以雙面非等向性濕蝕刻製備單晶石英深穿孔

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劉英男(Ying-Nan-Liu) 查詢紙本館藏

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光電科學與工程學系

論文名稱

以雙面非等向性濕蝕刻製備單晶石英深穿孔
(Deep-via on Crystalline Quartz by Double-side Anisotropic Wet Etching)

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摘要(中)

在通訊元件以及各式電子元件需求大量的時代中，需要高速處理以及大量運算的相關元件，例如基頻高頻的石英震盪器，但現今的石英元件的厚度跟高頻高度相關，一直是困難的製程目標，而石英微影製程是一種在微細尺度下製造微型元件的關鍵工藝之一，其在半導體製造和微奈米技術領域中扮演著重要的角色。
本文第一部份聚焦於石英微影製程中的雙面濕蝕刻技術，使用兩種玻璃蝕刻溶液在石英基板的兩側進行蝕刻，以實現並加速了微結構的製作，在AT-cut基板中圖案化直徑100μm的圓孔及150μm的橢圓圓孔，並且成功在孔洞蝕刻出垂直通道，使用了兩種蝕刻液，緩衝氧化物蝕刻劑(Buffered Oxide Etch)的單面蝕刻率為0.37μm/h，二氟化氫銨( Ammonium bifluoride) 單面蝕刻率為6.183μm /小時，第二部分為石英濕蝕刻的延伸應用，VR與AR眼鏡的舒適度與沉浸感與平板光學有著密切關係，而石英濕蝕刻產生的非等向蝕刻可以製作出非傳統的閃耀式光柵，而本文使用電子束曝光機在石英上圖案化週期400nm的光柵圖案，並使用緩衝氧化物蝕刻劑蝕刻一小時，成功蝕刻出部分光柵結構，並將結構使用嚴格耦合波分析法（Rigorous Coupled Wave Analysis, RCWA,）模擬，TE波中入射15度中有25%繞射效率，TM波中入射0度中有25%繞射效率。

摘要(英)

With an increasing demand for communication components and various electronic devices, there is a growing need for components that can handle high-speed processing and extensive computation. Quartz oscillators are one such component, which is used for baseband and high-frequency applications. However, manufacturing quartz components that are compatible with high-frequency operation while achieving the desired thickness has proven to be a challenging task. Quartz photolithography is a crucial process in fabricating microscale components, particularly when working with fine-scale dimensions, and plays a significant role in the fields of semiconductor manufacturing and micro-nanotechnology.
The first part of this paper focuses on the double-sided wet etching technique in quartz photolithography. Two types of glass etching solutions were used to etch both sides of the quartz substrate, facilitating and expediting the fabrication of microstructures. Circular holes with diameters of 100μm and elliptical holes with diameters of 150μm were patterned in AT-cut substrates. Vertical channels were successfully etched through the holes. Two etching solutions were employed: Buffered Oxide Etch with a single-sided etching rate of 0.37μm/h, and Ammonium Bifluoride with a single-sided etching rate of 6.183μm/h.
The second part explores the extended applications of wet etching in quartz. The comfort and immersion of VR and AR glasses are closely related to flat panel optics. The anisotropic etching produced by quartz wet etching enables the creation of non-traditional diffractive gratings. In this study, a periodic grating pattern with a 400nm cycle was patterned on quartz using an electron beam exposure machine. The structure was etched for one hour using Buffered Oxide Etch, resulting in the successful fabrication of partial grating structures. The structures were then simulated using Rigorous Coupled Wave Analysis (RCWA), revealing a diffraction efficiency of 25% for TE waves at an incident angle of 15 degrees and 25% for TM waves at an incident angle of 0 degrees.

關鍵字(中)

★ 濕蝕刻
★ 雙面蝕刻
★ 石英
★ 閃耀式光柵

關鍵字(英)

★ Wet etching
★ Double side etching
★ Quartz
★ Blaze grating

論文目次

目錄
摘要 iv
Abstract v
致謝 vii
目錄 viii
圖目錄 x
表目錄 xv
第1章緒論 1
1-1 前言 1
1-2 文獻回顧 3
1-3 研究動機及目標 5
第2章石英材料特性 7
2-1 石英晶體材料性質 7
2-2 石英晶體切向 8
2-3 石英蝕刻機制 10
2-4 石英晶體特殊晶格面 15
2-5 晶格面與活化能關係 17
2-6 米勒指標與晶格定義 19
第3章研究方法與實驗架構 22
3-1 研究架構 22
3-2 實驗製程規劃 23
3-2-1 石英晶圓選用與規格 24
3-2-2 光罩設計 25
3-2-3 基板清洗 26
3-2-4 黃光微影製程 27
3-3 金屬薄膜沉積 29
3-4 蝕刻液調配 31
3-5 蝕刻試片 32
第4章濕蝕刻結果與討論 34
4-1 BOE蝕刻分析 34
4-2 ABF蝕刻分析 40
第5章濕蝕刻應用:製作閃耀式光柵 49
5-1 介紹 49
5-2 光柵製作方式 50
5-2-1 E Beam or Laser Beam Directing Writing (電子束及雷射直寫) 50
5-2-2 Gray Scale (灰階) 51
5-2-3 Dry/Wet Etching (乾式/濕式蝕刻) 51
5-2-4 Diamond Ruling (鑽石刀刻法) 52
5-2-5 (Nanoimprint Lithography, NIL) 奈米壓印 52
5-2-6 Interferometric Exposure(干涉曝光) 53
5-3 繞射光柵 55
5-4 閃耀式光柵原理 56
5-5 光柵繞射理論 58
5-6 VR AR頭戴式顯示器文獻回顧 59
5-7 閃耀式光柵效率模擬 61
5-7-1 穿透式光柵模擬 61
5-7-2 反射式光柵模擬 65
5-8 反射式光柵製作 70
5-9 結論 74
參考文獻 75

參考文獻

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指導教授

王智明(Chih-Ming-Wang)

審核日期

2023-12-7

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