博碩士論文 93323053 詳細資訊




以作者查詢圖書館館藏 以作者查詢臺灣博碩士 以作者查詢全國書目 勘誤回報 、線上人數:6 、訪客IP:3.141.27.244
姓名 洪漢斌(Han-Bin Hong)  查詢紙本館藏   畢業系所 機械工程學系
論文名稱 環形塗佈不穩定手指狀之研究
(The annular coating of unstable fingers research)
相關論文
★ 化學機械研磨流場模擬實驗研究★ 變轉速之旋轉塗佈實驗研究
★ 微小熱點之主動式冷卻★ 大尺寸晶圓厚膜塗佈
★ 科氏力與預塗薄膜對旋轉塗佈之影響★ 微液滴對微熱點之 冷 卻
★ 大尺寸晶圓之化學機械研磨實驗研究★ 液晶顯示器旋轉塗佈研究
★ 流體黏度對旋塗減量之影響★ 微熱點與微溫度感測器製作
★ 高溫蓄熱器理論模擬★ 熱氣泡式噴墨塗佈
★ 注液模式對旋轉塗佈之影響★ 磁流體旋塗不穩定之研究
★ TFT-LCD狹縫式塗佈研究★ 彩色濾光片噴塗研究
檔案 [Endnote RIS 格式]    [Bibtex 格式]    [相關文章]   [文章引用]   [完整記錄]   [館藏目錄]   至系統瀏覽論文 ( 永不開放)
摘要(中) 傳統矽晶圓塗佈表層覆膜大多是以旋轉塗佈的方式為主,液體在旋轉塗佈的過程,因為離心力的作用,使得不穩定手指狀流會在連續薄膜波前處產生,本實驗採用不同於傳統矽晶圓塗佈實驗而是以環型塗佈為主,觀察環型塗佈在不同黏滯數矽油與不同距離下在旋轉塗佈製程上的差異性,探討邦得數(Bo)與臨界半徑(Rc)的無因次化、不穩定手指數(Nf)、波長(λ)的關係。實驗結果發現對環型塗佈而言,其臨界半徑不像中心塗佈隨邦得數增加而有先遞增後遞減的現象,而是呈現平穩趨勢。不穩定手指數目方面,其生長趨勢有先平穩後急速增加。波長的趨勢為可分為三段分別是平穩、急速降速、平穩。而就不同黏度矽油的比較,發現低黏度的矽油流體因黏滯數低使塗佈半徑較高黏滯數大,在離心力的加速引響下,使得臨界半徑更是加速成長,不穩定手指也是加速產生,但是因塗佈外徑與不穩定手指數目的增加趨勢ㄧ致,使得波長反而較小。就應用方面可知,低轉速,Bo < 4 ,中心旋塗較環形旋塗適合,而中轉速,既邦得數介於4 < Bo < 626之間,則以環形旋塗較適合,高轉速,Bo > 626,則兩者的差異已不大。
摘要(英) The traditional silicon covers is mainly on way to rotate coating.The liquid covers,centrifugal force make the stability finger happen.This experiment is different from the traditional silicon covers coating experiment on ring type coating.Observe ring coating in different to viscosous silicon and rotate radius.The experimental result finds that as for ring type coating, its critical radius does not like increase with the central type has first increasing and after decreases, but the steady trend appears. The unstably finger,increase rapidly after its growth trend is steady first. The wavelength can be divided into three sections, steadily and lower the speed ,steadily.On different viscosity comparison ,find low viscosity because low viscid force make coating radius than high viscosity,centrifugal force make the critical radius to grow up with higher speed even more, the unstable finger is produced with higher speed too, But the external diameter of the coating and unstable finger increase cause the wavelength small than high viscosity.
In application,we can know on , 4 < Bo, the central coating is suitable than annular coating , and 4 < Bo <626, the annular coating is suitable than central coating .At Bo > 626, the differences between them are not big.
關鍵字(中) ★ 環型旋塗
★ 旋塗
關鍵字(英) ★ annular Spin coating
★ Spin coating
論文目次 摘要 I
致謝 III
目錄 IV
表目錄 VI
圖目錄 VII符號說明表 XI
第一章 緒論 1
1-1 前言 1
1-2 文獻回顧 2
1-2.1 旋轉塗佈相關文獻回顧 2
1-2.2 風剪效應相關文獻回顧 2
1-2.3 不穩定手指狀流相關文獻回顧 6
1-2.4 研究動機 10第二章 實驗設備與方法 11
2-1 旋塗轉速控制系統 11
2-2 影像擷取系統 12
2-3 實驗方法 13
第三章 結果與討論 17
3-1 噴塗注液速度與噴塗量環形旋塗之影響 17
3-1.1 機台旋轉速度與高度對環形旋塗之影響 17
3-1.2 環形塗佈不穩定手指產生的情形 18
3-1.3 中心旋塗與環型旋塗邦得數與Rc/V 1/3 比較 18
3-1.4 中心旋塗與環型旋塗不同距離邦得數與Nf 比較 21
3-1.5 中心旋塗與環型旋塗邦得數與Rc/Ro 比較 21
3-1.6 不同距離下邦得數與波長比較 22
3-2不同黏滯數矽油之環型旋轉塗佈比較的影響 23
3-2.1 不同黏滯數矽油下邦得數與Rc/V 1/3比較 23
3-2.2 不同黏滯數矽油下邦得數與Nf比較 23
3-2.3 不同黏滯數矽油下邦得數與Rc/Ro 比較 24
3-2.4 不同黏滯數矽油下邦得數與波長比較 25
第四章 結論 26
參考文獻 28
參考圖表 33
參考文獻 1. A. G. Emsilie, F. T. Bonner, and L. G. Peck, Flow of a Viscous Liquid
on a Rotating Disk, J. Appl. Phys., Vol 29, pp. 858-863(1958).
2. E. Momoniat, and D. P. Mason, Investigation of the Coriolis Force on a Thin Fluid Film on a Rotating Disk, Int. J. Non-Linear Mech.,Vol 31, pp. 1069-1088,(1998).
3. M. Yanagisawa, Slip Effect for Thin Liquid Film on a Rotating Disk,J. Appl. Phys., Vol.61, pp. 1034-1037(1978).
4. A. Acrivos, M. Shan, and E. E. Petersen,On the Flow of a Non-Newtonian Liquid on a Rotating Disk, J. Appl. Phys., Vol 31, pp. 963-968(1960).
5. D. E. Bornside, C. W. Maccsko, and L.E., Scriven, Spin Coating: One-Dimensional Model, J. Appl. Phys., Vol. 66, No. 11, pp. 5185-5193(1989).
6. M. L. Forcada, and C. M. Mate, The Flow of Thin Lubricant Films on Rotating Disks, Wear, Vol. 168, pp. 21-25(1993).
7. D. Meyerhofer, Characteristics of Resist Films Produced by Spinning, J. Appl. Phys., Vol. 49, pp. 3993-3997(1978).
8. T. Yada, T. Maejima, M. Aoki,and M. Umesaki, Thin-Film Formation by Spin Coating: Characteristics of a Positive Photoresist, Jpn. J. Appl. Phys.,Vol. 34, pp. 6279-6284(1995).
9. T. Yada, T. Maejima,and M. Aoki, Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Humidity, Jpn. J. Appl. Phys., Vol. 36, pp. 7041-7047(1997).
10. T. Yada, T. Maejima, M. Aoki,and M. Ishizu, Formation of a Positive Photoresist Thin Film by Spin Coating: Influence of Atmospheric Temperature, Jpn. J. Appl. Phys., Vol. 36, pp. 372-377(1997).
11. T. Yada, Formation of a Negative Photoresist Thin Film by Spin Coating, Jpn. J. Appl. Phys., Vol. 37, pp. 2752-2757(1998).
12. W. W. Flack, D. D. Soong, A. T. Bell, and D. W. Hess, A Mathematical Model for Spin Coating of Polymer Resist, J. Appl. Phys., Vol. 56,pp. 1199-1206(1984).
13. B. G. Higgins, Film Flow on a Rotating Disk, Phys. Fluids, Vol. 29, pp. 3522-3529(1986).
14. C. T. Wang and S. C. Yeu, Theoretical Analysis of Film Uniformity in Spinning Processes, Chem. Eng. Sci., Vol. 50, pp. 989-999(1995).
15. J. H. Hwang, and F. Ma, On the Flow of a Thin Liquid Film over a Rough Rotating Disk, J. Appl. Phys. Vol. 66, pp. 388-394(1989).
16. F. Ma, and J. H. Hwang, The Effect of Air Shear on the Flow of a Thin Liquid Film Over a Rough Rotating Disk, ASME J. Appl. Phys., Vol. 112, pp. 165-168(1990).
17. J. Gu, M. D. Bullwinkel, and G. A. Campbell, Spin Coating on Substrate with Topography, J.Electrochem. So., Vol. 142, pp. 907-913(1995).
18. R. K. Youkoski, and D. S. Soane, Model for Spin Coating in Microelectronic Applications, J. Appl. Phys., Vol. 72, pp. 725-740(1992).
19. S. Middleman, The Effect of Induced Air-Flow on the Spin Coating of Viscous Liquids, J. Appl. Phys., Vol. 62, pp. 2530-2532(1987).
20. F. Ma,and J. H. Hwang, The Effect of Air Shear on the Flow of a Thin Liquids Film over a Rough Rotating Disk, ASME J. Appl. Phys,. Vol. 112, pp. 165-168(1990)
21. T. J. Rehg, and B. G. Higgins, The Effect of Inertia and Interfacial Shear on Film Flow on a Rotating Disk, Phys. Fluids, Vol. 31, pp. 1360-1371(1988).
22. W. H. McConnell, On the Rate of Thin Liquid Films on a Rotating Disk, J. Appl. Phys., Vol. 64, pp. 2232-2233(1988).
23. M. Yanagisawa, Slip Effect for Thin Liquid Film on a Rotating Disk, J. Appl. Phys., Vol. 61, pp. 1034-1037(1987).
24. S. C. Gong, and F. C. Chou, Effect of Windshear on the Film Thickness Distribution over Rotating Doughnut Disks, Jpn. J. Appl. Phys., Vol. 36, pp. 380-384(1997).
25. F. C. Chou, and P. Y. Wu, Effect of Air Shear on Film Planarization during Spin Coating, J. Electrochemical Society, Vol. 147, pp. 699-705(2000).
26. L.W. Schwartz, Viscous Flow Down an Inclined Plane: Instability and Finger Formation, Phys. Fluids A, Vol. 1, pp. 443-445(1989).
27. S. M. Troian, E. Herbolzheimer, S. A. Safran and J. F. Joanny, Fingering Instabilities of Driven Spreading Film, Europhys. Lett., 10(1), pp. 25-30(1981).
28. F. Melo, J. F. Joanny, and S. Fauve, Fingering Instability of Spinning Drops, Phys. Review Letters, Vol. 63, pp. 1958-1961(1989).
29. N. Fraysse and G. M. Homsy, An Experimental Study of Rivulet Instabilities in Centrifugal Spin Coating of Viscous Newtonian and Non-Newtonian Fluids, Phys. Fluids, Vol. 6, pp. 1491-1504(1994).
30. M. A. Spaid, and G. M. Homsy, Stability of Viscoelastics Dynamic Contact Lines: An Experimental Study, Phys. Fluids, Vol. 9, pp. 823- 834(1997).
31. S. K. Wilson, R. Hunt, and B. R. Duffy, The Rate of Spreading in Spin Coating, J. Fluid Mech., Vol. 413, pp.65-88(2000).
32. F. C. Chou, S. C. Gong, M. W. Wang, and K. T. Lie, On the Reduction Liquid Dispensed in Spin Coating, ASME Fluids Engineering Division Summer Meeting, Vol. 4, pp. 553-558(1996).
33. F. C. Chou, S. C. Gong,and M. W. Wang, Reduction of Photoresist Usage during Spin Coating, Journal of Electronic Materials, Vol. 30, pp. 432-438(2001)
34. 周復初,卓浩江和王明文,轉速對旋轉塗佈液膜穩定的影響,中國工程師學會第十六屆全國學術研討會,第五冊 pp. H049-H054,中華民國八十八年十二月。
35. F. C. Chou, H. J. Juo, M. W. Wang and S. J. Dai, Effect of Injection Rate on Fingering Instabilities during Spin Coating, Procs. of 8th International Symposium on Transport Phenomena and Dynamics of Rotating Machinery (ISROMAC-8), Vol. 2, pp. 500-505(2000).
36. M. W. Wang, and F. C. Chou, Fingering Instability and Maximum Radius
at High Rotational Bond Number, J. Electrochem. Soc. , Vol.148 pp.
283-290 (2001).
37. F. C. Chou, P. Y. Wu, and S. C. Gong, Analytical Solutions of Film Planarization during Spin Coating, Jpn. J. Appl. phys., Vol. 37, pp. 4321-4327(1998).
38. P. Y. Wu, and F. C. Chou, Complete Analytical Solutions of Film Planarization during Spin Coating, J. Electrochemical Society, Vol. 146, pp. 3819-3826(1999)
39. M. W. Wang, H. K. Yu, and F. C. Chou, Effect of A Prewetting Thin Film on Fingering Instabilities during Spin Coating, The 3rd Pacific Symposium on Flow Visualization & Image Processing, F3058, 1-7, Maui Hawaii, USA(2001).
40. F.C. CHOU, and K.H. HUANG, Reduction of Amount of Dye during Spin Coating, Japanese Journal of Applied Physics Vol. 45, pp. 1757–1764(2006)
指導教授 周復初(Fu-Chu Chou) 審核日期 2006-6-29
推文 facebook   plurk   twitter   funp   google   live   udn   HD   myshare   reddit   netvibes   friend   youpush   delicious   baidu   
網路書籤 Google bookmarks   del.icio.us   hemidemi   myshare   

若有論文相關問題,請聯絡國立中央大學圖書館推廣服務組 TEL:(03)422-7151轉57407,或E-mail聯絡  - 隱私權政策聲明