參考文獻 |
[1] Kevin Linthicum, Thomas Gehrke, Darren Thomson, Eric Carlson, PradeepRajagopal, Tim Smith, Dale Batchelor, and Robert Davis, “Pendeoepitaxy of gallium nitride thin films,” Appl. Phys. Lett.75,196(1999)
[2] T. Fujii, Y. Gao, R. Sharma, E. L. Hu, S. P. DenBaars, and S. Nakamura, ”Increase in the extraction efficiency of GaN-based light-emitting diodes via surface roughening,” Appl. Phys. Lett. 84, 855(2004)
[3] Chul Huh, Kug-Seung Lee, Eun-Jeong Kang, and Seong-Ju Park, “Improved light-output and electrical performance of InGaN-based light-emitting diode by microroughening of the p-GaN surface,” J. Appl. Phys. 93, 9383(2003)
[4] J. J. Wierer, D. A. Steigerwald, M. R. Krames, J. J. O’Shea, M. J. Ludowise, G. Christenson, Y-C, Shen, C. Lowery, P. S. Martin, S. Subramanya, W. Gotz, N. F. Garder, R. S. Kern, and S. A. Stockman, “High-power AlGaInN flip-chip light-emitting diodes,” Appl. Phys. Lett. 78, 3379(2001)
[5] M. Koike, N. Koide, S. Asami, J. Umezaki, S. Nagai, S.Yamasaki, N. Shibata, H. Amano, and I. Akasaki, in Proc. SPIE International Society for Optical Engineering, vol.3002, pp.36-39(1997)
[6] Sung-Pyo Jung, Chien-Hung Lin, Hon Man Chan, Zhiyong Fan, J. Grace Lu, and Henry P. Lee, phys. stat. sol. (a)201, no.12, 2827-2830(2004)
[7] D. S. Wuu, W. K. Wang, W. C. Shih, R. H. Horng, C. E. Lee, W. Y. Lin, and J. S. Fang, “Enhanced Output Power of Near- Ultraviolet InGaN–GaN LEDs Grown on Patterned Sapphire Substrates,” IEEE Photon. Technol. Lett. , vol. 17, no. 2, Feb. 2005
[8] D.A. Meller, D.S. Chemla, T.C. Damen, A.C.Gross, W. Wiegmann, T.H. Wood, and C.A. Burrus. Phys. Rev. Lett., vol.53, pp.2173-2176, 1984
[9] Aurélien David,a Michael J. Grundmann, John F. Kaeding, Nathan F. Gardner,Theodoros G. Mihopoulos, and Michael R. Krames, “Carrier distribution in (0001)InGaN/GaN multiple quantum well light-emitting diodes,” Appl. Phys. Lett. , Volume 92, Issue 053502, Feb 4, 2008.
[10] X. Guo and E. F. Schuberta, “Current crowding and optical saturation effects in GaInN/GaN light-emitting diodes grown on insulating substrates,” Appl. Phys. Lett. ,Volume 78, NO.21, May 21, 2001 .
[11] 李世鴻, “半導體工程原理”,p.360,全威圖書有限公司.
[12] Hyunsoo Kim, Ji-Myon Lee, Chul Huh, Sang-Woo Kim, Dong-Joon Kim, Seong-Ju Park, and Hyunsang Hwang, “Modeling of a GaN-based light-emitting diode for uniform current spreading,” Appl. Phys. Lett. Volume 77, NO.1903(2000)
[13] Hyunsoo Kim, Seong-Ju Park, Hyunsang Hwang, ”Lateral current transport path, a model for GaN-based light-emitting diodes: Applications to practical device designs,” Appl. Phys. Lett. Volume 81, NO.1326(2002)
[14] X. Guo and E. F. Schubert, “Current crowding in GaN/InGaN light emitting diodes on insulating substrates,” J. Appl. Phys. 90, 4191(2001)
[15] E. F. Schubert, “LIGHT-EMITTING DIODE”, CAMBRIDGE UNIVERSITY PRESS
[16] Y. J. Yang, Y. C. Lo, G. S. Lee, K. Y. Hsieh, and R. M. Kolbas , Appl. Phys. Lett. , Volume 49, Issue 14, pp. 835-837, Oct 6, 1986.
[17] J.-W. Shi, C.-C. Chen, C.-K. Wang, C.-S. Lin, J.-K. Sheu, W.-C. Lai, C.-H. Kuo, C.-J. Tun, T.-H. Yang,F.-C. Tsao, and J.-I. Chyi , “Phosphor-Free GaN-Based Transverse Junction White-Light Light-Emitting Diodes With Regrown n-Type Regions,” IEEE Photon. Technol. Lett. ,Vol20, No.6 , March 15, 2008.
[18] S. Nakamura, N. Iwasa, M. Senoh, and T. Mukai, “Hole Compensation Mechanism of P-Type GaN Films,” Jpn. J. Appl. Phys. 31,1258 (1992).
[19] M. S. Minsky, M. White, and E. L. Hu,“Room-temperature photoenhanced wet etching of GaN,” Appl. Phys. Lett. Volume 68, NO.1531 (1996).
[20] C. Youtsey , I. Adesida , L. T. Romano and G. Bulman, “Smooth n-type GaN surfaces by photoenhanced wet etching,” Appl. Phys. Lett. Volume 72,NO. 560 (1997).
[21] J. K. Sheu , Y. K. Su ,G. C. Chi ,W. C. Chen, C. Y. Chen, C. N. Huang,J. M. Hong,Y. C. Yu, C. W. Wang, and E. K. Lin, “The effect of thermal annealing on the Ni/Au contact of p-type GaN,” J. Appl. Phys. 83, 3172 (1998).
[22] Li-Chien Chen, Fu-Rong Chen, Ji-Jung Kai,Li Chang,Jin-Kuo Ho, Charng-Shyang Jong, Chien C. Chiu, Chao-Nien Huang, Chin-Yuen Chen, and Kwang-Kuo Shih, “Microstructural investigation of oxidized Ni/Au ohmic contact to p-type GaN ,” J. Appl. Phys. 86, 3826 (1999).
[23] Jin-Kuo Ho , Charng-Shyang Jong, Chien C. Chiu, Chao-Nien Huang, Chin-Yuen Chen, and Kwang-Kuo Shih, “Low-resistance ohmic contacts to p-type GaN,” Appl. Phys. Lett. Volume 74, NO.1275 (1999).
[24] Y. P. Varshni, Phys. Vol. 34, pp.149,1967
[25] H. Zhong, A. Tyagi, N. N. Fellows, R. B. Chung ,M. Saito, K. Fujito, J. S. Speck, S. P. DenBaars and S. Nakamura “Demonstration of high power blue-green light emitting diode on semipolar bulk GaN substrate,” Electronics Letters, Vol.43, No. 15, 2007.
[26] D. A. Meller, D. S. Chemla, T. C. Damen, A. C. Gross,W.Wiegmann, T.H. Wood, and C. A. Burrus, “Band-edge electroabsorption in quantum well structures: The quantum-confined stark effect,” Phys. Rev. Lett., vol. 53, pp. 2173–2176, 1984.
[27] D. A. B. Miller, D. S. Chemla, and S. Schmitt-Rink, “Relation between electron absorption in bulk semiconductors and in quantum wells: The quantum-confined Franz-Keldysh effect,” Phys. Rev. B, vol. 33, pp.6976–6982, 1986. |