|| K. Badeker, “Concerning the electricity conductibility and the thermoelectric energy of several heavy metal bonds.”, Ann. Phys.(Leipzig), vol.22, pp. 749, 1907.|
 P. Barquinha, G. Goncalves, L. Pereira, R. Martins, E. Fortunato, “Effect of Annealing Temperature on The Properties of IZO Films and IZO Based Transparent TFTs,” Thin Solid Films 515:8450–8454, 2007.
 J-A. Jeong, Y-S. Park, H-K. Kim, “Comparison of Electrical, Optical, Structural, and Interface Properties of IZO-Ag-IZO and IZO-Au-IZO Multilayer Electrodes for Organic Photovoltaics,” J. Appl. Phys. 107:023111, 2010.
 H. Cheun, J. Kim, Y. Zhou, Y. Fang, A. Dindar, J. Shim, C. Fuentes-Hernandez, K. H. Sandhage, B. Kippelen, “Inverted Polymer Solar Cells with Amorphous Indium Zinc Oxide as the Electron-Collecting Electrode,” Opt. Express 18(104):A506-A512 2010.
 C. Guillen, J. Herrero, ”Stability of sputtered ITO thin films to the damp-heat test,” Surface and Coatings Technology,Vol.201, Issues 1-2, 309-312, 2006
 J. Olivier , , B. Servet, M. Vergnolle, M. Mosca, G. Garry,” Stability/instability of conductivity and work function changes of ITO thin films, UV-irradiated in air or vacuum: Measurements by the four-probe method and by Kelvin force microscopy,” Synthetic Metals, Vol. 122, Issue 1, 87-89, 2001
 H-M Kim, S-K Jung, J-S Ahn, Y-J Kang, K-C Je, “Electrical and optical properties of In2O3-ZnO films deposited on polyethyleneterephthalate substrates by radio frequency magnetron sputtering,”Jpn. J. Appl. Phys.42(2003) pp.223-227
 Kaijou, et al., United State Patent, Patent No. 5972527 1999.
 T.Minami, T. Kakumu, S.Takata,”Preparation of transparent and conductive In2O3–ZnO films by radio frequency magnetron sputtering,”J.Vac.Sci.Technol.A 14, 1704(1996)
 H. Hiramatsu, W.S. Seo, K. Kumoto,” Electrical and Optical Properties of Radio-Frequency-Sputtered Thin Films of (ZnO)5In2O3,” Chem. Mater. 10 (1998) pp.3033-3039.
 Y. Yan, S.J. Pennycook, J. Dai, R.P.H. Chang, A. Wang, T.J. Marks,” Polytypoid structures in annealed In2O3–ZnO films ,“Appl. Phys. Lett. 73 2585(1998).
 T. Minami,” Transparent and conductive multicomponent oxide films prepared by magnetron sputtering ,” J. Vac. Sci. Technol. A 17,1765 (1999).
 T. Minami, T. Miyata, T. Yamamoto,” Stability of transparent conducting oxide films for use at high temperatures,” J. Vac. Sci. Technol. A 17 ,1822 (1999)
 T. Minami, S. Takata, T. Kakumu, H. Sonohara,” New transparent conducting MgIn2O4?Zn2In2O5 thin films prepared by magnetron sputtering,” Thin Solid Films 270:22-26,1995
 T.Minami , T.Kakumu, Y.Takeda, and S.Takata,”Preparation of transparent conducting Zn2In2O5 films by d.c. magnetron sputtering,” Thin Solid Films 317:326-329,1998
 H. M. Mott-Smith, I. Langmuir,” The Theory of Collectors in Gaseous Discharges,” Phys. Rev. 28:727-763, 1926
 J. G. Laframboise,” Theory of Spherical and Cylindrical Langmuir Probes in a Collisionless, Maxwellian Plasma at Rest,”1966
 V.A. Godyak, R.B. Piejak and B.M. Alexandrovich, “Measurements of electron energy distribution in low-pressure RF discharge,” Plasma Source Sci. Technol. 1,36,1992
 A. Schwabedissen, E. C. Benck and J. R. Roberts, “Langmuire probe measurement in an inductively coupled plasma source,” Phys. Rev. E, 55,3450-3459,1997
 J. M. Hendron, C. M. O. Mahony, T. Morrow, W. G. Grahama, “Langmuir Probe Measurements of Plasma Parameters in the Late Stages of a Laser Ablated Plume,” J. Appl. Phys. 81(5): 2131-2134, 1997.
 Guowen Ding, John E. Scharer and Kurt L. Kelly, “Effects of rapidly decaying plasmas on Langmuir probe measurements,” J. Appl. Phys. 84(3): 1236-1240, 1998
 M. Nisha, K. J. Saji, R. S. Ajimsha, N. V. Joshy, and M. K. Jayaraj, “Characterization of radio frequency plasma using Langmuir probe and optical emission spectroscopy,” J. Appl. Phys., 99, 033304,2006
 J. E. Heidenreich III, J. R. Paraszczak, M. Moisan, and G. Suave, “Electrostatic probe analysis of microwave plasmas used for polymer etching,” J. Vac.Sci. Technol. B 5, 347 (1987)
 A. Brockhaus, D. Korzec, F. Werner, Y. Yuan, J. Engemann, “Characterization of a microwave plasma by in situ diagnostics,” Surface and Coatings Technology, 74-75, 431-442 (1995)
 H. Amemiya, “Measuring Methods of Plasma Parameters by a Differentiating and Modulating Double Probe,” Jpn. J. Appl. Phys., 27, 694(1988)
 van der Pauw, L.J.,"A method of measuring specific resistivity and Hall effect of discs of arbitrary shape," Philips Research Reports 13: 1–9.,1958
 van der Pauw, L.J.,"A method of measuring the resistivity and Hall coefficient on lamellae of arbitrary shape," Philips Technical Review 20: 220–224,1958
 Tauc, J., "Optical properties and electronic structure of amorphous Ge and Si,". Materials Research Bulletin 3: 37–46,1968
 J, Tauc, R. Grigorovici,” Optical Properties and Electronic Structure of Amorphous Germanium,” A. Vancu, Phys. Status Solidi, 15 (1966) 627-637
 Buchholz, D. B.; Liu, J.; Marks, T. J.; Zhang, M.; Chang, R. P. H.,” Control and Characterization of the Structural, Electrical, and Optical Properties of Amorphous Zinc−Indium−Tin Oxide Thin Films," ACS Applied Materials and Interfaces. 2009, 1, 2147-2153
 H. Chatei, J. Bougdira, M. Remy, P. Alnot, “Optical emission diagnostics of permanent and pulsed microwave discharges in H2–CH4–N2 for diamond deposition,” Surface and Coatings Technology 116–119 (1999) 1233–1237
 J.J. Robbins, R.T. Alexandera, W. Xiaob, T.L. Vincentb, C.A. Woldena ,”An investigation of tin oxide plasma-enhanced chemical vapor deposition using optical emission spectroscopy,” Thin Solid Films 406 (2002) 145–150
 S. Ilican, Y. Caglar, M. Caglar, B. Demirci,“Polycrystalline indium-doped ZnO thin films : preparation and characterization,” J. Optoelectron Adv. M.., 10( 10), 2592 – 2598,2008
 Anderson Janotti ,Chris G. Van de Walle “Oxygen vacancies in ZnO,” Appl. Phys. Lett., 87, 122102, 2005
 N. Ito, Y. Sato, P.K. Song, A. Kaijio, K. Inoue, Y. Shigesato,“Electrical and optical properties of amorphous indium zinc oxide films,” Thin Solid Films 496 (2006) 99 – 103
 D. C. Paine, B. Yaglioglu, Z. Beiley, S. Lee “Amorphous IZO-based transparent thin film transistors,” Thin Solid Films 516 (2008) 5894–5898
 D.H. Shin, Y.H. Kim, J.W. Han, K.M. Moon, R.I. Murakami, “Effect of process parameters on electrical, optical properties of IZO films produced by inclination opposite target type DC magnetron sputtering,” Trans. Nonferrous Met. Soc. China 19(2009) 997-1000
 Y. S. Jung, J. Y. Seo, D. W. Lee, D. Y. Jeon, “Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film,” Thin Solid Films 445 (2003) 63–71
 M. Chen, X. Wang, Y.H. Yu, Z.L. Pei, X.D. Bai, C. Sun, R.F. Huang, L.S. Wen, “X-ray photoelectron spectroscopy and auger electron spectroscopy studies of Al-doped ZnO films,” Applied Surface Science 158 (2000) 134–140
 J. C. C. Fan, J. B. Goodenough, “X-ray photoemission spectroscopy studies of Sn-doped indium-oxide films,” J. Appl. Phys. 48, 3524 (1977)
 S. Major, Satyendra Kumar, M. Bhatnagar, K. L. Chopra,“Effect of hydrogen plasma treatment on transparent conducting oxides,” Appl. Phys. Lett. 49, 394 (1986)
 Md Nurul Islam, T.B. Ghosh, K.L. Chopra, H.N. Acharya,“XPS and X-ray diffraction studies of aluminum-doped zinc oxide transparent conducting films,” Thin Solid Films 280 (1996) 20-25
 A. J. Nelson, H. Aharoni, “X‐ray photoelectron spectroscopy investigation of ion beam sputtered indium tin oxide films as a function of oxygen pressure during deposition,” J. Vac. Sci. Technol. A 5, 231 (1987)
 S. W. Gaarenstroom, N. Winograd,”Initial and final state effects in the ESCA spectra of cadmium and silver oxides,” J. Chem. Phys. 67, 3500 (1977)
 Y. Q. Li, y. Kang, W. J. Ma, H. Q. Wang, J. M. Zhang, “The preparation, electrical and optical properties of indium doped ZnO conductive nanoparticles,” Optoelectronics and Advanced Materials – Rapid Communications 4(2) 2010, p. 211 – 214
 M-M Bagheri-Mohagheghi, M Shokooh-Saremi, “The effect of high acceptor dopant concentration of Zn2+ on electrical, optical and structural properties of the In2O3 transparent conducting thin ﬁlms,” Semicond. Sci. Technol. 18 (2003) 97–103
 T. Minami, T. Kakumu, Y. Takeda, S. Takata,“Highly transparent and conductive ZnO-In2O3 thin films prepared by d.c. magnetron sputtering,” Thin Solid Films Vol. 290-291, P 1-5,1996