博碩士論文 109327007 詳細資訊




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姓名 湯旻傑(Min-Jie Tang)  查詢紙本館藏   畢業系所 光機電工程研究所
論文名稱 一種可應用於旋轉式UV-LED平行曝光裝置之光場虛擬化技術研究
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摘要(中) 本論文為建立一套能快速模擬旋轉式UV-LED平行曝光裝置之模型為目標,利用光源與目標平面之間的相對運動達到平均效果,並將衰減模型套用於每一顆光源上,比較前後的結果,最後設計在不同規格下的曝光機模型,對於衰減問題的改善效果。
現今以UV-LED做為光源的平行曝光機,主要是將一顆顆光源組成陣列,但因每顆光源的初始輻射通量不一定相同,且UV-LED的晶片及光學元件在組裝上會有各種誤差如直線偏移、角度偏移等,導致需要在組裝後進行校正,且曝光機的均勻度相較其他產品需要相當高的均勻度,市面上普遍以均勻度≧90%做為目標。而當曝光機在長期使用下因每一顆UV-LED的衰減率不同,即為當光源同時點亮,經過一段時間後每顆光源的輻射通量不一定相同,而本研究主要探討在長期使用下造成的衰減問題。
本研究以白光LED代替UV-LED做後續模擬,主要因為UV光譜對人體有危害,且若未來有規劃實際驗證也較為方便及安全。因本研究使用的光源會隨時間不斷改變,若是使用光學追跡軟體會耗費大量時間,故先將光源之照度分布利用數學函數進行擬合,之後將擬合的函數修正為可隨時間改變位置的函數,便可模擬光源旋轉的效果。
曝光機模型的設計首先針對不同區域進行分析,分為旋轉中心區域、不受邊界影響區域以及旋轉邊界區域,通過分析找出各區域的問題,並且給予適當的解決方案,以便之後能更有效率的設計。
因曝光機屬於非消費級產品,大多為根據不同需求而客製化的產品,因此在設計上並非只有單一規格,故本研究根據不同條件下,分別以三種不同的光源間距,利用前述對於不同區域的分析結果,設計不同規格的曝光機模型做為參考,並且加上建立好的衰減模型,分析不同規格的曝光機模型,對於衰減現象的改善效果,以及後續對於衰減的校正方法。
摘要(英) This paper aims to establish a model that can quickly simulate a rotary UV-LED parallel exposure machines, using the relative motion between the light source and the target plane to achieve the average effect, and applying the degradation model to each light source, comparing before and after Finally, design exposure machine models under different specifications to improve the degradation problem.
Today′s parallel exposure machines that use UV-LED as the light source mainly form an array of light sources, but the initial radiant flux of each light source is not necessarily the same, and the UV-LED chip and light source components will be assembled. There are various errors such as linear offset, angular offset, etc., which lead to correction after assembly, and the uniformity of the exposure machine needs to be quite high compared to other products. The market generally takes the uniformity≧90% as the target . However, when the exposure machine is used for a long time, the degradation rate of each UV-LED is different, that is, when the light sources are lit at the same time, the radiation flux of each light source may not be the same after a period of time. The degradation problem caused by use.
In this research, white LEDs were used instead of UV-LEDs for follow-up simulations, mainly because UV spectrum is harmful to the human body, and it is more convenient and safe to actually verify if there is a plan in the future. Because the light source used in this research will change over time, it would take a lot of time to use optical tracking software. Therefore, the illuminance distribution of the light source is first fitted with a mathematical function, and then the fitted function is corrected to change its position over time. function to simulate the effect of light source rotation.
The design of the exposure machine model is first analyzed for different areas, divided into rotation center area, non-boundary affected area and rotation boundary area, through the analysis to find out the problems in each area, and give appropriate solutions, so that later more efficient design.
Because exposure machines are non-consumer products, most of them are customized products according to different needs, so there is not only a single specification in design, so this research uses three different light source spacings under different conditions, using the aforementioned for different Based on the analysis results of the area, design exposure machine models of different specifications as a reference, and add the established degradation model, analyze the exposure machine models of different specifications, the improvement effect on the light degradation, and the subsequent correction method for the degradation.
關鍵字(中) ★ 旋轉式
★ UV-LED曝光機
★ 光源衰減
★ 光分佈函數
關鍵字(英) ★ rotary
★ UV-LED exposure technique
★ light degradation
★ light distribution function
論文目次 摘要 I
Abstract II
致謝 III
目錄 IV
表目錄 VI
圖目錄 VII
第一章、緒論 1
1-1研究背景 1
1-2研究動機與目的 3
1-3文獻回顧 4
1-4論文架構 7
第二章、基礎理論 8
2-1輻射度量學 8
2-1-1立體角 8
2-1-2輻射通量 8
2-1-3輻射強度 9
2-1-4輻照度 9
2-1-5輻照度均勻度 9
2-2曝光劑量 9
2-3光源衰減模擬 10
2-4照度分布函數化 13
2-4-1模擬光源 13
2-4-2照度分布演算模型 14
2-4-3照度疊加理論 16
2-4-3照度位移疊加理論 16
第三章、研究方法 18
3-1研究規劃 18
3-2光源分布區域分析 19
3-2-1旋轉中心區域 20
3-2-2不受邊界影響區域 25
3-2-3旋轉邊界區域 28
3-3設計流程 29
第四章、結果與討論 31
4-1光源間距d1之曝光機模型 31
4-2光源間距d2之曝光機模型 34
4-3光源間距d3之曝光機模型 36
4-4三種光源間距之曝光機模型比較 38
第五章、結論與未來展望 42
5-1結論 42
5-2未來展望 42
參考文獻 43

參考文獻 [1] Jan Burck, Thea Uhlich, Christoph Bals, Niklas Höhne, Leonardo Nascimento, Monica Tavares and Elisabeth Strietzel(Monday, November 14th, 2022).Climate Change Performance Index 2023. Retrieved from https://ccpi.org/download/climate-change-performance-index-2023/
[2] 2021全球PCB億元俱樂部 台資營收領先、陸資家數居冠。台灣電路板協會。檢自https://www.tpca.org.tw/Message/MessageView?id=11648&mid=283
[3] 黃煥彰(2021)。台灣印刷電路板業的社會責任――產業技術升級、事業廢棄物處理技術也應升級。看守台灣。檢自https://www.taiwanwatch.org.tw/node/1400
[4] 陳奇夆、孫皓格(2017)。旋轉式曝光機。中華民國專利號I575333。經濟部智慧財產局。
[5] 陳奇夆(2016)。掃描式UV-LED曝光裝置。中華民國專利號I529500。經濟部智慧財產局。
[6] 沙滕堡 馬克 L、 亨德爾 魯道夫 H、卡卡希 麥可(2016)。 透過旋轉、平移及可變的處理條件之暴露劑量均勻化。中華民國專利號I598935。經濟部智慧財產局
[7] Jiajie Fana, Zhou Jingc, Yixing Caoa, Mesfin Seid Ibrahimf, Min Li, Xuejun Fang,Guoqi Zhang(2021).Prognostics of radiation power degradation lifetime for ultraviolet light-emitting diodes using stochastic data-driven models. Energy and AI. Volume 4. https://doi.org/10.1016/j.egyai.2021.100066.
[8] Ayşe Kızılersü, Markus Kreer, Anthony W. Thomas(2018).The Weibull distribution Significance Volume 15, Issue 2. https://doi.org/10.1111/j.1740-9713.2018.01123.x
[9] S.A.Prahl, M.Keijzer,S.L.Jacques,A.J.Welch,”A Monte Carlo Model of Light Propagation in Tissue”, SPIE Institute Series Vol. IS 5,pp.102-111,1989.
[10] MathWorks。檢字https://www.mathworks.com/help/stats/weibull-distribution.html
[11] Cree® XLamp® XP-G LEDs, Product family data sheet, CLD-DS20 Rev 15C, http://www.cree.com/led-components/media/documents/XLampXPG.pdf
[12] 郭信宏(2016)。一種應用於類面光源陣列的光場演算技術之研究。國立中央大學。博士論文。
[13] 徐安永(2017)。一種應用於準直系統光源的光照度分布演算之研究。國立中央大學。碩士論文。
[14] 鍾奕晨,2019,「一種應用於UV-LED系統光源設計的光分布演算法之研究」,國立中央大學,碩士論文。
[15] C. M. Sparrow. 1916. “On spectroscopic resolving power”. The Astrophysical Journal, Vol. 44, pp. 76.
[16] I. Moreno, M. Avendaño-Alejo, & R. I. Tzonchev. 2006. “Designing light-emitting diode arrays for uniform near-field irradiance”. Applied optics, Vol. 45(10), pp. 2265-2272.
[17] I. Moreno, C. C. Sun, & R. Ivanov. 2009. “Far-field condition for light-emitting diode arrays”. Applied optics, Vol. 48(6), pp. 1190-1197.
[18] E. Hecht. 2002. Optics. 4th. International edition, Addison-Wesley, San Francisco, 3.
[19] Arvo, James (1992), "Fast random rotation matrices", in David Kirk (ed.), Graphics Gems III, San Diego: Academic Press Professional, pp. 117–120
[20] Woolard, Edgar (2012-12-02). Spherical Astronomy. ISBN 978-0-323-14912-9.
[21] 田登, 大. (2007). 色彩工程學: 理論與應用. 全華圖書股份有限公司.
[22] Griffiths, David J. Introduction to electrodynamics 3. ed., reprint. with corr. Upper Saddle River, NJ [u.a.]: Prentice-Hall. 1999 [2012-04-06]. ISBN 0-13-805326-X
[23] I. Moreno, P. X. Viveros-Méndez. (2021)"Modeling the irradiation pattern of LEDs at short distances," Opt. Express 29, 6845. https://doi.org/10.1364/OE.419428
[24] Jiajie Fan, Kam-Chuen Yung, Michael Pecht(2012).“Lifetime Estimation of High-Power White LED Using Degradation-Data-Driven Method”. IEEE Transactions on Device and Materials Reliability, Volume 12, Issue 2, pp. 470-477.
[25] F. Jose Arques-Orobon, Manuel Vazquez, Neftali Nuñez(2020) .“Lifetime Analysis of Commercial 3 W UV-A LED”. Crystals 2020, 10(12), 1083. https://doi.org/10.3390/cryst10121083
[26] Xiaoli Wang(2017).“LED ring array light source design and uniform illumination properties analysis”. Optik , Volume 140, July 2017, Pages 273-281. https://doi.org/10.1016/j.ijleo.2017.04.045
指導教授 陳奇夆(Chi-Feng Chen) 審核日期 2023-2-1
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