表面輪廓連續起伏之光柵

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姓名

王良峯(Liang-Feng Wang) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

表面輪廓連續起伏之光柵
(Fabrication of Grating with Continuous profile)

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摘要(中)

本研究發展以光阻熔融、粗糙化表面和結構翻模轉印的製程，製造表面輪廓連續起伏之光柵 (Fabrication of grating with continuous profile)。表面輪廓連續起伏之光柵的製作主要是將光阻旋轉塗布置粗糙化表面上，根據Wenzel和Cassie的理論，光阻依據結構作出最小能量的分佈，再利用加熱熔融使得光阻表面輪廓趨於連續球面分佈，最後再將製作好的光阻表面輪廓翻模轉印至矽膠 (Silicon Rubber)上。本研究建立出依據粗糙化表面的深寬比，與熔融後的光阻表面輪廓之曲率半徑的關係圖，作為日後製作不同參數之光柵的依據。在本研究中，量測表面輪廓連續起伏之光柵與二元式光柵的繞射效率，並且相互比較，實驗結果如理論預測一樣，表面輪廓連續起伏之光柵有較好的繞射分光效果。在此總結，本研究提出一種製造表面輪廓連續起伏之光柵的製程方法，其繞射分光效果比傳統的二元式光柵高。

摘要(英)

This paper primarily concerns about making use of thermal, rough surface, structure printing to fabrication the grating with continuous profile. According to the theory of Wenzel and Cassie, we spin the photo-resist (PR) on rough surface. The PR will be offered the energy minimum depends on the geometric parameters of the surface. And the PR is heated above its glass transition temperature, the melting PR will change into a spherical profile for minimizing its surface energy. After reflow, we print the PR profile into silicon rubber.
Here, we establish the relationship between the aspect of the rough surface and the curvature of the PR. We compare the binary grating with the continuous profile grating. Moreover, the grating with continuous profile of diffraction efficiency is better than binary grating.

關鍵字(中)

★ 微光柵
★ 微光學元件
★ 熔融光阻

關鍵字(英)

★ Melting and Reflow
★ Micro-Optics
★ Micro-grating

論文目次

致謝 V
摘要 III
目錄 V
圖索引 VIII
第一章緒論 1
第一節研究背景 1
第二節光柵發展概述 2
第三節微光學元件之簡介 3
第四節微光學元件發展之近況 7
第五節研究動機 19
第二章基本原理 22
第一節熔融光阻 22
第二節粗糙化表面 26
第三章表面輪廓連續起伏之光柵設計 30
第一節設計方法 30
第二節設計步驟 38
第四章製程 39
第一節製作流程 39
第二節熔融光阻製程 41
第四節量測方法 47
第五章量測結果 49
第一節表面輪廓連續起伏之光柵的量測 49
第二節微結構翻模轉印 53
第三節繞射效率之比較 56
第六章結論 65
第一節研究成果 65
第二節研究貢獻 68
第三節未來發展 69
參考文獻 70

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指導教授

楊宗勳(Tsung-Hsun Yang)

審核日期

2006-7-21

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