博碩士論文 93323074 詳細資訊




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姓名 黃家麒(Cha-Chi Huang)  查詢紙本館藏   畢業系所 機械工程學系
論文名稱 四道光干涉微影之曝光與顯影參數對 微結構輪廓及深度之探討
(The influences of exposure and development parameters on the shape and depth of micro-structure for four-beam interferometric lithography )
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摘要(中) 摘要
雷射干涉微影(Laser Interference Lithography)只須簡單的光學鏡組及雷射光源,且不須通過光罩,便可由此系統得到一維條紋及二維點陣或洞陣的週期性結構。此系統的優點在於擁有極大的聚焦深度、易於大面積曝光、低成本、高解析度。
四道光單曝光除了有干涉微影的優點外,更有著高產能、高對比度、以及易形成深孔等優勢。因此,本研究將建立四道光單曝光強度分佈之數學模型並進行相關實驗,由實驗結果分析得知,在相同曝光與顯影參數下,四道光單曝光將會使光強重新分配,使得其所得到的微結構比兩道光雙曝光之結構更為尖銳(sharper)。
另外,隨著曝光時間與顯影時間的增加,結構的特徵尺寸將會縮小,高度上亦將有所變化。本研究在適當的曝光與顯影參數下,利用ICP乾蝕刻成功地在矽基板上得到四道光單曝光所建構出的二維週期性陣列結構。
摘要(英) Abstract
In this research, we have developed laser interference lithography system, such as one dimension linear gratings or two dimension arrays of dots and grids, to create periodical structures. The method of maskless laser interference lithography used for generation of infinite depth of focus, relative simplicity, low cost, deep sub-micron patterns and high resolution in large field of view is investigated.
The main advantage of four-beam exposure is that higher throughput process for patterning arrays and higher contrast images can be obtained. According to theoretical analysis and experimental results, four-beam exposure allows a greater percentage of the incident energy to be redistributed near the intensity maxima and generates structures sharper.
The effects of the process parameters on the shape and depth of the structure have been discussed. According to different critical dimension, this thesis also suggests several parameters for exposure and development, with which best pattern had been acquired in our experiments.
關鍵字(中) ★ 雷射干涉微影
★ 四道光曝光
關鍵字(英) ★ four-beam exposure
★ laser interference lithography
論文目次 目錄
摘要 I
英文摘要 II
致謝 III
目錄 IV
表目錄 VII
圖目錄 VIII
第一章 緒論 1
1.1 前言 1
1.2 文獻回顧 1
1.2.1 干涉微影 2
1.2.2 傳統干涉微影之改良與應用 2
1.2.2.1 干涉品質與系統的穩定度的提升 3
1.2.2.2 大面積的曝光 4
1.2.2.3 結構週期縮小 4
1.2.2.4 二維干涉微影系統 5
1.2.2.5 干涉微影的應用 6
1.3 研究目的 7
第二章 實驗原理 9
2.1 實驗原理 9
2.1.1 干涉原理 9
2.1.2 干涉技術 14
2.1.3 基本雷射原理 16
2.1.4 空間濾波器(spatial filter) 17
2.1.5 擴束器(Beam Expander) 18
2.1.6 光阻的基本性質 19
第三章 實驗方法 21
3.1 實驗方法 21
3.1.1 系統架構 21
3.1.2 實驗流程 22
第四章 結果與討論 28
4.1 上下、左右兩道光分別之直線結構 29
4.2 曝光與顯影參數對輪廓的影響 29
4.3 兩道光雙曝光與四道光單曝光之比較 31
4.4 曝光與顯影參數對深度的影響 32
4.5 蝕刻後的陣列結構 34
第五章 結論 35
參考文獻 37
附錄一 44
參考文獻 參考文獻
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指導教授 陳志臣(J.C Chen) 審核日期 2006-7-8
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