參考文獻 |
1. Jun Sakaguchi1, Yoshinari Awaji1, Naoya Wada1, Atsushi Kanno1, Tetsuya Kawanishi1, Tetsuya Hayashi2, Toshiki Taru2, Tetsuya Kobayashi3, Masayuki Watanabe3,“109-Tb/s (7x97x172-Gb/s SDM/WDM/PDM) QPSK transmission through 16.8-km homogeneous multi-core fiber,” OSA/OFC/NFOEC 2011, PDPB6
2. Intel’s official website: http://techresearch.intel.com/articles/None/1813.htm
3. R. Heming, L. C. Wittig, P. Dannberg, J. Jahns, E. B. Kley, and M. Gruber, Efficient planar-integrated free-space optical interconnects fabricated by a combination of binary and analog lithography,” IEEE J. Lightwave Technol., 26(14), 2136-2141 (2008).
4. P. Lukowicz et al., “Optoelectronic interconnection technology in the HOLMS system,” IEEE J. Sel. Top. Quantum Electron., 9(2), 624-635 (2003).
5. H. L. Althaus, W. Gramann, and K. Panzer, “Microsystems and wafer processes for volume production of highly reliable fiber optic components for telecom- and datacom-application,” IEEE Trans. on Compon., Packag., and Manufact. Technol. pt. B, 21(2), 147-156 (1998).
6. I. Connor, F. Tissafi-Drissi, F. Gaffiot, J. Dambre, M. De Wilde, J. Van Campenhout, D. Van Thourhout, J. Van Campenhout, and D. Stroobandt, “Systematic simulation-based predictive synthesis of integrated optical interconnect,” IEEE Trans. on VLSI Sys., 15, 927-940 (2007).
7. Berkehan Ciftcioglu, Rebecca Berman, Jian Zhang, Zach Darling, Shang Wang, Jianyun Hu, Jing Xue, Alok Garg, Manish Jain, Ioannis Savidis, Duncan Moore, Michael Huang, Eby G. Friedman, Gary Wicks, and Hui Wu, “A 3-D Integrated Intrachip Free-Space Optical Interconnect for Many-Core Chips”, IEEE PHOTONICS TECHNOLOGY LETTERS, VOL. 23, NO. 3, FEBRUARY 1, 2011
8. J.-M. Fedeli1, L. Liu2,3, L. Grenouillet1, D.Bordel1, F. Mandorlo4, N. Olivier1, T. Spuesens2, P. Regreny4, P. Grosse1 P. Rojo-Romeo4, R.Orobtchouk4, and D. Van Thourhout2. “Towards Optical Networks-on-Chip with 200mm hybrid technology”, OSA/OFC/NFOEC 2011, OMM3
9. 沈帛寬,”具45°反射面之非共平面轉折波導光路,” (中央大學光電所碩士論文, 台灣, 2010)
10. H. C. Lan, H. L. Hsiao, C. C. Chang, C. H. Hsu, C. M. Wang, M. L. Wu,“Monolithic integration of elliptic-symmetry diffractive optical element on silicon-based 45° micro-reflector,” Opt. Express, 17, 20938-20944 (2009).
11. 楊凌岡,“以矽光學平台為基礎之4通道10-Gbps光學連結模組之發射端,” (中央大學光電所碩士論文, 台灣, 2010)
12. B. E. Lemoff, M. E. Ali, G. Panotopoulos, G. M. Flower, B. Mahdavan, A. F. J.Levi, and D. W. Dolfi, “MAUI: Enabling fiber-to-processor with parallel multiwavelength optical interconnects,” IEEE J. Lightwave Technol., 22, 2043-2054 (2004).
13. F. Wang, F. Liu, and A. Adibi, “45 degree polymer micromirror integration for board-level three-dimensional optical interconnects,” Opt. Express, 17, 10514-10521 (2009).
14. 張育誠, “微型光學讀取頭之元件,” (中央大學光電所碩士論文, 台灣, 2003)
15. I. Zubel, “Silicon anisotropic etching in alkaline solutions III: On the possibility of spatial structures forming in the course of Si(100) anisotropic etching in KOH and KOH+IPA solutions,” Sensors and Actuators A: Physical, 84, p. 116-125 (2000)
16. I. Zubel, “Silicon anisotropic etching in alkaline solutions IV – The effect of organic and inorganic agents on silicon nisotropic etching process,” Sensors and Actuators A: Physical, 87, p. 163-171 (2001)
17. I. Zubel, “The effect of isopropyl alcohol on etching rate and roughness of (100) Si surface etched in KOH and TMAH solutions,” Sensors and Actuators A: Physical, 93, p. 138-147 (2001)
18. M. Shikida, K. Tokoro, D. Uchikawa, K. Sato, Surface morphology of anisotropically etched single-crystal silicon, J. Micromech. Microeng.10 (2000) 522–527.
19. K. Sato, M. Shikida, T. Yamashiro, M. Tsunekawa, S. Ito, Roughen- ing of single crystal silicon surface etched by KOH water solutions, Sens. Actuators A 73 (1999) 122–130.
20. M. Shikida, K. Sato, K. Tokoro, D. Uchikawa, Differences in anisotropic etching properties of KOH and TMAH solutions, Sens. Actuators A 80 (2000) 179–188.
|