紅外光學薄膜之研究

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姓名

古士良(Shih-Liang Ku) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

紅外光學薄膜之研究
(The research of infrared optical thin film)

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摘要(中)

本文主要研究中紅外波段之光學薄膜，材料以鍺、一氧化矽及氮化矽為主，而有別於傳統的熱蒸鍍製程，本研究以離子束助鍍的製程方式製備上述薄膜，以期能在較低的溫度下鍍製出具備良好特性之紅外光學薄膜，並藉由紅外變角度光譜式橢圓偏光儀、傅氏轉換紅外線光譜儀、紫外-近紅外光光譜儀、X-ray光電子能譜儀、掃描式電子顯微鏡、原子力顯微鏡、X-ray 繞射儀、穿透式電子顯微鏡、奈米壓痕測試機等不同的量測儀器與分析方法，探討離子轟擊對各薄膜之組成成分、結晶狀態、微觀結構等結構特性，以及紅外波段光學特性的影響。
實驗結果顯示，相較於傳統的熱蒸鍍製程，在離子束能量及電流密度等製程條件的選擇下，離子束助鍍可以有效地提升鍺與一氧化矽等薄膜的紅外光學及結構特性，同時也可鍍製出具有良好光學特性的氮化矽薄膜，且中紅外截止濾光鏡以及抗反射膜等多層膜的鍍製結果，也呈現相當優異的光學性能。相關的實驗結果驗證了以離子束助鍍法鍍製紅外光學薄膜之效益。

摘要(英)

This thesis focus on the mid-infrared optical thin films including germanium (Ge), silicon monoxide (SiO) and silicon nitride (SiN) thin films. The difference from the conventional thermal evaporation process, these films were prepared by ion beam assisted deposition (IAD) process and expected to obtain the desirable properties at lower temperature. These films were analyzed using the infrared variable angle spectroscopic ellipsometry, Fourier transform infrared spectrometry, UV–NIR spectrophotometer, X-ray photoelectron spectrometry, scanning electron microscopy, atomic force microscopy, X-ray diffraction transmission electron microscopy and nano indenter. The influences of ion bombardment on the structural properties, such as composition, crystalline, and microstructure, and on the mid-infrared optical properties of these films were investigated.
The results showed that compared the conventional thermal evaporation process, the mid-infrared optical and structural properties of Ge and SiO thin films could be effectively improved by using the selective conditions of the ion beam voltage and current density in the IAD process. In addition, the SiN thin film with good optical property could be obtained using the IAD technique. Furthermore, the mid-infrared edge filter and anti-reflection coating, which were prepared by using the IAD process, also exhibited the desirable optical performance. These results presented in this work indicated that the IAD technique would have a positive effect on the optical and structural properties of the infrared thin films.

關鍵字(中)

★ 離子束
★ 薄膜

關鍵字(英)

★ Ion beam
★ Thin film

論文目次

目錄
中文摘要 Ⅰ
Abstract II
誌謝 III
目錄 IV
圖目錄 VII
表目錄 X
符號表 XⅠ
第一章緒論 1
1.1 研究動機 2
1.2 研究方法 3
1.3 文獻回顧 3
第二章基本理論 6
2.1 薄膜成長理論 6
2.2 結構區模型 10
2.3 電子槍蒸鍍 13
2.4 離子束助鍍 15
第三章研究方法 18
3.1 實驗設備 18
3.1.1 材料與基板的選用 18
3.1.2 濺鍍機架構 18
3.1.3 離子源架構 20
3.1.4 實驗參數 22
3.2 量測方法與儀器 24
3.2.1 紅外變角度光譜式橢圓偏光儀 24
3.2.2 傅氏轉換紅外線光譜儀 27
3.2.3 紫外-近紅外光光譜儀 27
3.2.4 X-ray光電子能譜儀 28
3.2.5 掃描式電子顯微鏡 28
3.2.6 原子力顯微鏡 29
3.2.7 X-ray 繞射儀 31
3.2.8 穿透式電子顯微鏡 31
3.2.9 奈米壓痕測試機 33
第四章結果與討論 35
4.1 Ge單層薄膜之特性分析 35
4.1.1 Ge薄膜的光學性質 35
4.1.2 Ge薄膜的結構性質 39
4.2 SiO單層薄膜之特性分析 47
4.2.1 SiOx薄膜的結構性質 47
4.2.2 SiOx薄膜的光學性質 63
4.3 SiN單層薄膜之特性分析 65
4.3.1 SiNx薄膜的結構性質 65
4.3.2 SiNx薄膜的光學性質 76
4.4 多層膜的鍍製 85
4.4.1 抗反射膜設計與鍍製 86
4.4.2 截止濾光鏡設計與鍍製 89
第五章結論 91
參考文獻 94
論文著作 101

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指導教授

李正中(Cheng-Chung Lee)

審核日期

2010-6-2

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