| 摘要(英) |
Abstract
DRAM plays a central role in the electronics industry due to its wide spread applications in various products, like PC, mobile phone, optical disk drive, digital camera, printer, digital TV, etc. However, DRAM is a standardized product, and is treated as a commodity in the market. Thus, a DRAM manufacturer cannot keep its customer with unique product specifications like other semiconductor ICs. The most important issue in improving profitability is to reduce its production costs. In general, there are three methods to reduce its production costs: reducing manufacturing cycle time, introducing advanced technology and improving yield.
Yield improvement is very important for semiconductor industry. The company in this study produces about 1,000 million chips per year. If the yield rate can be improved by 1%, it translates to an additional 10 million finished chips per year without further investment. Assuming the selling price of a chip to be 2 USD, it can result in additional 20 million USD per year in profit for the company. Thus, every DRAM foundry tries their best to find any possible means to improve its yield rate.
Among the various plans that the company in this study attempts, is to improve its production uniformity, which is a statistics collected for daily quality management purpose, hoping that it would improve yield. It sounds logical to use uniformity as an indicator for predicting yield, but whether it is an effective indicator in practice is not known. Thus, this study attempts to investigate the feasibility by statistically analyzing the data collected previously, to establish any relationship between yield and uniformity.
Results of the in depth analysis show that uniformity alone, as collected for quality management purpose, is not an effective predictor of yield. Therefore, we do not recommend using the uniformity statistics as a predictor of yield. |
| 參考文獻 |
參考文獻
英文部分
1.Albert V. Ferris-Prabhu, 1992, Introduction to Semiconductor Device Yield Modeling, Artech House, Boston.
2.Cunningham, J. A., 1990, “The Use and Evaluation of Yield Models in Integrated Circuit Manufacturing,” IEEE Trans. on Semiconductor Manufacturing, Vol. 3, No.2.
3.Mirza, A.I., Donoghue, G.O., Drake, A.W., Graves, S.C., 1995, “Spatial Yield Modeling for Semiconductor Wafers,” IEEE / SEMI Advanced Semiconductor Manufacturing Conference.
4.Murphy, B.T., 1964, “Cost-Size Optima of Monolithic Integrated Circuits,” IEEE Proc., Vol. 52, no. 12.
5.Seeds, R.B., 1967a, “Yield and Cost Analysis of Bipolar LSI,” IEEE International Electron Meeting, Washington, D.C...
6.Seeds, R.B., 1967b, “Yield, Economic, and Logistic Models for Complex Digital Arrays,” IEEE International Convention Record, Vol. 56.
7.Smith, T., Boning, D., Fang, S., Shinn, G., Stefani, J., 1999, “A Study of Within Wafer Non-Uniformity Metrics,” Microsyst. Techno Lab., MIT, Cambridge, MA.
8.Stapper, C.H., 1973, “Defect Density Distribution for LSI Yield Calculations,” IEEE Transactions on Electron Devices, Vol. ED-20.
中文部份
1.TISC研究週報，2008，2008年DRAM產業，TISC研究週報。
2.林瑞山，2004，類神經網路於預測晶圓測試良率之應用，國立成功大學工學院工程管理碩士在職專班。
3.林才森，2003，台灣半導體產業現況與IC簡介，茂矽電子。
4.許俊賢，2002，DRAM價格與DRAM個股股價關係之研究，國立台北大學企業管理研究所碩士論文。
5.郭寶謙，2006，DRAM月平均價格變動分析，國立中央大學資訊管理研究所碩士論文。
網路部份
1.DIGITIMES 科技網(2008a)，茂德董事長陳民良談變革：DRAM產業10年潮起潮落變革因子永遠蠢動，http://www.digitimes.com.tw/n/10article.asp?id=0000087081_B9Y6601M967CSR32QJXGA,
2.DIGITIMES 科技網(2008b)，火線話題－沒錢還是萬萬不能，http://www.digitimes.com.tw/n/article.asp?id=0000087056_B9K69Z12X44J35Y7YABE5,
3.思源基金會，半導體產業簡介，http://www.spring.org.tw/plan/a86/case/旺宏電子.htm, |
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