博碩士論文 962406019 詳細資訊




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姓名 陳君閣( Chun-Ko Chen)  查詢紙本館藏   畢業系所 光電科學與工程學系
論文名稱 以陽極處理法製備奈米孔洞陣列光電元件
(Electro-optical Devices on Anodic Aluminum Oxide Nano-channel Arrays)
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摘要(中) 本研究以陽極處理法(AAO)製備奈米孔洞陣列基板,並應用於四種不同的光電元件。
研究重點在探討以大週期奈米壓印模控制孔洞生長位置和多步驟生長(multi-step)法對孔洞生長品質的影響,並提出換酸陽極氧化法(multi-electrolyte-step),先在磷酸中生長大週期的孔洞,再以化學溶解使其形成碗狀結構,接著換至草酸中用較小偏壓生長真圓度佳且規則排列的孔洞。根據奈米孔洞的真圓度分析以及平均週期的計算,在120-150 V的高外加偏壓下,其孔洞陣列的週期介於230-310 nm,標準差小於25 nm,孔洞的真圓度則超過0.85。
在基板應用上,本研究亦將基板應用於各類元件: 以翻印的方式在矽基板上蝕刻週期220 nm的錐狀抗反射結構,其反射率小於2%,並製作為異質接面太陽能電池,其太陽能電池效率增益達16%。以週期150 nm的陽極氧化基板搭配多層膜堆設計,製作出藍光區410-460 nm平均反射率92%的全方位反射鏡,讓60度斜向入射時的中心波長控制增益33%。也用模板結合原子層沉積法(Atomic Layer Deposition),在透明導電膜基板上製作週期僅90 nm 的二氧化鈦奈米管陣列,並以其作為染料敏化太陽能電池之工作電極。亦配合電鍍技術,製備出具表面電漿效應的銅奈米顆粒陣列。
摘要(英) Nano-channel arrays were grown by an anodic aluminum oxide (AAO) method and applied to four kinds of photonic devices.
The multi-step and nano-imprinting AAO processes were developed to grow high quality nano-channel arrays. Besides, a novel process of multi-electrolyte-step (MES) AAO was proposed to fabricate nano-channel arrays with better quality. The first AAO nano-channel arrays with large period of 200-350 nm were grown in phosphoric acid. Then the bowl structures were formed by chemical dissolution. The second AAO nano-channel arrays were grown from the bottom of the bowl structures in oxalic acid at a small bias voltage. To analyze the quality of MES AAO, the standard deviation of the nano-channel arrays was less than 25 nm at 120-150 volts; and the circularity was larger than 0.85.
There were several photonic devices applied to the AAO nano-channel arrays. As a template, the anti-reflectance structure of the nano-cone arrays was etched on the n-type silicon wafer. The reflectance of nano-cone arrays with a period of 220 nm was less than 2%. And the heterojunction silicon solar cell with the structures was higher than 16% of the photonic-electrical efficiency.
The autocloned multi-layers have also been coated on an AAO template with a period of 150 nm. A 92% reflectance of the omni-directional reflector (ODR) could be achieved in the spectrum range of 410-460 nm. There was 33% improvement of central wavelength shift for the ODR with 60 degree of the incident angle.
Besides, the AAO method has also combined with atomic layer deposition (ALD) to grow TiO2 nano-channel arrays on a fluorine doped tin oxide (FTO) glass to apply to a dye sensitized solar cell for increasing the photo-induced current.
Finally, the copper nano-particle arrays had also been grown on the AAO template by electroplating to enhance the surface plasma response effect.
關鍵字(中) ★ 陽極氧化鋁
★ 換酸
★ 奈米孔洞陣列
關鍵字(英) ★ anodic aluminum oxide
★ multi-electrolyte-step
★ nano-channel arrays
論文目次 目錄

摘要 I
Abstract II
目錄 III
圖目錄 VI
表目錄 IX
第一章 緒論
1-1研究背景 1
1-2研究動機 7
1-3本文架構 9
第二章 基礎理論
2-1陽極氧化鋁法(Anodic Aluminum Oxide, AAO)製備奈米孔洞陣列 10
2-2 nano-imprinting 方法改善AAO奈米孔洞之週期排列 14
2-3 multi-step方法改善AAO奈米孔洞之週期排列 15
2-4 換酸方法(multi-electrolyte-step)改善AAO孔洞之週期排列 16
2-5 實驗工具與量測儀器
2-5-1 AAO治具 20
2-5-2 磁控濺鍍機 20
2-5-3 雙電子槍蒸鍍機 21
2-5-4 積分球光譜儀 22
2-5-5 掃描式電子顯微鏡 23
第三章 奈米孔洞陣列之真圓度控制及平均週期的分析
3-1 孔洞良率分析的工具與方法
3-1-1 真圓度定義 25
3-1-2快速傅立葉轉換(Fast Fourier Transform, FFT) 26
3-2參數設定及實驗結果
3-2-1 化學溶解對圓孔孔徑之控制分析 26
3-2-2 one-step AAO方法製備奈米孔洞陣列之分析 28
3-2-3 nano-imprinting法製備奈米孔洞陣列之分析 30
3-2-4 five-step AAO方法製備奈米孔洞陣列之分析 33
3-2-5 multi-electrolyte-step AAO方法製備奈米孔洞陣列之分析 35
3-2-6 multi-electrolyte-step與Five-step的品質分析 39
第四章 AAO模板技術對於光電元件之應用
4-1 AAO模板翻印抗反射結構於矽基薄膜太陽能電池 43
4-2以AAO模板製備全方位反射鏡 54
4-3以AAO模板翻印TiO2奈米管於染料敏化太陽能電池 66
4-4 以AAO模板翻印奈米銅陣列應用於表面電漿子結構 73
第五章 結論與未來工作
5-1 結論 78
5-2 未來工作 81
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指導教授 陳昇暉(Sheng-Hui Chen) 審核日期 2014-1-9
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