大尺寸晶圓厚膜塗佈

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姓名

陳漢宗(Han-Tsung Chen) 查詢紙本館藏

畢業系所

機械工程學系在職專班

論文名稱

大尺寸晶圓厚膜塗佈
(Study on Thick-Film Coating on Large Size Wafer)

相關論文

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摘要(中)

隨著科技不斷進步，半導體工業發展也由早期的5吋、6吋晶圓為主，演進到目前以12吋晶圓為主流。本實驗以12吋晶圓為主，利用不同的塗佈方式與轉速之應用，同時考慮預塗及雙層塗佈對膜厚之相對應關係，探討如何以最少的塗佈液、最短的塗佈時間、較低的塗佈轉速，在12吋晶圓上塗佈一層膜厚均勻之塗佈層。實驗結果發現，以1000cP之矽油為預塗層時，其膜厚與轉速及塗佈時間呈現一線性之分佈圖，而進行第二層塗佈時膜厚與轉速線性分佈現象只介於轉速為1100rpm至1300rpm之間。而以相同黏滯係數之矽油所塗佈之不同預塗層厚度，對最終液膜厚度並無影響。另外分別以不同黏滯係數100cP及1000cP之矽油為預塗層時，雖然預塗層厚度相同，但在第二層塗佈條件相同下，最終塗佈液膜厚度也不會一樣。因此本實驗以1000cP矽油搭配單層及雙層塗佈方法，在塗佈轉速2000rpm以下，控制塗佈時間及矽油用量，即可在12吋晶圓上塗佈一層厚度介於30~100μm之間且均勻度高於97%之液膜，達到本實驗所期望之大尺寸晶圓塗佈膜厚。

摘要(英)

With science and technology being constantly progressive, semiconductor industry it develops to be the main fact by early 5、 6 inch wafer, gradual progress has become the mainstream by 12 inch wafer up till now. This experiment base on 12 inch wafer with different coating method and spin speed applying, consider the film thickness relation of first and second layer coating at the same time. Discussion how to use the least liquid、shortest coating time、lower spin speed in 12 inch wafer with thick and even coating. The experimental result is found when use 1000cP silicon oil as first layer coating, the film thickness present as a linear distribution map, same phenomenon is only between 1100rpm to 1300rpm while carrying on the second layer coating. Different first layer film thickness with the same viscosity of silicon oil has not influenced to the final thickness. While regarding different viscosity 100cP and 1000cP of silicon oil as first layer coating, though the thickness is the same, but under the same condition of second layer coating the final film thickness can not be the same either. This experiment match single and double layer coating method with the silicon oil of 1000cP、under spin speed 2000rpm、control spin time and oil of silicon , can coating one thick film while between 30 to 100μm and uniformity degree higher than 97% of liquid film in 12 inch wafer. It is thick coating on 12 inch wafer which experiment expects.

關鍵字(中)

★ 雙層塗佈
★ 大尺寸晶圓

關鍵字(英)

★ Double Layer Coating
★ Large Size Wafer

論文目次

目錄
中文摘要 I
英文摘要 Π
目錄 Ⅳ
表目錄 Ⅵ
圖目錄 Ⅶ
第一章緒論 1
1-1 前言. 1
1-2 研究目的與動機 2
1-3 文獻回顧 3
第二章實驗設備與方法 11
2-1 旋轉塗佈控制系統 11
2-2 影像擷取系統 12
2-3 膜厚量測系統 13
2-4 實驗方法 14
第三章結果與討論 18
3-1 塗佈方式對液膜擴展之影響 18
3-2 轉速對液膜擴展之影響 19
3-3 預塗厚度對整體膜厚影響 19
3-4 第二層塗佈轉速與膜厚之相對應關係 20
3-5 影響膜厚均勻度之原因 21
第四章結論 23
參考文獻 25
附表 30
附圖 38

參考文獻

1. A.G. Emslie, F.T. Bonner, and L.G. Peck, Flow of a Viscous Liquid on a Rotating Disk, J. Appl. Phys., Vol. 29, No. 5, pp. 858-863(1958).
2. E. Momoniat, D.P. Mason, Investigation of the Coriolis Force on a Thin Fluid Film on a Rotating Disk, Int. J. Non-Linear Mech., Vol. 33, No. 6, pp. 1069-1088(1998) .
3. A. Acrivos, M. Shan, and E.E. Petersen, On the Flow of a Non-Newtonian Liquid on a Rotating Disk, J. Appl. Phys., Vol 31, No. 6, pp. 963-968(1960).
4. M. Yanagisawa, Slip Effect for Thin Liquid Film on a Rotating Disk, J. Appl. Phys., Vol. 61, p.p.1034-1037(1987).
5. D. Meyerhofer, Characteristics of Resist Films Produced by Spinning, J. Appl. Phys., Vol. 49, No. 7, pp. 3993-3997(1978).
6. M. L. Forcada, and C. M. Mate, The Flow of Thin Lubricant Films on Rotating Disks, Wear, Vol. 168, pp.21-25(1993).
7. W. W. Flack, D. D. Soong, A. T. Bell, and D. W. Hess, A Mathematical Model for Spin Coating of Polymer Resist, J. Appl. Phys., Vol. 56, pp. 1199-1206(1984).
8. C. T. Wang and S. C. Yeu, Theoretical Analysis of Film Uniformity in Spinning Processes, Chem. Eng. Sci., Vol. 50, No. 6, pp. 989-999(1995).
9. J. H. Hwang and F. Ma, On the Flow of a Thin Liquid Film over a Rough Rotating Disk, J. Appl. Phys. Vol. 66, No. 1, pp. 388-394(1989).
10. F. Ma and J. H. Hwang, The Effect of Air Shear on the Flow of a Thin Liquid Film Over a Rough Rotating Disk, ASME J. Appl. Phys., Vol. 112, pp. 165-168(1990).
11. T. Yada, T. Maejima, M. Aoki,and M. Umesaki, Thin-Film Formation by Spin Coating: Characteristics of a Positive Photoresist, Jpn. J. Appl. Phys.,Vol. 34, pp. 6279-6284(1995).
12. T. Yada, T. Maejima,and M. Aoki, Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Humidity, Jan. J. Appl. Phys., Vol. 36, pp. 7041-7047(1997).
13. T. Yada, Formation of a Negative Photoresist Thin Film by Spin Coating, Jpn. J. Appl. Phys., Vol. 37, pp. 2752-2757(1998).
14. J. Gu, M. D. Bullwinkel, and G. A. Campbell, J Electrochemical Society, Vol. 142, pp. 907-913(1995).
15. R. K. Youkoski and D. S. Soane, Model for Spin Coating in Microelectronic Applications, J. Appl. Phys., Vol. 72, No. 2, pp.
16. L.W. Schwartz, Viscous Flows Down an Inclined Plane : Instability and finger formation, Phys. Fluids A, Vol. 1,No. 3,pp.443-445(1989).
17. S. M. Troian, E. Herbolzheimer, S. A. Safran, and J. F. Joanny, Fingering Instabilities of Driven Spreading Films, Europhysics Letters, Vol. 10, No. 1, pp.25-30(1989).
18. R. Goodwin and G. M. Homsy, Viscous Flow Down a Slop in the Vicinity of a Contact Line, Phys. Fluids A, Vol. 3,No. 4,pp.515-528(1991).
19. F. Melo, J. F. Joanny, and S. Fauve, Fingering Instability of Spinning Drops, Phys. Review Letters, Vol. 63, No.18, pp. 1958-1961(1989).
20. N. Fraysse, and G. M. Homsy, An Experimental Study of Rivulet Instabilities in Centrifugal Spin Coating of Viscous Newtonian and Non-Newtonian Fluids, Phys. Fluids, Vol. 6, No. 4, pp. 1491-1504(1994).
21. M. A. Spaid and G. M. Homsy, Stability of Viscoelastic Dynamic Contact Lines, Phys. Fluids, Vol.9, No.4, pp. 823-832(1997).
22. F.C. Chou, S.C. Gong, M.W. Wang, and K.T. Lie, On the Reduction Liquid Dispensed in Spin Coating, ASME FED- 239, Proc. 1996, ASME Fluids Engineering Division Summer Meeting, p.p. 553-558, San Diego, CA.(1996).
23. F.C. Chou, M.W. Wang, S.C. Gong, and Z.G. Yang, Reduction of Photoresist Usage during Spin Coating, Journal of Electronic Materials, Vol 30, No. 4, p.p.432-438(2001).
24. 周復初，卓浩江和王明文，轉速對旋轉塗佈液膜穩定的影響，中國機械工程學會第十六屆全國學術研討會，第五冊 pp. H049-H054，中華民國八十八年十二月，清華大學.
25. F. C. Chou, H. J. Juo, M. W. Wang and S. J. Dai, Effect of Injection Rate on Fingering Instabilities during Spin Coating, Procs. of 8th International Symposium on Transport Phenomena and Dynamics of Rotating Machinery (ISROMAC-8), Vol. 2, p.p. 500-505(2000).
26. F. C. Chou and M. N. Wang, Photoresist Spin Coating on 300 mm Wafer, Procs. 15th National Conf. on Mech. Engng, CSME, pp. 209-216, Tainan, ROC.
27. F.C. Chou, P.Y. Wu, and S.C. Gong, Analytical Solutions of Film Planarization during Spin Coating, Jpn. J. Appl. Phys., Vol. 37, pp. 4321-4327(1998).
28. P.Y. Wu and F.C. Chou, Complete Analytical Solutions of Film Planarization during Spin Coating, J. Electrochem. Soc., Vol. 146, pp. 3819-3826(1999).
29. M. W. Wang, H. K. Yu, and F. C. Chou, Effect of A Prewetting Thin Film on Fingering Instabilities During Spin Coating, The 3rd Pacific Symposium on Flow Visualization & Image Processing, F3058, 1-7, Maui, Hawaii, USA.(2001).
30. S. Middleman, The Effect of Induced Air-Flow on the Spin Coating of Viscous Liquids, J. Appl. Phys. ,Vol 62, p.p. 2530-2532(1987).
31. F. Ma, and J. H. Hwang, The Effect of Air Shear on the Flow of a Thin Liquid Film over a Rough Rotating Disk, J. Appl. Phys., Vol. 112, p.p. 165-168(1990).
32. T. J. Rehg, and B. G. Higgins, The Effect of Inertia and Interfacial Shear on Film Flow on A Rotating Disk, Phys. Fluids, Vol. 31, p.p. 1360-1371(1988).
33. W. H. McConnell, On the Rate of Thinning of Thin Liquid Films on a Rotating Disk, J. Appl. Phys., Vol. 64, p.p.2232-2233(1988).
34. S. C. Gong, and F. C. Chou, Effect of Wind shear on the Film Thickness Distribution over Rotating Doughnut Disks, Jpn. J. Appl. Phys., Vol. 36, pp380-384(1997).
35. F. C. Chou and P. Y. Wu, Effect of Air Shear on Film Planarization during Spin Coating, J. Electrochemical Society, Vol. 147, pp. 699-705(2000).
36. 黃發威，科氏力與預塗薄膜對旋轉塗佈之影響，國立中央大學機械工程研究所碩士論文(2002).

指導教授

周復初(Fu-Chu Chou)

審核日期

2006-6-29

推文