博碩士論文 93433028 詳細資訊


姓名 王俊凌(Chun-Ling Wang)  查詢紙本館藏   畢業系所 資訊管理學系在職專班
論文名稱 半導體先進批次製程控制系統平台設計與實作
(Design and Implementation of an Advanced Semiconductor Run-to-Run Process Control System)
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摘要(中) 隨著半導體製程邁入ULSI (超大尺寸整合) 階段與產業隨競爭者的增加,並在幾乎所有製造廠皆擁有類似的製造技術與設備下,使得半導體產業成為高度標準化的產業。大量的生產以降低成本,造成供過於求的情況,也使得價格也嚴重下跌。因此想要在低價的情況下獲利,除了降低生產成本外,嚴格的製程控制已成為重要目標。
自動化生產程度越高,人為介入調整設備機台的方式則越不可行,半導體業在自動化的要求一直以來,無不想盡辦法提升。Run-To-Run (R2R) Control的製程控制技術降低了人員介入調整的工作,透過此控制技術,除了可作為品質控制外還有增進品質的功能。因此這個系統成為各半導體廠努力導入的一個系統。但由於半導體製程複雜、機台種類繁多;且依據摩爾定律可知,半導體的製程技術推陳出新的速度之快,常使此類系統尚未開發完成;製造程序就已改變,也使得此類系統尚未開發完成就遭受失敗的命運。
本論文的目標是設計一個,具有彈性且合乎經濟效益的先進製程控制系統架構 Run-To-Run (R2R) Control Platform。透過物件導向軟體工程的技術,來設計此一架構,並可使依循此架構所設計的R2R控制器系統,能快速開發且易於導入與實行。
本系統預期的效益是: (1) 建立一個Run-To-Run (R2R) Control Platform,使R2R控制器系統能快速開發且易於導入與實行。 (2)因應各種不同模組的製程,如沉積、薄膜、蝕刻或黃光等;不會因製程的不同,而使得控制器開發時有太大差異。 (3)依循相同的架構,一致性的發展各個 R2R 控制器,可使得將來的系統維護或新增功能更為容易。
摘要(英) When the semiconductor process migrates to the Ultra Large Scale Integration (ULSI) technology and most manufacturers are using similar manufacturing techniques and equipment, this industry has become highly standardized and cost driven with high productivity. All of these factors from time to time result in oversupply and seriously hurt the selling prices of the chips.
If the chip manufactures want to be profitable from this under-priced situation, in addition to lower down the overall manufacturing cost, a strict process control to minimize or eliminate the out-of-spec products becomes another critical area. The so-called Run-to-Run (R2R) control in Advanced Process Control (APC) is a solution for this purpose. It has the function to monitor the health of the chosen process and is able to adjust the process parameters to further improve the process capability.
The purpose of this research is to present a R2R system design that it has the advantages as shown below:
1. The system architecture is developed under the foundation of Object-Oriented
Software Engineering Technology and the blueprint of Advanced Process Control
Framework Initiative (APCFI). This architecture allows for further development and extension with ease.
2. The technology of Web Service used in this architecture can replace the Common Object Request Broker Architecture (CORBA) platform to facilitate the integration and interaction among heterogeneous systems and components from different platforms. It not only equips the function of CORBA for handling Distributed Objects but also helps on cost down. It is also user friendly.
3. More importantly, this universal architecture can support different unit processes and is highly modulized. It can be applied to many process tools or CIM system.
關鍵字(中) ★ 先進製程控制 關鍵字(英) ★ Advanced Process Control
★ UML
★ CIM
★ Run-to-Run
★ Object Oriented Systems
論文目次 [論文目次]
中 文 摘 要 …………………………………………………………………… ii
英 文 摘 要 …………………………………………………………………… iii
謝 詞 …………………………………………………………………………… v
目 錄…………………………………………………………………………… vi
圖 目 錄………………………………………………………………………… viii
表 目 錄 …………………………………………………………………………ix
第一章 緒論 …………………………………………………………………… 1
1.1 研究動機與問題 ……………………………………………………… 1
1.2 研究目的 ……………………………………………………………… 2
1.3 研究方法 ……………………………………………………………… 3
1.4 論文架構 ……………………………………………………………… 3
第二章 文獻探討 ……………………………………………………………… 4
2.1 SEMATECH先進製程控制初始架構簡介 (Advanced Process Control
Framework Initiative 1.0) ……………………………………………… 4
2.1.1 APCFI簡介 …………………………………………………… 4
2.1.2 APCFI物件 …………………………………………………… 5
2.2 物件導向軟體工程 ……………………………………………………10
2.2.1 軟體工程簡介 ………………………………………………… 10
2.2.2 軟體工程開發步驟 …………………………………………… 12
2.2.3系統設計…………………………………………………………13
2.2.4軟體開發專案管理 ……………………………………………. 14
第三章 R2R系統分析 ………………………………………………………… 15
3.1 系統概述 ……………………………………………………………… 15
3.2 系統控制作業分析 …………………………………………………… 17
3.3 R2R系統與MES系統運作分析 ………………………………………19
3.4 控制模式分析 ………………………………………………………… 24
3.5 R2R控制器參數設定分析 …………………………………………… 28
3.6一致性的架構 ………………………………………………………… 31
3.7 系統使用案例分析…………………………………………………… 32
第四章 R2R系統設計與雛型實作 …………………………………………… 37
4.1 軟體設計 ………………………………………………………………37
4.2 系統物件設計 …………………………………………………………40
4.3 系統介面流程 ………………………………………………………… 50
4.4 硬體架構設計 ………………………………………………………… 59
4.5 系統導入與整合 ……………………………………………………… 62
4.6 雛型系統實作-以CMP製程為例 …………………………………… 65
4.6.1 CMP製程簡介 ……………………………………………………65
4.6.2雛型系統開發與成效探討 ……………………………………… 66
第五章 結論與未來發展 ………………………………………………………… 68
5.1 本研究之成果與探討 …………………………………………………… 68
5.2 管理意涵 ………………………………………………………………… 68
5.3 研究限制 ………………………………………………………………… 69
5.4 未來發展 ………………………………………………………………… 69
參考文獻 ………………………………………………………………………… 71
附錄一 STICMP-R2R使用者圖形化操作介面 ……………………………… 72
附錄二 R2R Project Work Breakdown Schedule (WBS) ………………………92
參考文獻 1. Tony, Mullins, “Advanced Process Control Framework Initiative (APCFI) 1.0 Specifications”, Technology Transfer #97063300A-ENG SEMATECH, June 30, 1997
2. Michael, L.Miller, “Using Tcl to Script CORBA Interactions in a Distributed System”, Sixth Annual Tcl/Tk Workshop San Diego, California, September, 14–18, 1998
3. Alan, Weber, “Taking Control with the APC (Advanced Process Control) Framework”, Future Fab Intl. Volume 9, Janu, 1, 2000
4. SEMATECH, “Provisional Specification for CIM Framework Advanced Process Control Component”, Semi E93-0200, Sept, 1999
5. SEMATECH, “Provisional Specification for CIM Framework Domain Architecture”, Semi E81-0600, June, 1999
6. SEMATECH, “Provisional Specification for Automated Process Control System Interface”, Semi E133-0704, July, 2004
7. SEMATECH, “Provisional Specification for Automatic Recipe Transfer To Wafer Exposure System”, Semi P42-0304, March, 2004
8. SEMATECH, “Provisional Specification for Equipment Data Acquisition Solutions”, Semi P42-0304, March 2003
9. Toprac, Anthony and Campbell, W. Jarrett, “The status and future of APC software”, Solid State Technology, May, 2002
10. SEMATECH, “Advanced Process Control Framework Initiative (APCFI) Proposal Summary and Plan”, Technology Transfer # 96093181A-ENG, September 30, 1996
11. Edward, Lin, “Thickness Control of Oxide CMP Process Utilizing FF and FB Strategy”, Inotera Memories, Inc., December, 2005
12. SEMATECH, “Advanced Process Control Framework Initiative (APCFI) 1.0 Project Overview”, SEMATECH, Technology Transfer #99053735A-TR, June 30, 1999
指導教授 蘇雅惠、郭瑞祥
(Yea-Huey Su、Ruey-Shan Andy Guo)
審核日期 2006-7-17
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