新穎太陽能電池基板表面粗糙化結構之研究

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鍾承軒(Cheng-hsuan Chung) 查詢紙本館藏

畢業系所

化學工程與材料工程學系

論文名稱

新穎太陽能電池基板表面粗糙化結構之研究

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摘要(中)

本研究利用一簡單容易且快速有效的方法，以化學溶液蝕刻法在噴砂之玻璃與矽晶基板上，製備表面粗糙化結構。在表面粗糙化之玻璃基板實驗中，噴砂玻璃在初始蝕刻時，其光穿透率會先下降，而後光穿透率會隨著蝕刻時間增加而上升，光散射率則是開始蝕刻後便開始上升，蝕刻至8分鐘達最高值。在本研究中，蝕刻8分鐘之表面粗糙化玻璃基板具備平均光穿透92.5 %、平均光散射63.3 %且霧度達68.4 %之光學性質。此外，鍍製ZnO:Al透明導電薄膜在表面粗糙化結構的玻璃基板上，與未鍍製ZnO:Al薄膜之表面粗糙化玻璃，在光學性質上具有相同之趨勢。
經由噴砂處理與化學溶液蝕刻製備之表面粗糙化結構矽晶基板，其反射率下降幅度相當顯著；進一步調變蝕刻時間，將矽晶基材蝕刻成碗狀之表面粗糙化結構，在400-800 nm波長範圍內，平均光反射率可從24 %降低至不到2 %。本研究所提出之製程可製備出具抗反射效果之碗狀結構矽晶基板，且在高效能矽基太陽能電池的應用上有非常大的發展潛力。

摘要(英)

In this study, we propose a facile and efficient method to produce textured surfaces on glass and silicon substrates, which is based on the sandblasting with a wet etching technique. The transmittance of the textured glass was found to decrease with etching time first then increase. The intensity of light scattering from the textured glass was increased with etching time, and reached the maximum value at the etching time of 8 min. The transmittance, scattering, and haze values of the textured glass substrate after etching at 8 min were measured to be about 92.5 %, 63.3 %, and 68.4 %, respectively. In addition, the optical properties of the textured glass substrates after depositing ZnO:Al thin films show the same trend as these textured glass substrates.
After appropriate sandblasting and wet etching treatments, the optical reflectance of the textured silicon substrates can be significantly reduced. By adjusting the etching time, the average reflectance measured in the wavelength range of 400 to 800 nm for the bowl-like textured Si substrates can be gradually decreased from 24 % to less than 2 %. Therefore, the process proposed in the study and the bowl-like antireflection structures produced may have potential applications in high-efficiency Si-based solar cells.

關鍵字(中)

★ 表面粗糙化
★ 化學濕式蝕刻
★ 鋁摻雜氧化鋅薄膜
★ 太陽能電池

關鍵字(英)

★ Surface textured
★ Chemical etching
★ ZnO:Al thin film
★ Solar cell

論文目次

目錄
第一章前言及文獻回顧 1
1.1 前言 1
1.2 太陽能電池 2
1.2.1 矽晶基板太陽能電池 2
1.2.2 矽基薄膜太陽能電池 3
1.3 透明導電氧化物薄膜 4
1.4 表面粗糙化結構 5
1.4.1 透明導電薄膜表面粗糙化 6
1.4.2 玻璃基板表面粗糙化 7
1.4.3 矽晶基板表面粗糙化 8
1.5 研究動機與目的 9
第二章實驗步驟與分析儀器 11
2.1 實驗步驟 11
2.1.1 利用噴砂機製備表面粗糙化之玻璃與矽晶基板 11
2.1.2 化學溶液蝕刻法製備碗狀之表面粗糙化基板 11
2.1.3 ZnO:Al薄膜沉積在表面粗糙化玻璃基板上之特性分析 12
2.2 分析儀器 12
2.2.1 低真空掃描式電子顯微鏡 12
2.2.2 紫外-可見光光譜儀 12
2.2.3 表面輪廓儀 13
2.2.4 四點探針 13
2.2.5 霍爾效應量測 13
2.2.6 X光繞射分析 14
2.2.7 多角度紫外-可見光-近紅外光光譜儀 14
第三章實驗結果與討論 15
3.1 表面粗糙化玻璃基板之製備與探討 15
3.1.1 噴砂處理之玻璃基板表面結構 15
3.1.2 化學溶液蝕刻噴砂玻璃基板之表面粗糙化結構分析 15
3.1.3 表面粗糙化之玻璃基板結構對於光學特性之影響 17
3.1.4 濺鍍ZnO:Al透明導電薄膜在表面粗糙化玻璃基板之特性與結構分析 19
3.2 製備低反射之表面粗糙化結構之矽晶基板 22
3.2.1 矽晶基板經由噴砂處理之表面結構 22
3.2.2 以化學溶液蝕刻製備表面粗糙化之矽晶基板 22
3.2.3 矽晶基板之表面粗糙化結構對反射率之影響分析 23
第四章結論 26
參考文獻 28
表目錄 33
圖目錄 37

參考文獻

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指導教授

鄭紹良(Shao-liang Cheng)

審核日期

2013-1-30

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