在透明基材上製備抗反射陽極氧化鋁膜及利用陽極氧化鋁模板法製備雙晶銅奈米線之研究

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李岳承(Yueh-Chen Lee) 查詢紙本館藏

畢業系所

化學工程與材料工程學系

論文名稱

在透明基材上製備抗反射陽極氧化鋁膜及利用陽極氧化鋁模板法製備雙晶銅奈米線之研究

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摘要(中)

本研究分為兩大部分，第一部分為在透明基材上製備抗反射陽極氧化鋁膜，探討不同陽極氧化鋁膜之參數在玻璃與藍寶石基材整體穿透率關係；第二部分則為使用50 nm 之自製陽極氧化鋁模板，並結合電化學沉積法製備出具有雙晶結構銅金屬線。

本研究在透明基材上製備抗反射陽極氧化鋁膜，可藉由孔洞大小調整陽極氧化鋁膜之等效折射率，與利用第一次陽極處理時間與蝕刻時間控制薄膜厚度，可獲得在玻璃與藍寶石基材上陽極氧化鋁膜之最佳參數，使整體透明基材之穿透率有效的提升，達到反射層效果。除此之外，也利用陽極處理與孔洞蝕刻交互進行多次的陽極處理，可對孔洞修飾成錐狀結構，成功製備出類似於蛾眼結構之抗反射膜，達到陽極氧化鋁膜之等效折射率會沿著深度方向成連續變化，而大幅提升透明基材的穿透率。

本研究利用自製的陽極氧化鋁模板結合電化學沉積法進行電鍍，可鍍製直徑約為50奈米且具有雙晶結構的一維銅金屬奈米線，其奈米線的深寬比可高達1200，本研究將調整各種實驗參數，如通電形式、溫度與鬆弛時間等，並利用TEM觀察在不同電鍍參數下的雙晶晶面密度的變化。

摘要(英)

There are two parts in this study. The first part is to fabricate antireflection anodic aluminum oxide (AAO) film on a transparent substrate, discussing the total transmittance relationship between glass and sapphire substrates with different parameters of AAO film; the second part is to fabricate Cu nanowires with twinned structures by combining the AAO template and electrochemical deposition technique.

In this study, the total transmittance is determined by the effective refractive index and thickness of AAO film. The effective refractive index can be controlled by pore size, and the thickness can be controlled by the first anodizing time and etching time. As we obtain the optimal parameters, the total transmittance will be effectively promoted. Moreover, the pore of AAO film can be modified to the cone structure by repeated anodizing process and etching process, and we can obtain a moth-eye structure on AAO film. The total transmittance is significantly promoted by the gradual change of the effective refractive index in depth direction.

On the other hand, we fabricate Cu nanowires with twinned structures by combining the AAO template and electrodeposition technique. The diameter of twinned Cu nanowires is about 50 nm, and the aspect ratio is up to 1200. Furthermore, we observe the density change of twins formed in the Cu nanowires under different experimental parameters and electrodeposition conditions by TEM analysis.

關鍵字(中)

★ 陽極氧化鋁
★ 抗反射
★ 雙晶銅

關鍵字(英)

論文目次

第一章簡介 1

1-1 前言 4

1-2 光學薄膜之抗反射層理論…………………………………………………………….5

1-3陽極氧化鋁膜…………………..……………………………………………………3

1-4 在透明基材上製備抗反射陽極氧化鋁膜……………………………………………...8

1-5 一微奈米線結構……………………………………………………………………...9

1-6 雙晶銅金屬 ………………………………………………………………..9

1-7 研究動機及目標………………………………………………………………………...11

第二章實驗步驟及儀器設備……………………...…………………………………..........12

2-1在透明基材上製備抗反射陽極氧化鋁膜………………………………………...12

2-1-1 透明基材試片清洗……………………………………...………….……12

2-1-2 濺鍍沉積鋁薄膜………………...………...……………………………12

2-1-3 製備試片工作電極……………………………………...………….……12

2-1-4 製備抗反射陽極氧化鋁膜……………………………...………….……13

2-2 陽極氧化鋁模板製備一維銅金屬奈米線..……..…………………………………….14

2-2-1陽極氧化鋁模板之製程…………………………………………..............14

2-2-2電化學沉積法製備一維雙晶銅金屬奈米線………………………………..15

2-3 實驗設備………………………………………………………………………….16

2-3-1 直流式真空濺鍍系統…….………….……………....………………………16

2-3-2 陽極氧化鋁膜製備系統…………………………....………………………16

2-3-3 電鍍沉積系統…………………………………………………………………16

2-3-4 退火爐系統……………………………………………………………………16

2-4 儀器分析實驗………………………………………………………………………...17

2-4-1 掃描式電子顯微鏡……………………………………………………………17

2-4-2 穿透式電子顯微鏡…………………………………………………………....17

2-4-3 高分辨穿透式電子顯微鏡…………...………....…………………………….17

2-4-4 原子力顯微鏡…………………………....……………………………………18

2-4-5 紫外光-可見光光譜儀...………………………………………………………18

2-4-6 X光結晶繞射分析…......…………………….………………………………19

第三章結果與討論………………………………………………………………………….20

3-1 在玻璃基材上製備陽極氧化鋁膜結構與分析……………….………………………..20

3-1-1 鍍製鋁膜之製程分析…………….…………………………………………...20

3-1-2 調控陽極氧化鋁膜厚度之製程……………………………………………....21

3-1-3 調控陽極氧化鋁膜中奈米孔洞之製程……………………………………....22

3-1-4 陽極氧化鋁膜殘留鋁之鑑定分析…………………………………………....22

3-1-5 薄膜退火不同溫度對玻璃基材穿透率之影響……………………………....23

3-1-6 不同薄膜厚度對玻璃基材穿透率影響..…………………………………....24

3-1-7不同孔洞大小對玻璃基材穿透率影響…………………………………....25

3-1-8孔洞規則性對玻璃基材穿透率影響……………………………………....26

3-1-9錐形孔洞對玻璃基材穿透率影響………….……………………………....26

3-2 在Sapphire基材上製備陽極氧化鋁膜結構與分析..……………………………......27

3-2-1不同孔洞大小對Sapphire基材穿透率影響………………………………....27

3-2-2錐形孔洞對Sapphire基材穿透率影響……………………………………....28

3-3 大面積抗反射陽極氧化鋁膜之製備…………………………………………………...28

3-4 電化學沉積法製備一維雙晶銅金屬奈米線……………………...……………………29

3-4-1 陽極氧化鋁模板……………………………………………………………..29

3-4-2直流電鍍法製備雙晶銅奈米線之形貌與結構分析….……………………..29

3-4-3脈衝電鍍法製備雙晶銅奈米線之形貌與結構分析….……………………..30

第四章結論與未來展望…………………………………………………………………….34

4-1 結論……………………………………………………………………………………...34

4-2 未來展望………………………………………………………………………………...35

參考文獻……………………………………………………………………………………...36

表目錄………………………………………………………………………………………...43

圖目錄………………………………………………………………………………………...45

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指導教授

鄭紹良(Shao-Liang Cheng)

審核日期

2015-8-26

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