| 摘要(英) |
According to 2006 TFT-LCD market data, the yearly consumption of positive photoresist was about 4,000 tons and that implied a market value of about NTD 2.9 billion for a single material. Considered the tremendous usage, the approximately 2% occupation of the total material cost in TFT-LCD manufacturing process and the waste positive photoresist which spun off from the glass substrate during the spin coating process was almost free of contamination while under clean room environment, a chilling concentration facility using temperature gradient of the hot/cold flow to reuse the positive photoresist was introduced. In the feasibility study on the repetitive reuse of waste positive photoresist, the optimal operation condition was set firstly by using photoresist thinner then applied to waste positive photoresist for solvent removing and dehydration. The chilling concentration efficiencies of the operation condition on photoresist thinner and waste positive photoresist were investigated. Furthermore, through the film thickness prediction equation, the predicted and actual coating thickness of the reuse positive photoresist was also compared.
It was found that the efficiency of the chilling concentration can reach 73.6% and actual efficiency of reuse of waste photoresistant is 48.9% when the operational temperature of hot flow is 30℃, cold flow is -10℃, air volume is 5.09m/s, and liquid flow is 2.0L/min.
It was also found that the actual thickness of the film after 9 photoresistant reuse tests which all less than 500 ? standardized thickness. And the difference of the thickness between the predicted by the formula ln(THf) = 3.523 + 1.424 ln(S.C.) + 0.446 ln(μ) and the actual thickness is only 33?.
Finally, the results of this study indicated that after 9 repetitive diluting, condensing and allotting processes and over expiration date for twenty days, the film thickness of the waste photoresistant may still pass the specifications. |
| 參考文獻 |
參考文獻
1.Aspen Physical Property System pure component databank, version 11.1.
2.Deru, M. P. and A. T. Kirkpatric, “Ground-Coupled heat and Moisture Transfer from Buildings Part 1: Analysis and Modeling”, NREL/CP-550-29693, 2001.
3.Hideki Nishida、Yoriko Nagao and Akihiko Igawa, “Chemistry of photoresist reclamation,” Proceedings of SPIE ,Vol. 3333 Advances in Resist Technology and Processing XV, Will Conley, Editor, June 1998, pp. 1406-1412
4.Hideki Nishida、Masamichi Moriyaa、Itaru Shiibab and Katsuto Taniguchi, “Chemistry of Photoresist Recycling(2),” Part of the SPIE Conference on Advances in Resist Technology and Processing XVI . Santa Clara, California • March 1999 651 SPIE,Vol. 3678, pp. 651-657
5.Hideki Nishida、Akihiko Igawa、Kenji Ohshiroc and Itaru Shiiba, “Chemistry of Photoresist Reclamation(3), ” Proceedings of SPIE,Vol. 3399,Advances in Resist Technology and Processing XVII, Will Conley, Editor, June 2000, pp. 490-498
6.Hiroshi Sugawara、Yoshinori Tajima and Tadahiro Ohmi，“A Study on Reclaimed Photoresist Developer Using an Electrodialysis Method, ” The Japan Society of Applied Physics，Vol.41(2002) pp. 2374-2379
7.Kawamura, P. I., and D. Mackay, “The evaporation of volatile liquids”, J. Hazardous Materials 15, pp. 343-364, 1987.
8.Mackay, D., and R. S. Matsugu, “Evaporation rates of liquid hydrocarbon spills on land and water”, Can. J. Chem. Eng. 51, pp. 434-439, 1973.
9.Meyerhofer, D. , “Characteristics of resist films produced by spinning, ” J. Appl. Phys., 49(7), pp3993~3997, 1978
10.Michael E. Clarke and Kara Fothergill, “Removal of Soft Gel Particles from Photoresist, ” Millipore Corporation, Microelectronics Applications Note MAL110,1999
11.Mulholland, K.L., and J.A.Dyer. ”Pollution Prevention: Methodology, Technologies, and Practices, ” American Institute of Chemical Engineers,New York, 1999
12.Paul L. Bishop, “Pollution Prevention:Fundamentals and Practice,” pp. 225
13.Peter E. Dahlgren, “Solvent recycling for Reuse in semiconductor manufacturing, ” International Symposium on Semiconductor Manufacturing,1995, pp. 205–209
14.Takeuchi Noriko、Terajima Etsuzo、Nakamura Takao、Kageyma Kenji、Oshiro Kenji、Mori Kiyoto, “Method And Device For Coating Photoresist,” Date of publication of application:15.08.1997,Publication number : 09-213608
15.Thibodeaux, L. G. “Chemodynamics: environmental movement of chemicals in air, water, and soil”, New York, John Wiley and Sons, 1979.
16.「石油煉製工程概論」，中國石油股份有限公司，台北(1980)
17.曾迪華，「污泥濃縮處理」，工業污染防治技術手冊之二十七，經濟部工業污染防治技術服務團，財團法人中國技術服務社，台北(1993)
18.張景學、吳昌崙，「半導體製造技術」，文京圖書有限公司，台北(1998)
19.林政剛譯，「污染預防基本理論與實務」，滄海書局，台北(2002)
20.「最新干燥技?工?与干燥???型及?准?范?施手?」，安徽文化音像出版社，安徽(2003)
21.羅文偉譯，「綠色工程」，全威圖書有限公司，台北(2005)
22.羅文偉譯，「輸送現象與單元操作-含分離程序原理」，全威圖書有限公司，台北(2006)
23.陳志慧，「LCD使用之正型光阻劑廢液回收再利用計畫」，經濟部工業局成果報告，台北(2005)
24.蔡崇偉，「TFT-LCD 製造業之廢溶劑回收再利用程序」，環安簡訊，第37期(2004)
25.張芳誠，楊炎勝，賴慶智，「光阻回收再利用技術」，清潔生產暨永續發展研討會，台北(2004)
26.顏以明、張雍政，「TFT-LCD光阻劑技術發展趨勢」，台灣安智電子材料股份有限公司，新竹(2005)
27.楊炎勝、朱志弘、賴慶智、沈克鵬，「光阻再生技術開發期末報告」，工研院能環所，新竹(2005)
28.「特用化學品工業年鑑」，工研院經資中心，新竹(2006)
29.張豐堂、粘愷峻、陳見財、陳文輝、張智能、王慧貞，「高科技業VOCs廢氣冷凝回收技術效率提升實務探討」，半導體科技 No.64 (2006)
30.盧慶儒，「基板大型化時代LCD生產技術與設備(1) 」，DIGITIMES(2006)
31.黃仲龍，「LCD減少光罩製程技術分析」，工研院經資中心，新竹(2006)
32.蔡坤賢、張雍政，「LCD光阻塗佈技術與發展趨勢」，光電技術No.607(2006)
33.朱志弘，楊炎勝，黃緯苓，賴慶智，「液晶顯示器製程廢光阻回收再利用技術」，化工技術，第162期，pp. 165-173(2006)
34.楊仁杰，「中小尺寸TFT LCD持續喊熱！面板模組廠爭取面板拚盡渾身解數」，DIGITIMES，台北(2007)
35.郭靜蓉，「CF廠轉型趁現在」，電子時報(2007)
36.王惠芳，「TFT-LCD用Array光阻及彩色光阻發展現況」，工研院經資中心，新竹(2007)
37.「2007 平面顯示器年鑑」，工研院經資中心，新竹(2008)
38.「濃縮技術」，2006，http://www.biox.cn/food/200609/20060915092457_207635.shtml
39.中華液晶網，2007，http://cn.fpdisplay.com/technology/Tech_Shtml/2_20077710245944.shtml
40.液??品物理的分离??技?(1) ，環境資訊網，http://www.cnjlc.com/h2o/8/2007071813076.html.
41.朱志弘、楊炎勝、沈克鵬，「正型光阻回收再使用技術」，產業環保工程實務技術研討會論文集，pp. 361-372，台北(2006)
42.楊炎勝、朱志弘、沈克鵬，「LCD業正型光阻回收再使用系統」，清潔生產暨永續發展研討會論文集，pp. B2-1-B2-11，台北(2006)
43.楊炎勝、朱志弘、鄭承熙、沈克鵬，「廢光阻劑回收設備之效益提升」，台灣環境資源永續發展研討會論文集，pp. 5-239-5-244，中壢(2007)
44.鄭承熙、朱志弘、楊炎勝、沈克鵬，「紅色負型光阻液之回收與再生技術」，台灣環境資源永續發展研討會論文集，pp. 5-220-5-229，中壢(2007)
45.楊炎勝、朱志弘、鄭承熙、沈克鵬，「光電化學品及高價金屬回收技術」，工研院能環所，新竹(2007) |
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