193nm深紫外光斜向薄膜之研究

以作者查詢圖書館館藏

、以作者查詢臺灣博碩士

、以作者查詢全國書目

、勘誤回報

、線上人數：83

、訪客IP：18.191.218.101

姓名

卓文浩(Wen-Hao Cho) 查詢紙本館藏

畢業系所

光電科學與工程學系

論文名稱

193nm深紫外光斜向薄膜之研究
(The Research of Obliquely Deposited Films at 193nm)

相關論文

★ 半導體雷射控制頻率	★ 比較全反射受挫法與反射式干涉光譜法在生物感測上之應用
★ 193nm深紫外光學薄膜之研究	★ 超晶格結構之硬膜研究
★ 交錯傾斜微結構薄膜在深紫外光區之研究	★ 膜堆光學導納量測儀
★ 紅外光學薄膜之研究	★ 成對表面電漿波生物感知器應用在去氧核糖核酸及微型核糖核酸雜交反應檢測
★ 成對表面電漿波生物感測器之研究及其在生醫上的應用	★ 探討硫化鎘緩衝層之離子擴散處理對CIGS薄膜元件效率影響
★ 以反應性射頻磁控濺鍍搭配HMDSO電漿聚合鍍製氧化矽摻碳薄膜阻障層之研究	★ 掃描式白光干涉儀應用在量測薄膜之光學常數
★ 量子點窄帶濾光片	★ 以量測反射係術探測光學薄膜之特性
★ 嵌入式繼光鏡顯微超頻譜影像系統應用在口腔癌切片及活體之設計及研究	★ 軟性電子阻水氣膜之有機層組成研究

檔案

[Endnote RIS 格式]

[Bibtex 格式]

[相關文章]

[文章引用]

[完整記錄]

[館藏目錄]

[檢視]

[下載]

本電子論文使用權限為同意立即開放。
已達開放權限電子全文僅授權使用者為學術研究之目的，進行個人非營利性質之檢索、閱讀、列印。
請遵守中華民國著作權法之相關規定，切勿任意重製、散佈、改作、轉貼、播送，以免觸法。

摘要(中)

本論文對氟化鎂、氟化鑭、氟化釓三種材料做蒸鍍角度從20 度
到70 度斜向蒸鍍，量測其柱狀傾斜角、應力以及薄膜對P、S 偏振光
垂直入射於波長193nm 的折射率。柱狀傾斜角以掃瞄式電子顯微鏡
觀察之，應力以相位移式應力量測干涉儀測量，折射率則以橢偏儀量
測，並以Cauchy Law 做擬合。柱狀傾斜角方面發現Tangent rule：
tan??E ?tan?的係數E 只有在蒸鍍角度大於50 度才會趨於定值，
不同材料其係數E 不同。隨著蒸鍍角鍍的增大會有壓應力的趨勢。然
而雙折射的特性並不是單純的隨蒸鍍角度增加而遞增，氟化鎂在蒸鍍
角度為70 度時有最大的折射率差異(0.0576)。氟化鑭需在30 度至60
度之間才明顯的折射率差異，其值約在0.03～0.04 之間。而氟化釓在
蒸鍍角度從40 度到50 度之間Ns 與Np 的大小會相反過來。應力方
面會隨著蒸鍍角度有先上升在減小的現象。

摘要(英)

Obliquely depositing Magnesium fluoride, Lanthanum fluoride, and
Gadolinium fluoride for deposition angles in the range 20°–70°. Column
angles were determined ex situ from scanning electron microscopy
photographs of deposition-plane fractures. Stress was measured from
Phase-Shifting Interferometer. The birefringence,Δn = Ns – Np, was
determined from ellipsometer and fitted by Cauchy despersion law. We
show that the experimental column angles correspond the value predicted
by the modified form of the tangent-rule equation ??tan?1(E ?tan?)
where E is a constant for deposition angle that is larger than 50°. When
the deposition angel becomes large, the stress trend toward compressive
stress. However, birefringence does not increase progressively with the
deposition increases.Birefringence, Δ n = Ns – Np, of Magnesium
fluoride is 0.0576 for deposition angle in 70°. Birefringence of
Lanthanum fluoride becomes clear for deposition angle in the rang
30°-60°. Δn = 0.037 for deposition angle in 60°. However theΔn of
Gadolinium fluoride would be cross during deposition angle in 40° and
50°.When the deposition angle was increased, the stress would increase
first and then decrease progressively.

關鍵字(中)

★ 柱狀結構
★ 斜向蒸鍍
★ 深紫外光

關鍵字(英)

★ DUV
★ column structure
★ obliquely deposited

論文目次

中文摘要...............................................Ⅰ
英文摘要...............................................Ⅱ
致謝...................................................Ⅲ
目錄...................................................Ⅳ
圖目錄.................................................Ⅶ
表目錄.................................................Ⅸ
第一章緒論.............................................1
1-1 前言..............................................1
1-2 研究動機..........................................1
1-3 氟化物材料特性....................................2
第二章原理.............................................5
2-1 非均向介質........................................5
2-2 非均向光學薄膜....................................7
2-3 自我遮蔽效應.....................................10
2-4 蒸鍍角度與柱狀傾斜角度...........................10
2-5 薄膜應力.........................................11
第三章實驗架構與量測儀器..............................13
3-1 實驗方法與系統架構...............................13
3-1-1 基板準備......................................13
3-1-2 鍍膜機架構....................................13
3-1-3 真空系統......................................14
3-1-4 實驗參數......................................14
3-2 量測方法與儀器...................................15
3-2-1 掃瞄式電子顯微鏡..............................15
3-2-2 柱狀傾斜角度計算..............................16
3-2-3 橢圓儀........................................18
3-2-4 相位移式應力量測干涉儀........................22
第四章實驗結果與討論..................................24
4-1 氟化鎂非均向薄膜實驗結果與討論...................24
4-1-1 蒸鍍角度與柱狀傾斜角度分析....................24
4-1-2 柱狀傾斜角度與折射率的關係....................26
4-1-3 蒸鍍角度與應力的關係..........................28
4-2 氟化鑭非均向薄膜實驗結果與討論...................30
4-2-1 蒸鍍角度與柱狀傾斜角度分析....................32
4-2-2 柱狀傾斜角度與折射率的關係....................34
4-2-3 蒸鍍角度與應力的關係..........................37
4-3 氟化釓非均向薄膜實驗結果與討論...................39
4-3-1 蒸鍍角度與柱狀傾斜角度分析....................39
4-3-2 柱狀傾斜角度與折射率的關係....................41
4-3-3 蒸鍍角度與應力的關係..........................43
4-4 綜合討論.........................................43
4-4-1 不同材料間蒸鍍角度與柱狀傾斜角度的關係........46
4-4-2 不同材料間蒸鍍角度與折射率的關係..............46
4-4-3 不同材料間蒸鍍角度與應力的關係................46
第五章結論............................................48
參考文獻..............................................50

參考文獻

[1] G. W. Mbise, D. Le Bellac, G. A. Niklasson, and C. G. Granqvist,
“Angular selective window coatings: theory and experiments,” J.
Phys. D, 30, pp.2103–2122 (1997).
[2] T. Otiti, G.A. Niklasson, P. Svedlindh, C.G. Granqvist, “Anisotropic
optical, magnetic, and electrical properties of obliquely evaporated Ni
films” Thin Solid Film, 307(1997)245-249.
[3] Ian Hodgkinson, Sarah Cloughley, Qi HongWu, and Samer Kassam, ”
Anisotropic scatter patterns and anomalous birefringence of obliquely
deposited cerium oxide films” Applied Optics, Vol. 35, No. 28, 1
October 1996
[4] Ian Hodgkinsona, Qi HongWua, Matthew Arnolda, Lakshman De
Silvaa, Richard Blaikieb, “Bideposited thin-film retardation plates for
use at deep UV wavelengths” Current Applied Physics 4 (2004)
106–107
[5] Scott R. Kennedy and Michael J. Brett, “Porous broadband
antireflection coating by glancing angle deposition” Applied Optics,
Vol. 42, No. 22, 1 August 2003
[6] J. M. Nieuwenhuizen and H. B. Haanstra, “Microfractography of thin
films” Philips Tech. Rev. 27, 87–91 ~1966.
[7] Ian Hodgkinson, F. Horowitz, H. A. Macleod, M. Sikkens, J. J.Wharton, “Measurement of the principal refractive indices of thin
films deposited at oblique incidence” J. Opt. Soc. Am. A, Vol. 2, No.
10, October 1985
[8] Francesco Chiadini,Akhlesh Lakhtakia, “Extension of Hodgkinson’s
Model for Optical Characterization of Columnar Thin Films”
Microave and Optical Technology Letters, Vol. 42, No. 1, July 5 2004
[9] Book:“OpticalWaves in Crystals”Amnon Yariv, Pochi Yeh
[10] Ming-Chung Liu, Cheng-Chung Lee, Masaaki Kaneko, Kazuhide
Nakahira, and Yuuichi Takano, “Microstructure-related properties at
193 nm of MgF2 and GdF3 films deposited by a resistive-heating
boat” Applied Optics, Vol. 45, No. 7, 1 March 2006
[11] Book:“Birefringent Thin Films and Polarizing Elements” I. J.
Hodgkinson, Qi hongWu
[12] Paritosh, D. J. Srolovitz, “Shadowing effects on the microstructure
of obliquely deposited films” J. Appl. Phys., Vol. 91, No. 4, 15
February 2002
[13] Ian Hodgkinson, Qi hongWu, and Judith Hazel, “Empirical
equations for the principal refractive indices and column angle of
obliquely deposited films of tantalum oxide, titanium oxide, and
zirconium oxide” Applied Optics, Vol. 37, No. 13, 1 May 1998
[14]D. S. Campbell, Mechanical Properties of Thin Film. In Handbook of
Thin Film Technology, L. I. Massel and R.Glang ed., New York:McGraw-Hill Book Company, P.12-21, (1970).
[15]田春林, “光學薄膜應力與熱膨脹係數量測之研究” 國立中央大學
光電所博士論文
[16] Ian Hodgkinson, Qi hongWu, “Ion-Beam Control of Thin Film
Microstructural Columnar Angle” Modern Physics Letters B, Vol 15,
No 28&29, p1328-1331, 2001

指導教授

李正中(Cheng-Chung Lee)

審核日期

2006-7-14

推文