博碩士論文 106324071 詳細資訊




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姓名 陳柏瑜(Bo-Yu Chen)  查詢紙本館藏   畢業系所 化學工程與材料工程學系
論文名稱 奈米球微影術結合電化學沉積法製備規則有序陽極氧化鋁奈米模板及一維銅金屬奈米結構陣列之研究
(Fabrication of ordered anodic aluminum oxide nanotemplate and one dimensional Cu metal nanostructure arrays by nanosphere lithography combined with electrochemical deposition)
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摘要(中) 陽極氧化鋁由於其具備準直孔洞通道結構,可應用於過濾、抗反射塗層和奈米結構材料的模板等領域,近年來受到廣泛的研究。目前已有多種製造薄型陽極氧化鋁膜之技術被開發出來,例如:PMMA模板輔助法、離子束光刻法以及模板奈米壓印法等。然而這些製備之步驟繁瑣耗時長、無法製備大面積模板及製備成本昂貴,使得在實際應用上受到很大的限制。為克服相關製程限制,本研究首度利用單層奈米球陣列微影技術,藉由調控奈米球的直徑和陽極氧化蝕刻條件,成功地製備出孔徑和間距可調變之規則有序薄型陽極氧化鋁奈米模板。此外,銅金屬奈米線與奈米管,因其結構具有高準直性與高表面積之優點,被廣泛應用於光電元件、場發射、觸媒催化、水解產氫等領域上,然而如何精準控制所製備一維銅奈米結構之尺寸、形貌、排列週期性等,一直是急需克服的挑戰。因此,本研究也利用上述製程所製備之規則氧化鋁奈米模板進一步結合電化學沉積製程,可在具有導電性的各式基材上製備出一系列準直有序排列且內外徑可調變之一維銅金屬奈米線與奈米管陣列。而此所開發之新穎製程技術,相信將可應用於製備其他各式一維金屬或半導體奈米結構陣列。另外由於銅金屬奈米管的有序排列、高深寬比、中空狀結構等,具有極低啟動電場的優異電子場發射特性。實驗結果呈現出令人興奮的前景,這裡所提出的新方法將提供在製備一維銅金屬奈米管陣列結構基電子場發射源有序陣列的能力。
摘要(英) The anodic aluminum oxide (AAO) have been widely used as templates in nanotechnology. Due to their characteristic continuous, highly ordered pore structures, they have been utilized extensively in the fabrication of nanomaterials leading to various applications, such as separating, antireflection coating, and a template for synthesis of various nanostructures. To fabricate thin AAO templates with well-ordered nanopore arrays, a variety of patterning techniques have been developed. However, the low processing speed, high-cost, and operational complexity make them challenging to use. In this study, we propose a high throughput and low-cost nanopatterning approach to fabricate thin AAO templates, which is based on the nanosphere lithography with one-step anodization process. The pore diameter and inter-pore spacing can be readily controlled by adjusting the diameter of the nanospheres and the anodic etching conditions. In addition, copper metal nanowires and nanotubes are widely used in optoelectronic devices, field emission, catalyst catalysis and hydrogen evolution reaction due to their well-ordered and high surface area. However, how to accurately control the size, shape and periodicity of the prepared one-dimensional copper nanostructure has been a challenge. Herein we report a novel way to fabricate high filling, large-area, and uniform copper metal nanowires and nanotubes arrays by nanosphere lithography combined with electrochemical deposition technology. In addition, the copper metal nanotubes owing to their well-ordered arrangement, high aspect ratio, and hollow structure, exhibit excellent field-emission properties with a very low turn-on field. The obtained results present the exciting prospect that the new approach proposed here will provide the capability to fabricate well-ordered arrays of copper metal nanotubes-based field emitters.
關鍵字(中) ★ 陽極氧化鋁
★ 銅金屬奈米結構
★ 奈米球微影術
關鍵字(英)
論文目次 第一章 前言及文獻回顧1
1-1 前言1
1-2陽極氧化鋁膜2
1-2-1陽極氧化鋁膜之發展背景2
1-2-2陽極氧化鋁膜成長機制3
1-2-3陽極氧化鋁膜成長控制變因5
1-2-4 陽極氧化鋁膜規則化孔洞製程6
1-3 自組裝奈米球微影術8
1-3-1 奈米球自組裝機制8
1-3-2奈米球微影術之發展8
1-3-3 利用奈米球微影術製備規則有序之奈米結構9
1-4 一維金屬奈米線與奈米管之製備9
1-5奈米模板製備金屬奈米管11
1-6場發射電極元件13
1-6-1場發射理論13
1-6-2 場發射應用14
1-7研究動機及目標 15
第二章 實驗步驟及實驗設備17
2-1 實驗步驟17
2-1-1 高純度金屬鋁片使用之前處理17
2-1-2 自組裝奈米球陣列模板製備18
2-1-3 氧電漿蝕刻調控奈米球模板尺寸18
2-1-4 蒸鍍氧化矽薄膜18
2-1-5 舉離奈米球模板19
2-1-6 製備試片工作電極19
2-1-7 製備規則有序陽極氧化鋁模板19
2-2 電化學沉積法製備一維銅金屬奈米管陣列20
2-3 實驗設備21
2-3-1 電子槍蒸鍍系統21
2-3-2 陽極氧化鋁膜製備系統21
2-3-3 電鍍沉積系統21
2-4 儀器分析實驗22
2-4-1掃描式電子顯微鏡22
2-4-2 穿透式電子顯微鏡22
2-4-3 原子力電子顯微鏡23
2-4-4 真空場發射特性量測系統24
第三章 結果與討論25
3-1 未定義凹槽之陽極氧化鋁膜製程分析25
3-2 金屬鋁片上製備奈米球模板之結構與分析26
3-3 製備具規則有序之陽極氧化鋁模板28
3-3-1 不同陽極處理電壓對陽極氧化鋁模生成之影響29
3-3-2 陽極氧化鋁膜生成之速率31
3-3-3 調控陽極氧化鋁膜之阻障層開孔尺寸之製程32
3-4 電化學沉積法製備一維銅金屬奈米結構陣列34
3-4-1 直流電鍍法製備銅金屬奈米線與奈米管之形貌與結構分析34
3-5 一維銅金屬奈米管之場發射性質量測35
第四章 結論及未來展望37
4-1 結論37
4-2 未來展望37
參考文獻39
表目錄48
圖目錄50
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指導教授 鄭紹良 審核日期 2019-8-19
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