博碩士論文 90323081 詳細資訊


姓名 楊正斌(Cheng-Pin Yang)  查詢紙本館藏   畢業系所 機械工程學系
論文名稱 流體黏度對旋塗減量之影響
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摘要(中) 摘要
現今科技的不斷發展,使得半導體工業方面的製程也不斷的改進,以往使用在8吋以下晶圓的旋塗均是由中心點注入流體,達到塗佈的目的,但隨晶圓面積加大所需的流體原料相對也須增加,如此將造成原料大量浪費增加成本,且將會造成環境污染。在本實驗中採用兩種不同,第一部分為靜置後旋轉(Release)塗佈模式,第二部份為移動注液(Mobile Injection)塗佈模式,經由實驗後發現在使用黏度較高的流體時,採用第一種方式將需要更多的原料使晶圓表面塗滿,因此,我們需要不同的旋轉塗佈模式來改進這些缺點。實驗的第二部分為在旋轉塗佈時改變注入流體的噴嘴的位置,不同於以往在中心點位置注入,我們改變噴嘴的位置,在塗佈過程的初始階段,晶圓利用低轉速旋轉並移動噴嘴使之從中心向外移動,產生螺旋紋的原料,再經由加速使流體向外擴張並均勻的塗佈於晶圓表面,在實驗中我們改變晶圓轉速、噴嘴移動速度及注液速率獲得最佳的塗佈模式,如此將可節省許多原料浪費,並進一步提供半導體業界參考。
關鍵字(中) ★ 靜置後旋塗
★ 螺旋紋
★ 旋轉塗佈
關鍵字(英) ★ spiral
★ spin coating
論文目次 目錄
摘要..... I
致謝..... III
目錄..... IIII
表目錄... V
圖目錄... VI
符號說明表........ XI
第一章 緒論....... 1
1-1 前言....... 1
1-2 文獻回顧... 2
1-2.1 旋轉塗佈之相關文獻回顧.... 2
1-2.2 風剪效應相關文獻回顧...... 5
1-2.3 不穩定手指狀流之相關文獻回顧........7
第二章 實驗設備與方法...... 11
2-1 注液系統簡介.......... 11
2-2 旋塗轉速控制系統...... 12
2-3 影像擷取系統.......... 14
2-4 實驗方法...............15
第三章 結果與討論..........18
3-1 靜置後旋轉對旋塗液模擴展之影響...........18
3-1.1 不穩定手指狀流的生成...... 18
3-1.2 科氏力對不穩定手指狀流的影響....... 19
3-1.3 靜置後旋轉液膜擴展情形.....21
3-2 螺旋波紋塗佈模式對旋轉塗佈的影響........ 23
3-2.1 螺旋波紋塗佈模式參數的決定......... 23
3-2.2 使用不同黏度的矽油測試螺旋波紋塗佈模式是
否可行......... 25
第四章 結論...... 28
參考文獻.......... 31
附表..... 38
附圖..... 39
參考文獻 參考文獻
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指導教授 周復初(Fu-Chu Chou) 審核日期 2003-7-8
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