干涉微影之曝光與顯影參數對週期性結構外型之影響

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姓名

吳宜寧(Yi-Ning Wu) 查詢紙本館藏

畢業系所

機械工程學系

論文名稱

干涉微影之曝光與顯影參數對週期性結構外型之影響
(The influences of exposed and developed parameters on the shape of periodic structure for interferometric lithography)

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摘要(中)

在本研究中，我們建構出一高解析度的干涉微影系統，並利用此系統對光阻進行直寫，不需使用光罩，就可以輕鬆的製造出奈米等級的一維與二維週期性結構。一維的週期性直線結構，是利用兩道同調光束重疊所形成的干涉條紋，直接於光阻上曝光，再藉由顯影與蝕刻，使干涉圖形能轉移到矽基板上。配合旋轉平台轉動基板，並對光阻進行二次曝光，則可輕易的得到二維週期性陣列結構，且隨著基板旋轉角度的不同，所的到的結構外形，也有所不同。在適當的曝光與顯影條件之下，我們成功的在光阻上建構出正方形、圓形、三角形、菱形和長方形柱狀陣列結構，以及圓形、橢圓形和六邊形坑洞狀陣列結構。之後，再經由ICP進行乾蝕刻，成功的於矽晶圓上建構出正方形、菱形等週期性島狀陣列。最後，則針對不同的製程參數對結構外形的影響，作一詳盡的分析與探討。

摘要(英)

In this research, we have developed a laser interference lithography system with high resolution. This system can write pattern directly on the photoresist without using mask, and construct nano-size periodic structures in one or two dimension easily. One dimensional line patterns are performed by exposing photoresist to the interference pattern produced by the overlap of two mutually coherent optical waves. Two dimensional periodic structures can be simply fabricated by a second exposure after rotating the substrate. By rotating the substrate with different angle, we produce periodic structures with different shape. With appropriate developing and exposing condition, we obtain the array of photoresist posts including square, circle, rhomb, triangle and rectangle and holes including circle, ellipse and hexagon.
At last, we discuss the effects of the process parameters on the shape of the structure, and find the optimal parameters of this process.

關鍵字(中)

★ 週期性結構
★ 微影
★ 干涉

關鍵字(英)

★ periodic structure
★ lithography
★ interference

論文目次

目錄
摘要 ………………………………………………………………… I
英文摘要 …………………………………………………………… II
致謝 ………………………………………………………………… III
目錄 ………………………………………………………………… IV
表目錄 ……………………………………………………………… VI
圖目錄 ……………………………………………………………… VII
符號表…………………………………………………………………X
第一章緒論 ………………………………………………………… 1
1.1 前言 ……………………………………………………………1
1.2 文獻回顧 ………………………………………………………2
1.2.1 干涉微影的分類 ………………………………………3
1.2.2傳統干涉微影之改良與應用……………………………5
1.2.2.1 結構週期縮小…………………………………5
1.2.2.2 大面積的曝光…………………………………6
1.2.2.3 干涉品質與系統的穩定度的提升……………6
1.2.2.4 二維干涉微影系統……………………………7
1.2.2.5 干涉微影的應用………………………………8
1.3 研究目的 ………………………………………………………10
第二章實驗原理與方法………………………………………………11
2.1 實驗原理 ………………………………………………………11
2.1.1 干涉原理 ………………………………………………11
2.1.2 光的同調性 ……………………………………………12
2.1.3 空間濾波原理 …………………………………………13
2.1.4 光阻的基本性質 ………………………………………14
2.1 實驗方法 ………………………………………………………16
2.2.1 系統架構 ……………………………………………………16
2.2.2實驗流程………………………………………………………… 17
第三章結果與討論……………………………………………………25
3.1 直線結構之光阻 …………………………………………………26
3.2 直線結構之矽 ……………………………………………………28
3.3 陣列結構之矽 ……………………………………………………29
3.4 陣列結構之光阻 …………………………………………………33
第四章結論……………………………………………………………35
參考文獻 ………………………………………………………………37

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指導教授

陳志臣(Jyh-Chen Chen)

審核日期

2005-7-15

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