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姓名 許捷翔(Chieh-Hsiang Hsu)  查詢紙本館藏   畢業系所 光電科學與工程學系
論文名稱 利用陽極氧化鋁薄膜在矽太陽能電池表面製做抗反射奈米結構
(Anti-reflective Structures for Silicon Solar Cell Fabricated Using Anodic Aluminum Oxide Method)
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摘要(中) 本研究利用蛾眼效應,藉由多孔陽極氧化鋁蝕刻遮罩,在矽基板上製作出抗反射蛾眼結構。首先,我們先利用有限時域差分法設計出週期為200nm之奈米孔洞陣列作為蝕刻遮罩。然後,我們在矽基板表面製備多孔陽極氧化鋁奈米孔洞陣列薄膜,多孔陽極氧化鋁有著製做成本低廉,製程簡單、快速,以及容易大面積製作等優點。接著,我們利用高密度電漿蝕刻並通以SF6氣體,蝕刻矽基板表面。最後,我們在矽基板上製作出週期為220nm之奈米孔洞陣列抗反射結構。從實驗結果得知,當我們結構柱高高於500nm時,其反射率可低於1%,在我們製作的樣品中,反射率最好可低至0.58%,而當光源從60度入射時,反射率可低至3.01%。此外,我們也利用原子層沉積法,在結構表面鍍製ZnO薄膜,進一步地降低反射率。由模擬結果得知,當厚度達60nm時,有最佳優化抗反射之特性。我們最後讓一反射率為2.54%之樣品,在鍍製58nm之ZnO後,反射率降至0.83%。我們將抗反射結構應用於太陽能電池上,並將效率從4.311%提升至5.06%。
摘要(英) In this study, we fabricated anti-reflection structure on silicon by using anodic aluminum oxide nanostructure as an etching mask inspired by moth eye effect. At first, we employed FDTD simulation to design the mask which is a nano-channel array with the period of 200nm. Then, anodic porous alumina membrane was used as the etching mask on silicon surface. Anodic porous alumina is a self-aligned structure with a submicron scale and easily formed by the anodic oxidation of Al over a large area and at low cost. After that the silicon was etched by high density plasma with SF6 gas. Finally, the anti-reflection nano-hole array structure with 220nm period was formed. The experiment results showed a low reflectivity below 1% was achieved over a wide spectral bandwidth from 400 to 1000 nm when nano-cone over 500nm. The best reflectivity can reach to 0.58% at normal incidence. When the angle of incidence is 60 degree, the best reflectivity can reach to 3.01%. In addition, an antireflection coating of ZnO film was deposited on the nanostructure using atomic layer deposition process to reduce surface reflection. According to our simulation result, a 60-nm thickness of ZnO is the best antireflection design. As a result, the average reflectance of the nanostructure with a single layer of ZnO can be decreased from 2.54% to 0.83%. Finally, the efficiency of the solar cell can increase from 4.31% to 5.06% by using the antireflection structure.
關鍵字(中) ★ 有限時域差分法
★ 抗反射結構
★ 陽極氧化鋁
關鍵字(英) ★ Anodic Aluminum Oxide
★ Anti-reflective Structures
★ finite difference time domain method
論文目次 摘要 I
Abstract II
致謝 III
目錄 IV
圖目錄 VIII
表目錄 XIII
第一章 緒論 1
1-1 前言 1
1-2 太陽能電池簡介 3
1-3 研究動機 4
1-4 本文架構 5
第二章 抗反射層 6
2-1 抗反射結構 6
2-1-1 抗反射膜 6
2-1-2 蛾眼結構 7
2-2 抗反射結構文獻回顧 8
第三章 多孔陽極氧化鋁 18
3-1 多孔陽極氧化鋁成形原理 18
3-2 多孔陽極氧化鋁文獻回顧 20
第四章 設計與分析 26
4-1 有限時域差分法 26
4-2 模擬形狀選取 33
4-3 結構週期之選取 35
4-4 孔洞大小之選取 37
4-5 模擬結構鍍製抗反射膜 38
第五章 實驗步驟與實驗儀器 40
5-1 實驗流程 40
5-2 多孔陽極氧化鋁製備 41
5-2-1鋁膜鍍製 41
5-2-2陽極氧化處理 42
5-2-3擴孔 44
5-3 乾蝕刻 44
5-4 原子層沉積法 46
5-5 多孔陽極氧化鋁孔洞週期與大小分析 47
5-6 量測儀器 51
5-6-1 掃描式電子顯微鏡 52
5-6-2 可變角度積分球光譜儀系統 54
第六章 結果與討論 57
6-1 不同柱高之抗反射結構 57
6-1-1 結構柱高為200nm 58
6-1-2 結構柱高為300nm 60
6-1-3 結構柱高為370nm 62
6-1-4 結構柱高為500nm 64
6-1-5 結構柱高為550nm 66
6-1-6 結構柱高為600nm 68
6-1-7 結構柱高為700nm 70
6-1-8 結構柱高與反射率之關係 72
6-2 原子層沉積法鍍製氧化鋅 75
6-3 結構應用於太陽能電池 77
第七章 結論與未來工作 79
參考文獻 80
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指導教授 李正中、陳昇暉
(Cheng-Chung Lee、Sheng-Hui Chen)
審核日期 2012-8-28
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