Modified Hartmann mask於氣體折射率 量測之應用

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姓名

吳坤庭(Kun-Ting Wu) 查詢紙本館藏

畢業系所

能源工程研究所

論文名稱

Modified Hartmann mask於氣體折射率量測之應用

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摘要(中)

本研究架設四波剪切干涉儀以量測氣體折射率，該系統使用Modified shack-hartmann mask(MHM)元件取代先前由透鏡陣列建構之Shack-Hartmann波前感測模組，為量測折射率提供了一個新的選擇。該石英材質之MHM元件係以半導體製程製作，用於使繞射光形成干涉圖形，以便後續解析折射率。相較於使用透鏡陣列之Shack-Hartmann波前感測模組，此MHM元件不因元件尺寸或是透鏡陣列數量影響取像解析度，且此系統可適用之頻寬範圍較大。本系統是透過分析繞射圖之傅立葉一階干涉點圖再運用反傅立葉轉換回推入射光波前，計算出待測氣體之入射光波前與參考波前之偏轉角，再使用波前偏轉角計算待測氣體折射率。本論文研究MHM之製程技術，深入分析元件品質，並架設於四波剪切干涉系統驗證其效能。

摘要(英)

A quadri-wave shearing interferometer is established in this study to measure the refractive index of gas. In this system, a complementary metal-oxide-semiconductor (COMS) sensor and a modified Shack-Hartmann mask (MHM) form a module to replace the Shack-Hartmann wavefront sensor using the lens array in the former system. Thus, this study offers a new option for measuring the refractive index of gas. Meanwhile, the MHM device made is fabricated via semiconductor processes. For generating diffraction patterns on the sensing plane. Compared to the Shack-Hartmann wavefront sensor with the lens array, this approach is not affected by the size nor the number of lenslets in the array, thereby improving the resolution of the captured image. Additionally, the system is applicable over a wider bandwidth. The refractive index of gas is measured via the following procedures. The Fourier transform of the captured image formed by the diffractive beams is counted, and then the first-order spots are obtained. Along with the analyses of the first-order spots, the refractive index of the gas can be derived via wave optics. This thesis studies on the fabrication techniques of MHM and the quality of the fabricated sample. The MHM sample has been integrated in a quadri-wave interferometer to verify its performance.

關鍵字(中)

★ 四波橫向干涉儀
★ 繞射元件製程
★ 氣體折射率
★ 傅立葉轉換

關鍵字(英)

★ Quadriwave lateral shearing interferometer
★ diffractive element fabrication
★ gas refractive index
★ Fourier transform

論文目次

目錄
摘要 i
Abstract ii
誌謝 iii
圖目錄 vii
表目錄 xi
第一章緒論 1
1.1 研究背景 1
1.2 文獻回顧 1
1.3 研究動機、目的與方法 7
1.4 論文架構 8
第二章原理 9
2.1 波的傳遞 9
2.2 波前像差 10
2.3 Shack Hartmann波前檢測儀 11
2.4 四波剪切干涉儀 11
2.5傅立葉轉換 15
2.6量測氣體折射率原理 16
2.7氣體折射率量測之動態範圍 17
第三章氣體折射率量測系統之架構與元件 19
3.1 量測流程 19
3.2 氣體折射率量測儀之系統架構 20
3.3 系統元件介紹 23
3.3.1綠光雷射 23
3.3.2空間濾波器與準直透鏡 25
3.3.3 CMOS工業相機 26
3.3.4系統調校治具 27
3.4 系統驗證 29
3.4.1平面波驗證 29
第四章 MHM元件模擬與製程 30
4.1 MHM元件之繞射模擬 30
4.2 基本製程介紹 34
4.2.1基板預處理 34
4.2.2光阻塗佈 35
4.2.3烘烤 36
4.2.4黃光製程 36
4.2.5薄膜濺鍍 36
4.2.6電漿蝕刻 37
4.3 MHM元件製程流程 37
4.4 小結 43
第五章實驗結果與討論 44
5.1 MHM元件之效率量測 44
5.2 環境空氣折射率測量 48
5.3 分析與討論 53
5.3.1壓力穩定度 53
5.3.2系統重現性 54
5.3.3量測範圍探討 55
5.4 動態範圍量測 57
第六章結論與未來展望 59
6.1 結論 59
6.2 未來展望 59
參考文獻 61

參考文獻

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指導教授

韋安琪(An-Chi Wei)

審核日期

2024-8-22

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