交錯傾斜微結構薄膜在深紫外光區之研究

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姓名

江直融(Chih-Jung Chiang) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

交錯傾斜微結構薄膜在深紫外光區之研究
(The Research of Serial bideposition of anisotropic thin film at DUV)

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至系統瀏覽論文 ( 永不開放)

摘要(中)

本論文以氟化鎂、氟化鑭二種適用在深紫外波段的材料作研究。利用單電子槍，以70度的蒸鍍角度斜向蒸鍍氟化物薄膜，每次旋轉基板半圈使柱狀結構交錯，研究在相同厚度時不同交錯次數下，探討薄膜結構的變化，量測薄膜的應力及在此種交錯傾斜結構下薄膜對P、S偏振光垂直入射時在波長193nm的折射率差異，並且觀察薄膜對水氣的吸收及表面粗糙度。
薄膜結構以掃瞄式電子顯微鏡觀察沉積平面之剖面，應力則是以相位移式應力量測干涉儀測量，而兩個方向上的折射率則以光譜儀搭配偏振器的系統做量測，並配合以包絡法做擬合求得，水氣的吸收是利用傅立葉轉換紅外線光譜儀觀察，表面粗糙度則是利用原子力顯微鏡量測。
研究發現，隨著交錯層數的增加，薄膜的雙折射性有增大的現象，且薄膜的應力也有隨之減小的趨勢。

摘要(英)

In this study we focused primarily on magnesium fluoride and lanthanum fluoride that promise a transparency at DUV wavelengths. We used 70° as the deposition angle and rotated the substrate stepwise by half a turn to form chevron structures by a single electron-beam source. We changed the rotation times in a specific thickness to investigate the changes in structure, stress, absorption band of water, surface roughness and linear birefringence.
Structures were observed by scanning electron microscopy (SEM) photographs of deposition-plane fractures. Stress was measured by Phase-Shifting Interferometer. We use the Fourier Transform Infrared (FTIR) Spectroscopy to observe the absorption band of water of thin films. Surface Roughness was measured by atomic force microscopy (AFM). The Refractive indices in two different directions were determined from spectrometer equipped with a polarizer.
We show that the linear birefringence would increase and the stress would decrease when the rotation times were increased.

關鍵字(中)

★ 傾斜
★ 紫外
★ 非均向性
★ 薄膜

關鍵字(英)

★ oblique
★ birefringence
★ DUV
★ thin film

論文目次

第一章緒論 1
1-1 前言 1
1-2研究動機 2
1-3 氟化物材料特性 3
第二章原理 5
2-1非均向介質 5
2-2非均向光學薄膜 8
2-2-1 主軸折射率 8
2-2-2 沉積平面與PS方向的定義 9
2-3自我遮蔽效應 11
2-4蒸鍍角度與柱狀傾斜角度 11
2-5 交錯傾斜微結構 12
2-6 包絡法 13
2-6薄膜應力 17
第三章實驗架構與量測儀器 19
3-1 實驗方法與系統架構 19
3-1-1 基板準備 19
3-1-2 鍍膜機架構 20
3-1-3 真空系統 22
3-1-4 厚度監控 22
3-1-5 交錯傾斜結構實驗參數 23
3-1-6 預蝕刻基板實驗參數 24
3-2量測方法與儀器 25
3-2-1 掃瞄式電子顯微鏡 25
3-2-2 光譜儀及橢偏儀 26
3-2-4相位移式應力量測干涉儀 28
3-2-5 原子力顯微鏡 29
3-2-6 傅利葉轉換紅外線光譜儀 31
第四章實驗結果與討論 32
4-1 氟化鎂非均向薄膜實驗結果與討論 32
4-1-1結構的影響 32
4-1-2 應力的影響 34
4-1-3 表面粗糙度的影響 35
4-1-4 傅利葉轉換紅外線光譜 36
4-1-5 光學特性的影響 37
4-2 氟化鑭非均向薄膜實驗結果與討論 38
4-2-1結構的影響 38
4-2-2應力的影響 39
4-2-3表面粗糙度的影響 40
4-2-4 傅利葉轉換紅外線光譜 41
4-2-5 光學特性的影響 42
4-3 在預蝕刻的基板上製鍍斜非均向性薄膜 43
第五章結論 46
參考資料 49

參考文獻

[1] I. Hodgkinson, Q. H. Wu, M. Arnold, L. De Silva, and R. Blaikie, “Bideposited thin-film retardation plates for use at deep UV wavelengths,” Curr. Appl. Phys. 4, 106-107 (2004).
[2] S. R. Kennedy and M. J. Brett, “Porous broadband antireflection coating by glancing angle deposition,” Appl. Opt. 42, 4573-4579 (2003).
[3] J. M. Nieuwenhuizen and H. B. Haanstra, “Microfractography of thin films” Philips Tech. Rev. 27, 87–91 (1966).
[4] F. Horowitz, “Structure-Induced Optical Anisotropy in thin film” PhD dissertation, University of Arizona, Optical Science Center. (1983).
[5] I. Hodgkinson, F. Horowitz, and H. Macleod, “Measurement of the principal refractive indices of thin films deposited at oblique incidence,” Journal of the Optical Society of America A: Optics and Image Science 2, 1693-1697 (1985).
[6] F. Chiadini and A. Lakhtakia, “Extension of Hodgkinson's model for optical characterization of columnar thin films,” Microwave Opt Technol Lett 42, 72-73 (2004).
[7] I. Hodgkinson and Q. H. Wu, “Serial bideposition of anisotropic thin films with enhanced linear birefringence,” Appl. Opt. 38, 3621-3625 (1999).
[8] A. Yariv and P. Yeh, “Optical Waves in Crystals: Propagation and Control of Laser Radiation” (Wiley, 1984).
[9] M. C. Liu, C. C. Lee, M. Kaneko, K. Nakahira, and Y. Takano, “Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat,” Appl. Opt. 45, 1368-1374 (2006).
[10] I. Hodgkinson and Q. Wu, Birefringent Thin Films and Polarizing Elements (World Scientific, 1997).
[11] Paritosh and D. J. Srolovitz, “Shadowing effects on the microstructure of obliquely deposited films,” J. Appl. Phys. 91, 1963-1972 (2002).
[12] I. Hodgkinson, Q. H. Wu, and J. Hazel, “Empirical equations for the principal refractive indices and column angle of obliquely deposited films of tantalum oxide, titanium oxide, and zirconium oxide,” Appl. Opt. 37, 2653-2659 (1998).
[13] 李正中,“薄膜光學與鍍膜技術”(藝軒臺北縣新店市, 2004).
[14] J. Manifacier, J. Gasiot and J. Filland, “Simple method for determination of the optical constant n, k and the thickness of weekly absorbing thin films,” Journal of Physics E: Scientific Instruments 9, 1002-1004 (1976).
[15] R. Swanepoel, “Determination of the thickness and optical constants of amorphous silicon,” Journal of Physics E: Scientific Instruments 16, 1214-1222 (1983).
[16] L. I. Maissel, R. Glang, and P. P. Budenstein, "Handbook of Thin Film Technology," J. Electrochem. Soc. 118, 114C (1971).
[17] 田春林,“光學薄膜應力與熱膨脹係數量測之研究” 國立中央大學光電所博士論文(1990).
[18] 卓文浩,“193nm深紫外斜向薄膜之研究” 國立中央大學光電所碩士論文(2006).
[19] I. Hodgkinson and Q. Wu, "Ion-beam control of thin-film microstructural columnar angle," Modern Physics Letters B 15, 1328-1331 (2001).
[20] D. Vick, L. J. Friedrich, S. K. Dew, M. J. Brett, K. Robbie, M. Seto, and T. Smy, "Self-shadowing and surface diffusion effects in obliquely deposited thin films (vol 339, pg 88, 1999)," Thin Solid Films 349, 303-303 (1999).
[21] I. Hodgkinson and Q. Wu, "Inorganic Chiral Optical Materials," Adv Mater 13, 889-897 (2001).

指導教授

李正中(Cheng-Chung Lee)

審核日期

2007-7-17

推文