自我複製式偏振分光鏡製作與誤差分析

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姓名

王淳弘(Chun-Hung Wang) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

自我複製式偏振分光鏡製作與誤差分析
(Fabrication and Error Analysis of the Autocloned Polarization Beam Splitters)

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摘要(中)

本論文主要以自我複製技術(autocloning technique)來製作偏振分光鏡(polarization beam splitters)，並藉由有限時域差分法(Finite-Difference Time-Domain; FDTD) 來設計偏振分光鏡以及蒙地卡羅模擬法(Monte Carlo methods)來分析實際製作上可能會造成的誤差。
首先，從單層TiO2奈米結構膜開始研究，觀察隨蝕刻時間增長，結構膜表面形狀變化，找到合適的TiO2蝕刻速率方程式(etching rate function)，並模擬TiO2結構膜表面形狀曲線，同時找出最佳蝕刻TiO2結構膜的離子源電壓，以維持週期性結構膜Z字形形狀。
因在製程過程中，堆疊多層自我複製結構薄膜，其每層形狀角度有些許差異，藉由蒙地卡羅模擬法來探討自我複製式偏振分光鏡製作上的誤差，此外，再配合對稱膜堆應用於抗反射膜之設計，找出最佳的膜堆設計，而本研究利用電子槍蒸鍍系統與離子源助鍍製作自我複製式偏振分光鏡，其厚度約為8 μm，工作範圍約為200 nm(1300-1500 nm)可應用於紅外光區塊，而在1300 – 1350 nm其消光係數高達185，未來可應用於光通訊。

摘要(英)

In this study, we have fabricated autocloned polarization beam splitters (PBSs) using autocloning technique and designed autocloned PBS by finite-difference time-domain (FDTD). Moreover, we have also analyzed the error of working range in PBS by Monte Carlo methods during fabrication process.
Above all, we have researched TiO2 nano-structural films to observe the surface evolution of TiO2 structural films with increasing the etching time, figured out etching rate function of TiO2 structural films and simulated the surface profiles. And then, we have found the ion beam voltage, 600 V of TiO2 structural films is the best voltage to preserve the shape of zigzag films.
We have discussed the error analysis of autocloned PBS according to the Monte Carlo method because the top angle for each layer was a little different during stacking multilayers autocloned thin films. However, we have utilized symmetric structure to design antireflection coating. And we have fabricated the autocloned PBS using electron beam gun evaporation with ion-beam-assisted depositon (IAD) successfully. The physical thickness was 8μm and the shape of zigzag was preserved. Besides, the autocloned PBS had broad working range about 200 nm (1300-1500 nm) in infrared region and achieved the average extinction ratio 185 from 1300 nm to 1350 nm.

關鍵字(中)

★ 偏振分光鏡
★ 光子晶體
★ 自我複製

關鍵字(英)

★ autocloning technique
★ photonic crystals
★ polarization beam splitters

論文目次

目錄
摘要I
AbstractII
目錄 III
圖目錄 V
表目錄IX
第一章緒論 1
1-1背景 1
1-2 文獻回顧 3
1-3 研究動機 4
1-4 本文架構 6
第二章基礎理論 7
2-1 自我複製結構膜成膜機制 7
2-2 有限時域差分法(FDTD) 11
2-3蒙地卡羅模擬法 19
第三章單層奈米結構膜 21
3-1 製作流程 21
3-2 製程設備 22
3-3 量測儀器 24
3-4 不同離子源電壓、不同蝕刻時間對結構膜表面的影響 26
3-4-1不同離子源電壓、蝕刻時間40分鐘對結構膜表面的影響 27
3-4-2不同離子源電壓、蝕刻時間80分鐘對結構膜表面的影響 29
3-5 蝕刻作用於結構膜表面之模擬與分析 33
第四章多層自我複製結構膜元件 39
4-1自我複製式光子晶體偏振分光鏡之設計 39
4-1-1 光子晶體偏振分光鏡頻帶結構 39
4-1-2 光子晶體偏振分光鏡光譜圖 43
4-1-3 抗反射膜設計 45
4-2誤差分析 48
4-3元件製作與鍍製結果 60
第五章結論與未來工作 66
參考文獻 68

參考文獻

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指導教授

陳昇暉、李正中
(Sheng-Hui Chen、Cheng-Chung Lee)

審核日期

2010-7-26

推文