二氧化鈦光學薄膜在熱回火過程的光學和機械特性之研究

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陳錫釗(Hsi-Chao Chen) 查詢紙本館藏

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光電科學與工程學系

論文名稱

二氧化鈦光學薄膜在熱回火過程的光學和機械特性之研究
(Investigation of Thermal Annealing on the Optical and Mechanical Properties of TiO2 Thin Films)

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摘要(中)

本論文探討熱回火處理對二氧化鈦(TiO2)光學薄膜的光學特性，殘留應力的機械性質和微觀柱狀結構等影響。光學特性是經由穿透光譜加以判讀，殘留應力的量測則是透過自己架設的相位偏移式干涉儀。在微觀結構方面， X光繞射儀判斷薄膜內部的結晶狀況，X光光電子能譜儀可以了解熱回火過程的氧化模態變化，掃描式電子顯微鏡可以觀察不同熱回火溫度的柱狀微觀結構變化，原子力顯微鏡可以觀看膜質的表面輪廓和粗糙度，顯微干涉儀可量測較大面積的表面粗糙度。
在TiO2光學薄膜的製鍍過程中，選擇不同的基板溫度；發現基板溫度為150℃的TiO2光學薄膜，在不同溫度的熱回火中，不穩定的氧化鍵會斷裂形成次氧化鍵，隨熱回火溫度增加，會再度氧化為氧化鍵。在200℃的熱回火溫度時有最小的殘留應力，因此次氧化鈦在熱回火過程中扮演消除殘留應力的緩衝功能。在穿透光學頻譜、殘留應力、表面粗糙度變化和微觀結構觀察中，發現TiO2光學薄膜製鍍在基板溫度200℃和250℃中比150℃來的穩定。
在製鍍的方式中，選擇離子輔助電子槍蒸鍍法，射頻離子濺鍍和直流磁控濺鍍法等三種鍍膜方式製鍍TiO2光學薄膜，可以發現濺鍍出來的TiO2光學薄膜較為穩定。對不同的基板溫度製鍍出來的TiO2光學薄膜做再回火穩定度研究，發現再回火過程中，殘留應力變化量變小，不會高低起伏變化很大，表示膜質已經達到穩定的狀態。
綜合上述研究，對製鍍完的TiO2光學薄膜做熱回火處理，確實可以改變膜質的內部結構，也能使膜質趨向穩定。

摘要(英)

The effect of the thermal annealing of titanium oxide (TiO2) thin films on the optical properties, residual stress and microstructures were researched in this paper. Optical properties were analyzed by transparent spectra and residual stress was studied by phase-shift interferometer. In microstructure, crystallization was investigated by X-ray diffraction. The phase transformation during thermal annealing was studied by X-ray photo-electronic spectroscopy. Scanning electron microscopy was used to observe the status of column structure. Atomic force microscopy studied the profile of surface. Microscopy interferometer could get the roughness for large area.
We deposited the TiO2 thin films by different substrate temperature. At the substrate temperature of 150℃, the unstable TiO2 would break and form sub-titanium oxide by increasing temperature of thermal annealing. The smallest residual stress exited at the annealing temperature of 200℃, so the sub-titanium oxide could relax the residual stress by different Young’s module. The TiO2 thin films deposited at substrate temperature of 200℃ and 250℃ were more stability than 150℃.
Three different types deposited the TiO2 thin films—E-gun evaporation with IAD, RF ion-beam sputter, and DC magnetron sputter. The properties at both sputters were more stability than evaporation. In the reliability test, the variations of residual stress by the re-baking were small than before. These results told us that TiO2 thin films already got constant by thermal annealing.
In a word, the thermal annealing has improved the microstructure of the TiO2 thin films result that they were more stability than before.

關鍵字(中)

★ 熱回火
★ 二氧化鈦薄膜
★ 殘留應力

關鍵字(英)

★ residual stress
★ titanium oxide thin films
★ thermal annealing

論文目次

中文摘要…………………..……………………………………….....………....Ι
英文摘要………………..………………………………………..…..………….Ⅱ
致謝詞………………….……..…………………………………………………Ⅲ
目錄…………………………..……………………………………..….………..Ⅳ
圖目錄………………..……………………………………………...…………..Ⅵ
表目錄……………………………..……………………………….…..………..Ⅸ
符號說明……………………………………..…………………………...……..Ⅹ
第一章緒論 1
1-1 研究動機 1
1-2 文獻回顧 3
1-3 論文架構 5
第二章基本理論 6
2-1 前言 6
2-2 基本材料力學觀念 7
2-2-1 應力定義 7
2-2-2 應變定義 8
2-2-3 線彈性及廣義應力應變關係式 (廣義虎克定律) 9
2-2-4 熱應力 (Thermal stress) 11
2-3 薄膜應力 13
2-3-1 薄膜應力定義 13
2-3-2 Stoney 公式推導 15
2-3-3 薄膜熱應力 18
2-4 應力成因模態 19
2-4-1 缺陷模態 (Defect Model) 19
2-4-2 表面張力模態 (Surface Tension Model) 19
2-4-3 顆粒邊界模態 (Grain Boundary Model) 20
2-4-4 敲擊模態 (Peening Model) 21
2-5 相位偏移干涉法 23
2-5-1 相位偏移干涉儀的原理 23
2-5-2 相位還原疊加雜訊的消除 26
第三章微觀結構和表面輪廓的量測方法 31
3-1 前言 31
3-2 結晶態分析--X光繞射儀(X-ray Diffraction) 34
3-3 鍵結態分析-- X光光電子能譜儀(X-ray Photoelectron Spectroscopy) 36
3-4 剖面微觀態分析--掃描式電子顯微鏡(Scanning Electron Microscopy) 40
3-5 表面微觀分析--原子力顯微鏡和WYKO顯微干涉儀 43
3-5-1 原子力顯微鏡(Atomic force Microscopy) 43
3-5-2 WYKO 顯微干涉儀(WYKO microscopy interferometry) 45
第四章離子助鍍之TiO2光學薄膜在熱回火中光學和機械性質的變化 47
4-1 前言 47
4-2 實驗過程 49
4-3 量測儀器 50
4-4 實驗結果和討論 53
4-4-1 殘留應力量測 53
4-4-2 光學特性量測 54
4-4-3 X光光電子能譜儀(XPS)量測 56
4-4-4 X光繞射儀(XRD)量測 58
4-5 結論 59
第五章基板溫度對熱回火中TiO2光學薄膜應力和微觀結構影響 60
5-1 前言 60
5-2 實驗過程和量測儀器 62
5-3 實驗結果 63
5-3-1 殘留應力量測 63
5-3-2 光學特性量測 64
5-3-3 X光能譜儀分析結果 67
5-3-4 表面粗糙度量測 68
5-3-5 結晶特性 71
5-3-6 掃瞄式電子顯微鏡柱狀結構的量測 72
5-3-7 原子力顯微鏡(AFM)表面粗糙度的量測 74
5-4 結論 76
第六章不同製鍍方式對TiO2光學薄膜在熱回火中應力和光學特性影響 78
6-1 前言 78
6-2 實驗方法和過程 79
6-2-1電子槍離子助鍍法(E-gun with Ion-beam-assisted Deposition) 79
6-2-2 射頻離子濺鍍法( Radio-Frequency Ion-beam Sputter) 80
6-2-3 直流電漿磁控濺鍍法(DC Magnetron Sputter) 82
6-3 實驗結果和討論 84
6-3-1 殘留應力量測 84
6-3-2 光學特性量測 85
6-3-3 表面粗糙度量測 86
6-4 結論 87
第七章熱回火對TiO2光學薄膜穩定度的影響 88
7-1 前言 88
7-2 實驗方法 89
7-3 實驗結果與分析 90
7-4 結論 92
第八章結論 94
參考文獻 96

參考文獻

1. H.A. Macleod, ”Characteristics of thin-film dielectric material”, Chap. 15 in Thin-Film Optical Filters, 3rd Ed. (Academic, London, 2001), pp. 621-627.
2. E.J. Mills,” On Electrostriction”, Pro.Roy.Soc, 26, pp.504 (1877).
3. G.G. Stoney, ”The tension of metallic films deposited by electrolysis”, Proc. Roy. Soc., A82, pp.172-175 (1909).
4. R.W. Hoffman, “The mechanical properties of non-metallic thin films” AEC Techn. Rep.82, Atomic Energy Commision, Case Western Reserve University, Cleveland OH, 1975.
5. H.K. Pulker, J.M. Maser,”The origin of mechanical stress in vacuum deposited MgF2 and ZnS films,” Thin Solid Films,59,pp.32(1979).
6. P. J. Martin, H.A. Macleod, R.P. Netterfield, C.G. Pacey, and W.G. Sainty, ” Ion-beam-assisted deposition of thin films,” Appl. Opt., 22, pp.178-184 (1983).
7. J. Meaburn, “A search for nebulosity in the high galactic latitude radion spurs”, Z. Astrophys. 65 pp.93-104 (1967).
8. A.M. Title, T.P. Pope, and J.P. Andelin, “Drift in interference filters,” Part 1, Appl. Opt. pp.2675-2679 (1974).
9. D. Richmond, 1976 “Thin film narrow band optical filters” PhD Thesis (Newcastle upon Tyne Polytechnic.)
10. C.C. Lee, 1983 “Moisture adsorption and optical instability in the thin film coating” PhD Dissertation (University of Arizona).
11. K.H. Muller, “ A computer model for post deposition annealing of porous thin films”, J. Vacuum Sci. Technol. 3, pp.2089-2092 (1985).
12. G. Hass,” Preparation properties and optical applications of thin films of titanium dioxide,” Vacuum 2, pp.331-345(1952).
13. Q. Tang, K. Kikuchi, S. Ogura, and H.A. Macleod, ” Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition,” J. Vac. Sci. Technol. A17 (6), pp.1-6 (1999).
14. N. Martin, C. Rousselot, D. Rondot, F. Palmino and R. Mercier, ” Microstructure modification of amorphous titanium oxide thin films during annealing treatment”, Thin Solid Film, 300, pp.113-121 (1997).
15. J.W. Dally, W.F. Riley, Experimental Stress Analysis, chap.1, 3rd edition, McGRAW-HILL, New York,N.J.1991.
16. A.P. Boresi, and P.P. Lynn, Elasticity in Engineering Mechanics, chap.3, Prentice-Hall, Englewood cliffs, 1974
17. S. P.Timoshenko, and J.N. Goodier: Theory of Elasticity,2nd edition.,chap.1, McGRAW-HILL, New York, 1951.
18. E. Dowling Norman,” Stress-Strain Equations and Models” chap.4 in Mechanical Behavior of materials, Prentice-Hall, Englewood cliffs, pp.96~138, 1993.
19. R.W. Hoffman, in physical of nonmetallic Thin films, edited by C.H.S. Dupuy and A. Cachard, Plenum Press: New York,pp.273,1969.
20. E. Suhir and Y.C. Lee, in Hand book of Electronic Materials, Vol.1, ed. C. A. Dostal, ASM International, Metals Park,Ohio (1989)
21. J.D. Finegan and R.W. Hoffman,” Stress anisotropy in evaporated Iron films” ,J. Appl. Phys.,30,pp.597-598,1959
22. H.S. Story, R.W. Hoffman, J.Appl. Phys,27,pp193. (1956)
23. R.W. Hoffman, F.J. Anders, J.Appl. Phys,23,pp231. (1953)
24. B.A. Movchan, A.V. Demchishin, “Study of the structures and properties of thick vacuum condenstates of nickel, titanium, tungsten, aluminium oxide and zirconium dioxide”, Phys. Met. Metallorg.,28,pp.83. (1969)
25. H.K. Pulker. “Mechanical properties of optical films”, Thin solid film,89,pp.191 (1982)
26. R.C. Sun, T.C. Tisone, P.D.Cruzan, ”The origin of internal stress in low-voltage sputtered tungsten films,” J. of Applied Physics,Vol.46,No1(1975)
27. W.D. Nix, ”Mechanical Properties of thin films”, Metallurgical Trans. A20,pp.2217-2245(1989).
28. J.A. Floro, E. Chason, S.R. Lee” Real time measurement of epilayer strain using a simplified wafer curvature technique,” Mater.Res.Soc.Symp.Proc.406,pp.491 (1996)
29. F.M. D’Hecurle, “Aluminum films deposited by rf sputtering”, Metallurgical Trans. I, pp.725-732(1970)
30. K.H. Muller, “ Model for ion assisted thin film densification.” J. Appl. Phys. 59,pp.2803(1986)
31. K.H. Muller,” Ion-beam induced epitaxial vapour-phase growth: a molecular dynamics study.” Phys. Rev.B35, pp.7906 (1987).
32. K.H. Muller” Stress and microstructure of sputter deposited thin films: molecular dynamics investigations,” J. Appl. Phys. 62,pp.1796(1987).
33. F.M. D’Heurle and J.M. Harper,”Note on the origin of intrinsic stresses in films deposited via evaporation and sputtering”, Thin Solid Films, 171, pp.81-88 (1989).
34. C.A. Davis, “A simple model for the formation of compressive stress in thin film by ion bombardment”, Thin solid films,226,pp.30(1993)
35. G. Carter, ”Peening in ion assisted thin films- a generalized model,” J. Phys. D: Appl. Phys. 27, pp.1046(1994)
36. C.L. Koliopoulos, ”Simultaneous phase-shift interferometer,” in Advanced Optical Manufacturing and testingⅡ, V.J. Doherty ed., Proc. SPIE 1531,pp.119-127(1992).
37. W.T. Tsang, and A.Y. Chao, ”Growth of Ga As/GaAlAs by molecular beam epitaxy,” Appl.Phys.Lett.30, pp.293(1977).
38. P. Hariharan, B.F. Oreb, and T. Eiju, ”Digital phase-shifting interferometry: a simple erroe-compensiting phase calculation algorithm”, Appl. Opt. 26, pp.2504-2506 (1987).
39. C.K. Jim,” Polynomial fit of interferograms”, Appl.Opt., 26, pp.2504-2506 (1987).
40. C.K. Jim,” Polynomial fit of interferograms,” Ph.D.Dissertation,University of Arizona, Tuscon,1982.
41. S. Nakadate, and H. Saito, ”Fringe Scanning Speckle-Pattern Interferometry,” Appl. Opt.,24,pp. 2172(1985)
42. S. Nakadate, T.Yatagai, and H. Saito, ”Computer-Aided Speckle Patter Interformetry”, Appl.Opt.22(2),pp237-243(1983)
43. E. Archbold, J.M. Burch, and A.E. Ennos, ”Recording of In-Plane Surface Displacement by Double-Exposure Speckle Photography,” Opt. Acta 17(12),pp.883-898(1970)
44. E. Archbold, and A.E. Ennos,”Displacement measurement from Double-Exposure Laser Photographs,” Opt. Acta, 19(4),pp.253-271(1972)
45. J.W.Goodman, ” Dependence of Image Speckle Contrast on Surface Roughness,” Opt. Commun.,14(3),pp.324-327(1975).
46. K. Creath, ”Phase-Shifting Speckle Interferometry,” Appl. Opt., 24 (18), pp.582-584(1985)
47. K. Creath, and J.C. Wyant, ”Direct Phase Measurment of Aspherical Surfaces Contours,”Proc.SPIE,645,pp.101-106(1986)
48. Toyohiko Yatagai,Suezou Nakadate,Masanori Idesawa and Hiroyoshi Saito, ”Automatic fringe analysis using digital image processing techniques,” Opt. Eng. ,21,pp.432-435 (1982).
49. S.Lim Jae, ”Two-dimensional signal and image processing.” pp. 468-494 ,Prentice-Hall, Englewood cliffs, 1990.
50. A. Capanni,L. Pezzati, D. Bertani, M. Cetica, F. Francini, ”Phase-shifting speckle interferometry : noise reduction filter for phase unwrapping.” Opt. Eng.,36,pp.2466-2472(1997)
51. F. Qian, X. Wang, and Y. Bu, ” Adaptive filter for unwrapping noisy phase image in phase-stepping interferometry.” Optics & Laser Techno.,33,pp479-486(2001)
52. G. Binning, H.Rohrer , C. Gerber, and E. Weibel, ”Surface Studies by Scanning Tunneling Microscopy,” Phys. Rev. Lett.,49,pp.57-61(1982)
53. F.W. Fified and D. Kealey, ”Principles and Practice of Analytical Chemistry,” 2nd Edition, International Textbook Co Ltd,1983.
54. K.Siegbahn, C. Nordling, A. Fahlman, R.Nordberg, K.Hamirin, J. Hedman,G. Johansson, T.Bergmark, S.-E. Karlsson,I. Lindgren,and B.Lindgren:: Atomic ,Molecular and Solid State Structure Studied by Means of Electron Spectroscopy, Almqvist &Wiksells, Stockholm, 1967.
55. C.J.Chen, Introduction to Scanning Tunneling Microscopy,Oxford University Press, New York ,1993.
56. G. Binning, H. Rohrer , C.F. Quate, and C. Gerber, ”Atomic Force Microscopy,” Phys. Rev. Lett.,56,pp.930-933(1986)
57. WYKO –MHT-ⅢOperator’s Guide, Version 1.50, WYKO Corrporation proc.December 1994.
58. 李正中,薄膜光學與鍍膜技術,藝軒圖書出版社,第四版,pp.433-447,2004.
59. P.J. Martin, H.A. Macleod, R.P. Netterfield, C.G. Pacey and W.G. Sainty, ” Ion-beam-assisted deposition of thin films,” Appl. Opt., 22, pp.178-184 (1983).
60. J.R. McNeil, A.C. Barron, S.R. Wilson and W.C. Herrmann, ”Ion-assisted deposition of optical thin film: low energy vs high energy bombardment,” Appl. Opt., 23, pp.552-559 (1984).
61. J.R. McNeil, G.A. Al-Jumaily, K.C. Jungling and A.C. Barron, ” Properties of TiO2 and SiO2 thin films deposited using ion assisted deposition, ” Appl. Opt., 24, pp.486-489 (1985).
62. Q. Tang, K. Kikuchi, S. Ogura and H.A. Macleod, ” Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition,” J. Vac. Sci. Technol. A17 (6), pp.1-6 (1999).
63. J.C. Manifacier, J. Gasiot, and J.P. Fillard, ”A simple method for the determination of the optical constants n, k and the thickness of a weekly absorbing thin film” J. Physics Eng., 9, pp.1002-1004 (1976)
64. C.L. Tien, C.C. Lee and C.C. Jiang, ” The measurement of thin film stress using phase shifting interferometry”, J. Mod. Opt., 47, pp.839-849 (2000).
65. J. Chastain and R.C. King, Handbook of X-ray Photoelectron Spectroscopy, Physical Electronics Inc., Minnesota, pp168-169, 1995.
66. C.N. Sayers and N.R. Armstrong, “X-ray photoelectron spectroscopy of TiO2 and other titan-ate electrodes and various standard titanium oxide materials: surface compositional changes of the TiO2 electrode during photo-electrolysis,” Surf. Sci. 77, 301-320(1978)
67. L.J. Meng, M. Andritschky, and M.P. Dos Santos, ”Investigations of titanium oxide films deposited by d.c. reactive magnetron sputtering in different sputtering pressures”, Thin Solid Films, 226, pp.22-29 (1993).
68. L.J. Meng, M. Andrtschky and M.P. Dos Santos,”The effect of substrate temperature on the properties of d.c. reactive magnetron sputtered titanium oxide films”, Thin Solid Films, 223, pp.242-247 (1993).
69. N. Martin, C. Rousselot, D. Rondot, F. Palmino and R. Mercier, ” Microstructure modification of amorphous titanium oxide thin films during annealing treatment”, Thin Solid Film, 300, pp.113-121 (1997).
70. H. K. Pulker, “Characterization of optical thin films,” Appl. Opt. 18, pp.1969-1977 (1979)
71. S.C. Chiao, B.G. Bovard, and H.A. Macleoad, “Repeatability of the composition of titanium oxide films produced by evaporation of Ti2O3,” Appl. Opt. 37, pp.5284-5290 (1998).
72. H.K. Pulker, G. Paesold, and E Ritter, “Refractive indices of TiO2 film produced by reactive evaporation of various titanium-oxide phases,” Appl. Opt. 15,pp. 2986-2991 (1976).
73. G. Atanassov, J. Turlo, J.K. Fu, and Y.S. Dai,” Mechanical, optical and structural properties of TiO2 and MgF2 thin films deposited by plasma ion assisted deposition,” Thin Solid Films 342,pp.83-92 (1999).
74. H.K. Jang, S.W. Whangbo, Y.K. Choi, Y.D. Chung, K. Jeong, C.N. Whang, Y.S. Lee, H-S. Lee, J.Y. Choi, G.H. Kim, and T.K. Kim, ”Titanium oxide films on Si(100) deposited by e-beam evaporation,” J. Vac. Sci. Technol.A 18(6), pp.2932-2936 (2000).
75. I. Tsyganov, M.F. Maitz, E.Wiesser, F. Prokert, and A. Rogozin, “Structure and properties of titanium oxide layers prepared by metal plasma immersion ion implantation and deposition,” Surf. Coat.Technol.174-175, pp.591-596 (2003).
76. P.J. Martin, H.A. Macleod, R.P. Netterfield, C.G. Pacey, and W.G. Sainty, “ Ion-beam-assisted deposition of thin films,” Appl. Opt. 22, pp.178-184 (1983).
77. J.R. McNeil, A.C. Barron, S.R. Wilson and W.C. Herrmann,” Ion-assisted deposition of optical thin film: low energy vs high energy bombardment”, Appl. Opt. 23, pp.552-559 (1984).
78. J.R. McNeil, G.A. Al-Jumaily, K.C. Jungling and A.C. Barron, ” Properties of TiO2 and SiO2 thin films deposited using ion assisted deposition”, Appl. Opt., 24, pp.486-489 (1985).
79. Y. Leprince-Wang, K. Yu-Zhang, V. Nguyen Van, D. Souche, and J. Rivory, “Correlation between microstructure and the optical properties of TiO2 thin films prepared on different substrates”, Thin Solid Films, 307,pp. 38-42 (1997).
80. Nicolas Martin, Christophe Rousselot, Daniel Rondot, Franck Palmino, and Rene Mercier, ”Microstructure modification of amorphous titanium oxide thin films during annealing treatment”, Thin Solid Films, 300, pp.113-121 (1997)
81. C.C. Lee, H.C. Chen, and C.C. Jaing, “Effect of thermal annealing on the optical properties and residual stress of TiO2 films Produced by ion-assisted deposition,” Appl. Opt. 44, pp.2996-3000(2005).
82. H.K. Pulker, G. Paesold, and E. Ritter, “Refractive indices of TiO2 film produced by reactive evaporation of various titanium-oxide phases,” Appl. Opt. 15, pp.2986-2991 (1976).
83. S.C. Chaio, B.G. Bovard, and H.A. Macleod, “Repeatability of the composition of titanium oxide films produced by evaporation of Ti2O3,” Appl. Opt. 37, pp.5284-5290 (1998).
84. C.N. Sayers, and N.R. Armstrong, “X-ray photoelectron spectroscopy of TiO2 and other titan-ate electrodes and various standard titanium oxide materials: surface compositional changes of the TiO2 electrode during photo-electrolysis,” Surf. Sci. 77, pp.301-320 (1978).
85. J.M. Elson, J.P. Rahn, and J.M. Bennett, “Relationship of the total integrated scattering from multiplayer-coated optics to angle of incidence, polarization, correlation length, and roughness cross-correlation properties,” Appl. Opt. 22,pp.3207-3219 (1983).
86. C.C. Lee, J.C. Hsu, D.T. Wei, and J.H. Lin, “Morphology of dual beam ion sputtered films investigated by atomic force microscopy,” Thin Solid Films 308-309 ,pp.74-78 (1997).
87. S. Ben Amor, L. Guedri, G. Baud, M. Jacquet, M. Ghedira, “Influence of the temperature on the properties of sputtered titanium oxide films”, Materials Chemistry and Physics, 77, 903-911 (2002)
88. H.A. Macleod, ”The production of thin film”, Chap. 15 in Thin-Film Optical Filters, 3rd Ed. (Academic, London), pp. 417-425, 2001.
89. J.A. Thornton, “Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings”, J. Vac. Sci. Technol. 11, pp.666-670 (1974).
90. H.K. Pulker,” Coating on Glass,” Chap7, Elsevier Science Publishers B.V. 1984
91. H.A. Macleoad,” Monotoring of optical coatings,” Appl. Opt. 20, pp82-89 (1981).
92. B. Vidual, and E. Pelletier,” Nonquarter wave multilayer filters: optical monitoring with a minicomputer allowing correction of thickness error”, Appl. Opt.18, pp 3857-3862(1979)
93. R.Richier,A.Fornier, and E. Pelletier,” Optical monitoring of thin film thickness”, Thin Film for Optical Systems, Chap.3,ed. By Flory F.R., Marcel Dekker,Inc. 1995

指導教授

李正中(Cheng-Chung Lee)

審核日期

2006-1-5

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