負折射率材料應用於抗反射與窄帶濾光片之設計

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姓名

蔡榮烈(Jung-Lieh Tsai) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

負折射率材料應用於抗反射與窄帶濾光片之設計
(Applications of negative refraction index materials for antireflection and narrow band pass filters.)

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摘要(中)

本文之研究重點為以負折射率材料(Negative refraction index materials)來設計抗反射與窄帶濾光片，研究內容包含探討負折射率材料之特性、成因與其在電磁理論上的修正，接著探討如何利用其特性應用在薄膜設計上，並利用薄膜理論中的膜矩陣及導納軌跡圖做為設計方法來設計抗反射與窄帶濾光片，最後探討以負折射率材料所設計的抗反射膜以及窄帶濾光片的特殊光學性質。
在抗反射膜的應用上，以往的光學薄膜伴隨著膜層的增多其相位會朝固定方向累加，因此光譜會隨入射角度而偏移，但是若加上負折射率膜層，則相位會成反向變化，即對整體相位而言有了補償的效果，因此在整體相位下降的情況下，薄膜設計對於波長抑或是受角度變化的影響較低，由此將原本單波長抗反射膜的V字形(V-coat)設計中的某些膜層改為負折射率材料，使此抗反射膜設計變成廣波域抗反射膜。在窄帶濾光片的應用上，以改變空間層膜堆為負折射率材料的方式設計新式窄帶濾光片，由於整體相位的改變，中心波長隨入射角度的偏移量也會跟著改變，藉由調變空間層膜堆的設計，求出偏移量與角度的關係式，可設計出不隨角度偏移的窄帶濾光片。

摘要(英)

The research point in this paper is the designs of antireflection coatings and narrow band pass filters using negative refraction index materials (NIMs). First, the properties of NIMs and the modification of electromagnetism are discussed to illustrate how to design optical thin film filters using those properties. The thin film matrix and admittance locus methods have been applied to design antireflection coatings and narrow band pass filters. Finally, the special optical properties of antireflection coatings and narrow band pass filters with NIMs are analyzed.
Normally, the phase of optical thin film is increased when the thickness of optical thin film is increased. However, the phase of NIM is decreased as the thickness of the film is increased to affect the whole phase decreased. In other words, the whole phase is compensated. The result affects the spectra of the thin films have less sensitivity in wavelength and incident angle. If the antireflection coatings are designed with NIMs, the low reflection range is broader than without NIM and the average reflection is lower, too. Another application for NIM is to replace the spacer layer using NIM to be a new type of narrow band pass filter. As the whole phase changes, the central wavelength is different. Hence the narrow band pass filter can be designed as a wavelength-non-shift filter with incident angle based on the relationship of incident angle and central wavelength.

關鍵字(中)

★ 窄帶濾光片
★ 薄膜設計
★ 負折射
★ 超穎物質
★ 抗反射
★ 左手材料

關鍵字(英)

★ antireflection
★ Negative refraction index
★ NIM
★ Metamaterials
★ thin films
★ narrow band pass filters

論文目次

目錄
摘要 i
Abstract ii
致謝 iii
圖目錄 vi
第一章緒論 1
1.1 背景 1
1.2 研究動機 4
1.3 論文導引 5
第二章負折射率材料 6
2.1 負折射率材料的源起 6
2.2 Veselago的理論基礎 7
2.3 負折射率的定義及物理意義 10
2.4 等效介電係數與等效磁導率[44] 13
2.4.1 等效介電係數 14
2.4.2 等效磁導率 18
2.5 各種結構之負折射率材料 23
第三章光學薄膜理論 27
3.1 基本理論[45,46] 27
3.2 膜矩陣 29
3.3 導納軌跡圖 33
第四章薄膜設計與應用 37
4.1 理論分析 37
4.2 抗反射膜 39
4.3 窄帶濾光片 47
第五章結論 60
5.1 結論 60
Conclusion 62
5.2 未來與展望 64
參考文獻 65

參考文獻

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指導教授

李正中、陳昇暉
(Cheng-Chung Lee、Sheng-Hui Chen)

審核日期

2009-7-20

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