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姓名	林倖如(Sing-Ru Lin)  查詢紙本館藏	畢業系所	光電科學與工程學系
論文名稱	用於紫外光曝光系統之石英透鏡陣列設計與驗證 (Design and verification of quartz-based microlens array for UV exposure system)
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檔案	[Endnote RIS 格式]    [Bibtex 格式]    [相關文章]   [文章引用]   [完整記錄]   [館藏目錄]   至系統瀏覽論文 (2026-9-1以後開放)
摘要(中)	曝光機在半導體製程中扮演重要的一環，要將曝光機達到低不均勻度和高光學利用率，不只在光學設計上有難度，在石英光學元件上的製作也不簡單。首先，本論文針對不同石英陣列透鏡參數來分析其光學特性與影響，在考量其光學特性與製成的能力後，選定最符合需求的石英透鏡陣列參數，並以達到市面上曝光機的規格要求進行設計。 本論文所設計與驗證之石英透鏡陣列通過市售上曝光機的規格要求，最後完成的有效面積為220 × 220 mm2、最高照度24 mW/cm2、不均勻度3.2 %和曝光系統準直角為1.7˚，且光學利用率達50%。
摘要(英)	Mask aligner is an important equipment in semiconductor industry. To implement Mask aligner in a mask aligner is a new trend, but is not easy, because high uniformity and high optical utilization efficiency are difficult to achieve. First, this paper analyzes the optical characteristics and effects of different quartz array lens parameters. After considering its optical characteristics and manufacturing capabilities, select the most suitable quartz lens array parameters to design for the specifications of Mask aligner on the market. The quartz lens array designed and verified in this paper has passed the specifications of Mask aligner, Efficiency Area is 220 × 220 mm2、Maximum irradiance is 24 mW/cm2、Non-uniformity is 3.2 %、Collimation Half Angle is 1.7˚ And the optical utilization factor achieve 50%。
關鍵字(中)	★ 曝光機 ★ 不均勻度 ★ 光學利用率 ★ 透鏡陣列	關鍵字(英)	★ Mask aligner ★ Non-uniformity ★ Optical utilization efficiency ★ fly-eye lens
論文目次	摘要 I Abstract II 致謝 III 目錄 V 圖目錄 VIII 表目錄 VIII 第一章 緒論 1 1-1 研究背景 1 1-2 研究動機與目的 3 第二章 原理介紹 7 2-1 幾何光學(Geometrical Optics) 7 2-1-1 菲涅耳損失 7 2-1-2 造鏡者公式 9 2-1-3 厚透鏡公式 12 2-1-4 非成像光學系統 14 2-2 輻射學與光度學 14 2-2-1 輻射通量Φ 16 2-2-2 照度E (Irradiance) 16 2-2-3 輻射強度I (Radiant Intensity) 18 2-2-4 輝度L (Radiance) 19 2-2-5 不均勻度 (Non-Uniformity) 檢測 21 2-3 透鏡陣列 23 第三章 光學模擬與設計 26 3-1 初階光學設計 26 3-2 理論與模擬驗證 28 3-3 光源元件設計 31 3-4 不同透鏡陣列類型設計與分析 36 3-5 透鏡陣列參數於曝光機之影響 40 3-6 製程圓角模擬分析 44 3-7 曝光系統整合模擬結果 47 第四章 實驗與模擬驗證 49 4-1 透鏡陣列實體分析 49 4-2 實驗架構 57 4-3 實驗結果 60 4-4 模擬驗證破損之影響 62 第五章 結論 66 參考文獻 68 中英名詞對照表 75
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指導教授	楊宗勳 孫慶成(Tsung-Hsun Yang Ching-Cherng Sun)	審核日期	2021-8-26
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