摘要(英) |
The difference between optical glass and generally glass, Optical glass need fine nature and chemical property, Due to optical glass in the process of manufacture, Can be to make a lot flaw in surface, So Application to use as differentiate between the rank or worked it to recycle, As if try use freedom polish to assist mechanical polishing working, To proffer high hardness、low ductility and difficult to work the surface get a little remove and smooth effect on optical glass, To get up to need geometry shape.
About optical glass, abstruse grind polishing parameter effect work quality and efficiency, An arduous problem what was look for definition work parameter best, So the research use CNC tiny sculpture mechanical for work equipment, needle of sculpture mechanical change stainless steel abrasive stick Completely, It increase the polish pad or non-woven fabric on the bottom of the polish stick, Workpicec use 0.7mm Corning optical glass, The optical glass into the polish water of the CeO2 , The control parameters of the polishinf process include the polishing time, the axial loading, work time, polishing material, Moreover, the experimental parameters results were also analyzed and discussed .
The experimental parameters results, CeO2 particles of size 0.85–1.66μm (#8000) were used in this study, optical glass After turning machined surface polishing, Base on the different parameters experimental results, TZ-9000N and PQH5 polishing pad, On the suitable time, 15 min after the initial roughness of surface could be improved from 0.3 μm Ra (3.7 μm Rmax )to 0.03 μm Ra(0.25 μm Rmax ). The use Non-woven fabric polishing pad after polishing, On the suitable time, 15 min after the initial roughness of surface could be improved from 0.3 μm Ra (3.7 μm Rmax )to 0.04 μm Ra(0.3 μm Rmax ). |
參考文獻 |
1. 林彥穀,“氧化物磨粒漿料搭配超級磨輪於化學機械微研削製程以達光學玻璃之奈米平坦化” ,碩士論文, 逢甲大學材料科學研究所 (2003) 。
2. 張添晉、鄭啟璞、連奕偉,”廢玻璃資源回收管理與再利用技術” ,永續產業發展雙月刊(2003)。
3. 駱榮富,”研磨加工對氧化釔相穩定化氧化鋯表面顯微結構的影響” ,NSC-85-2216-E-035-21報告(1996) 。
4. 許笙載,”運用電泳沉積法於不鏽鋼鏡面拋光之研究” ,碩士論文,中央大學機械工程研究所 (2007) 。
5. 間宮富士雄、山口裕、渡邊與七,「化學研磨と電解研磨」,楨書店,p.113,(2004)。
6. 黃志龍,”淺談化學機械拋光的演進與應用”,機械工業雜誌(2000年5月)
7. L. M. CooK ,”Chemical Processes in glass Polishing”, Journal of
Non-Crystalline Solids, Vol. 120, pp.152-171 ,(1990) 。
8. T. K. Yu , C. C. Yu , M. Orlowski , “ A Statistical Polishing Pad Modal for
Chemical-Mechanical Polishing”, International Electron Devices Meeting
Technical Digest, pp.865-868 ,(1993) 。
9. C. W.Liu , B. T. Dai , W. T. Tesng , and C. F. Yeh ,”Modeling of the wear
Mechanism during Chemical-Mechanical Polishing”, Journal of
Electrochemical society, Vol. 143, pp.716-721,(1996) 。
10. Y. Xie , and B. Bhushan , “effects of Particle size , Polishing Pad and
Contact Pressure in Free Abrasive Polishing”, Wear ,Vol .200, pp281-295,
(1996) 。
11. D. G. Thakurta , C. L. Borset , D. W. Schwendeman , R. J . Gutmann , and
W. N. Gill , “ Pad Porosity , Compressibility and Slurry Delivery Effect in
Chemical-Mechanical Planarization : Modeling and Experiments”, Thin
Solid Flims , Vol .366, pp181-190,(2000) 。
12. 蔡宏榮和鄭友仁,”晶圓化學機械研磨之顆粒研磨漿料的磨潤分析”,第
24屆全國力學會議論文集(p001) ,(2000) 。
13. 許健興,”化學機械研磨用奈米級二氧化鈰粉體之合成”, 碩士論文, 逢甲
大學化學工程學系,(2002)
14. 劉金昇,”機械研磨對光學鏡片透光率之研究”, 碩士論文 , 中興大學機
械工程研究所,(2002) 。
15. 林明智,”化學機械研磨的微觀機制探討”, 碩士論文,中央大學化學工程
研究所,(2000) 。
16. N. S. Ong , and V. C. Venkatesh,” Semi-ductile grinding and Polishing of
Pyrex glass”, J. Man . Sci & Eng. , 83(1998)261-266。
17. H. Bach and N. Neuroth (td.), “ The Properties of Optical Glass”,
Springer-Verlag , Berlin (1995) pp.30-31。
18. 蔡獻逸,”液晶顯示器用玻璃基板”, 科學發展月刊(2006年406期)
19. 各廠商,全球產業研究中心, (2001年2月) 。
20. 顧鴻壽,”光電液晶平面顯示器技術基礎及應用”, 新文京開發出版有限
公司。
21. 孫麗雯,” 磨料噴射技術應用於模具鋼精微拋光之研究”, 碩士論文, 中
央大學機械工程研究所(2007) |