率實驗 40
4.1.1 80oC烘烤實驗 40
4.1.2 100oC烘烤實驗 41
4.1.3 烘烤效率比較 41
4.1.4 水氣吸濕實驗 42
4.2 表面活化與官能基分析 44
4.2.1 弱鍵結層生成確認 44
4.2.2 表面活化官能基分析 46
4.3 附著層沉積與元素分析 49
4.3.1 電子鎗蒸鍍沉積SiO分析 49
4.3.2 磁控濺鍍沉積SiOx分析 51
4.4 抗反射膜設計與沉積 52
4.4.1 高低折射率單層膜材料分析 52
4.4.2 四層抗反射膜設計與沉積 52
4.5 高溫高濕環境測試 54
4.5.1 表面活化官能基之於附著性的影響 54
4.5.2 不同氧化態附著層之於附著性的影響 57
第五章結論 60
參考文獻 61

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指導教授

郭倩丞

審核日期

2019-7-17

推文