博碩士論文 92323030 詳細資訊




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姓名 闕明珠(Ming-Chu Chueh)  查詢紙本館藏   畢業系所 機械工程學系
論文名稱 微透鏡陣列製程分析
(Fabrication of Microlens Array)
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摘要(中) 微光學透鏡應用在光電產業上越來越廣泛,微光學透鏡發展出許多製造方法,其中大部分昂貴且費時。本計畫將以高深寬比(High aspect ratio)黃光製程技術搭配超高硬度(Extra-hardness)二元鎳鈷(Ni-Co)合金電鑄,製作金屬材質模仁,並配合利用壓印(Hot embossing)製作出高分子微透鏡陣列,以創新電鑄配方製造高硬度模仁提高模具壽命方法不僅省時省錢,亦可大量製作出微透鏡陣列。
因此,本計畫將發展高硬度電鑄技術與壓印製程技術相互搭配製作出高分子微透鏡陣列,鎳鈷模壓印製程,將被壓印材料加熱,如同蓋印章之方式,將印章壓在加熱軟化後之材料上,便可得到其微光學透鏡之轉印。本研究中為了瞭解微透鏡形成的機制特性,所以改變其厚膜光阻(AZ4620)的直徑、熱回流(Reflow)時間與溫度等條件,及電鑄應用,探討條件參數對其微透鏡形成幾何形狀的影響及量測其不同參數條件製作出微透鏡陣列之光學特性。
摘要(英) This project presents a concept to fabricate micro-optical devices using high-aspect-ratio lithography, extra-hardness electroplating, and hot embossing processes. A bath of electroplating electrolyte will be formulated to fabricate micro-optics mold inserts with extra-hardness Ni-Co alloy. It is a novel method to increase the life of the mold insert during fabricating micro-optical devices. With this high hardness, the mold inserts can resist high abrasiveness and wear so as to extend the mold cycle life and reduce the idle time of replacing mold plates during fabrications. Therefore, the process of fabrications of micro-optics can be more cost-effective. In this study, different thicknesses of photoresist AZ4620 will be tried for micro-optical templates with different radiuii. Also, parametric effects of reflow time, and temperature on micro-optical profiles will be characterized and discussed as well. Finally, the optical properties such as focal length of developed micro-optics will be measured and tested.
關鍵字(中) ★ 二元鎳鈷合金電鑄
★ 超高硬度
★ 微透鏡
關鍵字(英) ★ extra-hardness
★ micro-optics
★ Ni-Co alloy electroplating
論文目次 中文摘要---------------------------------------------------------------------Ⅰ
英文摘要---------------------------------------------------------------------Ⅱ
目錄-------------------------------------------------------------------------Ⅲ
表目錄-----------------------------------------------------------------------Ⅵ
圖目錄-----------------------------------------------------------------------Ⅶ
第一章 緒論-------------------------------------------------------------------1
1.1背景說明-----------------------------------------------------------------1
1.2文獻回顧-----------------------------------------------------------------3
1.3研究目的-----------------------------------------------------------------9
第二章 實驗原理--------------------------------------------------------------10
2.1黃光製程----------------------------------------------------------------10
2.2真空濺鍍製程------------------------------------------------------------15
2.3微型電鑄製程------------------------------------------------------------18
2.4微型熱壓製程------------------------------------------------------------24
2.4.1熱壓成型奈米壓印技術-------------------------------------------24
2.4.2步進光感成形式奈米壓印技術----------------------------------25
2.4.3可撓性奈米壓印技術----------------------------------------------25
2.4.4雷射輔助奈米壓印技術-------------------------------------------26
2.5實驗量測儀器設備------------------------------------------------------27
2.5.1光學顯微鏡及其量測原理----------------------------------------27
2.5.2表面輪廓測量儀----------------------------------------------------27
2.5.3 測算曲率半徑------------------------------------------------------27
第三章 微透鏡製程與實驗參數設定---------------------------------------29
3.1 AZ4620微影製程--------------------------------------------------------29
3.1.1 AZ4620厚膜光阻之材料特性------------------------------------29
3.1.2 AZ4620微影製程步驟---------------------------------------------30
3.2 AZ4620光阻熱回流法------------------------------------------------- 31
3.3真空濺鍍製程------------------------------------------------------------33
3.4 Ni-Co微型電鑄製程----------------------------------------------------33
3.5微型熱壓製程------------------------------------------------------------35
第四章 結果與討論------------------------------------------------------------37
4.1 AZ4620厚膜光阻塗佈--------------------------------------------------37
4.2 AZ4620熱回流製程探討-----------------------------------------------37
4.2.1加熱時間相同,改變恆溫溫度值--------------------------------38
4.2.2加熱溫度相同,改變加熱時間值--------------------------------40
4.2.3熱回流行為歸結-----------------------------------------------------41
4.3真空濺鍍----------------------------------------------------------------43
4.4微型電鑄----------------------------------------------------------------43
4.5熱壓成型----------------------------------------------------------------44
4.6影響良率的因素----------------------------------------------------------44
第五章 初步結論與未來展望------------------------------------------------46
5.1初步結論----------------------------------------------------------------46
5.2未來展望----------------------------------------------------------------47
參考文獻-------------------------------------------------------------------- 48
參考文獻 [1].Borrelli N. F., Morse D. L., Bellman R. H., and Morgan W. L., “Photolytic technique for producing microlenses in photosensitive glass”, Applied Optics, 24, pp. 2520-2525, 1985.
[2].M. C. Hutley, “Optical techniques for the generation of microlens arrays,” J. of Modern Optics, 37, pp. 253-265, 1990.
[3].Yasuhiro SATOH, Yoshiyuki KIYOSAWA, Toshihiro ISHII, and Hironobu MIFUNE, “High Accuracy Microlens Fabrication Fethod and it’s Application to LD Beam Profile Converter”, Ricoh Technical Report No.29, pp. 13-20, 2003.
[4].D.-S. Ko, “A decompression method for the fabrication of polymer microlens arrays,” Infrared Physics & Technology, 45, pp. 177–180, 2004.
[5].H Ottevaere, B Volckaerts, J Lamprecht, J Schwider, A Hermanne, I Veretennicoff and H Thienpont, “Two-dimensional plastic microlens arrays by deep lithography with protons: fabrication and characterization,” J. Opt. A: Pure Appl. Opt., 4, pp. S22–S28, 2002.
[6].W.R. Cox, T. Chen, D. Ussery, D.J. Hayes, J.A. Tatum and D.L. MacFarlane, “Microjetted Lenslet-tipped Fibers,” Optics Communications, Vol. 123, pp. 492-496, 1996.
[7].W.R. Cox, T. Chen, D.W. Ussery, D.J. Hayes, and, R.F. Hoenigman, “Microjet printing of anamorphic microlens arrays,” SPIE Proceedings, Vol. 2687, pp.89-98, 1996.
[8]. W.R. Cox, T. Chen and D.J. Hayes, “Micro-Optics Fabrication by Ink-Jet Printing,” OSA Optics & Photonics News, Vol. 12, No. 6, pp. 32-35, June, 2001.
[9]. D. L. MacFarlane, V. Narayan, J. A. Tatum, W. R. Cox, T. Chen, and D. J. Hayes, “Microjet Fabrication of Microlens Arrays”, IEEE Photonics Technology Letters, Vol. 6, No. 9, pp. 1112-1114, September, 1994.
[10].Jackie Chen, Weisong Wang, Ji Fang and Kody Varahramyan, “Variable-focusing microlens with microfluidic chip”, J. Micromech. Microeng., Vol. 14, pp. 675–680, 2004.
[11].Choon-Sup Lee, Chul-Hi Han, “A novel refractive silicon microlens array using bulk micromachining technology”, Sensors and Actuators A, Vol.88, pp.87-90, 2001.
[12]. M. Oikawa, K. Iga. and T. Sanada, “Distributed-index planar microlens prepared from ion-exchange technique”, Jpn. J. Appl. Phys. Vol. 20, pp.L296-L298, 1981.
[13].Li-Wei Pan, Xinjiang Shen, and Liwei Lin, “Microplastic Lens Array Fabricated by a Hot Intrusion Process”, Journal of microelectromechanical systems, Vol.13, No.6,pp.1063-1071 December 2004.
[14].L.G. Commander, S.E. Day, D.R. Selviah, “Variable focal length microlenses,” Optics Communications Vol. 177, pp. 157–170, 2000.
[15].Yoonseuk Choi, Jae-Hong Park, Jae-Hoon Kim and Sin-Doo Lee, “Fabrication of a focal length variable microlens array based on a nematic liquid crystal,” Optical Materials, 21, pp. 643–646, 2002.
[16].Hongwen Ren, Yun-Hsing Fan, Sebastian Gauza and Shin-Tson Wu, “Tunable microlens arrays using polymer network liquid crystal,” Optics Communications, 230, pp. 267–271, 2004.
[17].Teng-Kai Shin, Jeng-Rong Ho, and J.-W. John Cheng, “A new approach to polymeric microlens array fabrication using soft replica molding,” IEEE PHOTONICS TECHNOLOGY LETTERS, Vol. 16, No. 9, pp.2078-2080, 2004.
[18].Yung-Chun Lee, Chun-Ming Chen and Chun-Ying Wu, “A new excimer laser micromachining method for axially symmetric 3D microstructures with continuous surface profiles,” Sensors and Actuators A, 117, pp. 349–355, 2005.
[19].S. A. Takatsuki, T.Y. Nara, S.O. Kyoto, MICRO ASPHERICAL LENS AND FABRICATING METHOD THEREFOR AND OPTICAL DEVICE, US Patent 5148322, 1992.
[20].N. Watanabe, H. Hamada, F. Funada, Y. Koriyama, OPTICAL DEVICE HAVING A MICROLENS AND A PROCESS FOR MAKING MICROLENSES, US Patent 5225935, 1994.
[21].K. Yuichi, PROCESS FOR PRODUCING MICRO LENS, EP0690028 A1 19960103, 1996.
[22].K. Umeki, S. Sato, M. Sato, GRADATION MASK METHOD OF PRODUCING THE SAME AND METHOD OF FORMING SPECIAL SURFACE PROFILE ON METERIAL USING GRADATION MASK, US Patent 5830605, 1998.
[23].Sihai Chen, Xinjian Yi and Hong Ma, “A novel method of fabrication of microlens arrays,” Infrared Physics & Technology, 44, pp. 133–135, 2003.
[24].Su-dong Moon, Shinill Kang, Jong-Uk Bu, “Fabrication of polymeric microlens of hemispherical shape using micromolding,” Opt. Eng. 41(9), pp. 2267–2270, 2002.
[25].Su-dongMoon, Namsuk Lee and Shinill Kang, “Fabrication of a microlens array using micro-compression molding with an electroformed mold insert,” J. Micromech. Microeng. 13, pp. 98–103, 2003.
[26].C T Pan, “Design and fabrication of sub-micrometer eight-level bi-focal diffraction optical elements,” J. Micromech. Microeng. 14, pp. 471–479, 2004.
[27].D. L. MacFarlane, V. Narayan, J. A. Tatum, W. R. Cox, T. Chen, and D. J. Hayes, “Microjet Fabrication of Microlens Arrays,” IEEE Photonics Technology Letters, Vol. 6, No. 9, pp. 1112-1114, 1994.
[28].P Ruther, B Gerlach, J G¨ottert, M Ilie, J Mohr, A M¨uller and C Oßmann, “Fabrication and characterization of microlenses realized by a modified LIGA process,” Pure Appl. Opt. 6, pp. 643–653, 1997, Printed in the UK.
[29].Stephen Y. Chou, Peter R. Krauss, Wei Zhang, Lingjie Guo, and Lei Zhuang, “Sub-10 nm imprint lithography and applications”, J. Vac. Sci Technol. B 15(6), pp.2897-2904, Nov/Dec, 1997.
[30].Hua Tan, Andrew Gilbertson, Stephen Y. Chou, “Roller nanoimprint lithography”, J. Vac. Sci Technol. B 16(6), pp.3926-3928, Nov/Dec, 1998.
指導教授 李雄(Shyong Lee) 審核日期 2005-7-3
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