參考文獻 |
[1]、G. Neumann, Phys. Status Solids, B105 (1981) 605.
[2]、D. J. Leary, J. O. Barnes, and A. G. Jordan, J. Electrochem. Soc, 29 (1982) 1328.
[3]、S. Liang, H. Sheng, Y. Liu, Z. Huo, Y. Lu, and H. Shen, J. Crystal Growth, 225 (2001) 110.
[4]、F. S. Hickernell, IEEE Trans. Sonics Ultrason, SU-32 (1985) 621.
[5]、S. Basu and A. Dutta, Sens. Actuators, B 22 (1994) 83.
[6]、M. Wwraback, H. Shen, S. Liang, C. R. Gorla, Y. Lu, Appl. Phys. Lett, 74 (1999) 507.
[7]、Z. K. Tang, G. K. L. Wong, P. Yu, M. Kawasaki, A. Ohtomo, H. Koinuma, and Y. Segawa, Appl. Phys. Lett, 72 (1998) 3270.
[8]、A. Mitra, R. K. Thareja, J. Appl. Phys, 89 (2001) 2025
[9]、Yasuhiro Igasaki and Hiromi Saito, Thin Solid Films, 199 (1991) 223
[10]、Takashi Komaru at al., Jpn. J. Appl. Phys. Part I, 38 (1999) 5796
[11]、M.T. Young and S.D. Kenu, Thin Solid Films, 410 (2002) 8
[12]、J. R. Chelikowsky, Solid State Commun, 122 (1997) 351.
[13]、J. E. Jaff, R. Pandey, and A. D. Kunz, J. Phys. Chem. Solids, 52 (1991) 755.
[14]、J. W. Tomm, B. Ullrich, X. G. Qiu, Y. Segawa, A. Ohtomo and H. Koinuma, J. Appl. Phys, 87 (2000)1884.
[15]、H. Kim, Y. Lee, Y. Roh, J. Jung, M. Lee and H. Kwon, IEEE Ultrasonic Symposium, (1998) 323.
[16]、L. J. Meng and M P dos Santos, 46 (1995) 1001.
[17]、Y. Yoshino, T. Makino, Y. Katayama and T. Hata, 59 (2000) 538.
[18]、H. Ieki and M. Kaota, IEEE Ultrasonic Symposium (1999) 281.
[19]、M. S. Wu, W. C. Shin and W. H. Tsai, J. Phys. D: Appl. Phys. 31 (1998) 943.
[20]、M. Y. Han and J. H. Jou, Thin Solid Films 260 (1995) 58.
[21]、G. J. Exarhos and S. K. Sharma, Thin Solid Films 270 (1995) 27.
[22]、P. Nunes, E. Fortunato and R. Martins, Thin Solid Films 383 (2001) 277.
[23]、J.L. Vossen, Physics of Thin Films 9 (1977) 1.
[24]、C.T. Lee, Y.K. Su and S.K. Chen, J. Cryst. Growth Vol.96, (1989) 785.
[25]、P. Nunes, E. Fortunato and R. Martins, Thin Solid Films, 383,
(2001) 277.
[26]、D. Dimova-Malinovska, N. Tzenov, M. Tzolov and L. Vassilev, Materials Science and Engineering B52, (1998) 59.
[27]、Tetsuay Yamamoto and Hiroshi Katayama-Yoshida, J. Crystal Growth 214/215, (2002) 552.
[28]、D. H. Zhang, T. L. Yang, Q. P. Wang and D. J. Zhang, Materials Chemistry and Physics 68, (2001) 233.
[29]、A. V. Singh and R. M. Mehra, J. Appl. Phys, Vol 90, number 11 (2001) 5661.
[30]、En-Gang Fu, Da-Ming Zhuang, Gong Zhang, Wei-Fang and Ming Zhao, Appild Surface Science 217, (2003) 88.
[31]、Z. L. Pei, C. Sun, M. H. Tan, J. Q. Xiao, D. H. Guan, R. F. Huang and L. S. Wen, J. Appl. Phys, Vol 90, number 7 (2001) 3432.
[32]、X. H. Li, A. P. Huang, M. K. Zhu, Sh. L. Xu, J. Chen, H. Wang, B. Wang and H. Yan, Materials Letters 57 (2003) 4655.
[33]、F. K. Shau, B. C. Shin, S. C. Kim and Y. S. Yu, Journal of European Ceramic Society, 24 (2004) 1861.
[34]、F. K. Shau and Y. S. Yu, Journal of European Ceramic Society, 24 (2004) 1869.
[35]、M. K. Jayaraj, Aldrin Antony and Manoj Ramachandran, Bull. Mater. Sci., No.3 (2002) 227.
[36]、S. H. Jeong, J. W. Lee, S. B. Lee and J. H. Boo, Thin Solid Films, 435 (2003) 78.
[37]、S. H. Jeong and J. H. Boo, Thin Solid Films, 447-448 (2003) 105.
[38]、Su-Shia Lin, Jow-Lay Huang and Ding-Fwu Lii, Surface and Coatings Technology, 176 (2004) 173.
[39]、N. Serpone, D. Lawless and R.Khairutdinov, J. Phys. Chem, 99 (1995) 16646.
[40]、I. Hamberg and C. G. Granqvist, J. Appl. Phys., 60(11) (1986) R123. |